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Featured researches published by Hiroo Fuma.


Japanese Journal of Applied Physics | 1995

Current-Voltage and Capacitance-Voltage Characteristics of Metal/Oxide/6H-Silicon Carbide Structure

Norihito Tokura; Kazukuni Hara; Takeshi Miyajima; Hiroo Fuma; Kunihiko Hara

Current-voltage ( I-V ) and capacitance-voltage ( C-V ) characteristics of metal/ SiO2/6H-SiC structure fabricated on the concave surface in (000)C-face 6H-SiC p/n double epitaxial wafers were studied. Breakdown field of thermally grown gate oxide and effective charge density at SiO2/6H-SiC interface on sloped surface of the metal/oxide/semiconductor (MOS) structure were measured for the first time to be 9.2 MV/cm and 2.2-2.5×1012 cm-2, respectively, for both p- and n-epilayers. Fabricated SiC CONCAVE-MOS field-effect-transistor (FET) including the concave MOS structure achieved FET operation with blocking voltage of 250 V. Temperature dependence of the threshold voltage was -27 mV/K, which is considerably larger than the ideal value of -1.6 mV/K, due to high interface state density.


Japanese Journal of Applied Physics | 1988

High temperature operated enhancement-type β-SiC MOSFET

Hiroo Fuma; Atsushi Miura; Hiroshi Tadano; Susumu Sugiyama; Mitsuharu Takigawa

Enhancement-type β-SiC MOSFETs have been fabricated on a single crystalline β-SiC layer grown on a 3-inch Si(100) substrate by chemical vapor deposition. The MOSFETs fabricated by applying the reactive ion etching technique show reasonable I-V characteristics at room temperature. The saturation tendency of the drain currents has been observed at a drain voltage as high as 18 V. The MOSFETs operate even at 350°C.


Archive | 1989

Fabrication of MOSFETs on β-SiC Single Crystalline Layers Grown on Si(100) Substrates

Hiroo Fuma; A. Miura; Hiroshi Tadano; Susumu Sugiyama; Mitsuharu Takigawa

High temperature semiconductor devices are desirable for electronic control systems in automobiles. Silicon carbide is a promising semiconductor material for this purpose, because of its wide bandgap and physical stability[l]. Many devices fabricated in silicon carbide material have been reported[2–6]. Recently, a depletion-mode MOSFET, operating at 650°C, was reported by Palmour et al.[7]; this report demonstrates the high temperature capabilities of SiC devices.


Japanese Journal of Applied Physics | 1982

Direct Observations of the 500 MHz Q-Patterns from the 10 and 35 GHz SQUID's

Yukinobu Miki; Hiroo Fuma; Taizo Masumi

The 500 MHz Quantum Interference patterns (Q-patterns) beyond 100 MHz previously reported have been directly observed for the first time from 10 and 35 GHz Superconducting Quantum Interference Devices (SQUIDs). The observation was made by improving the bandwidth of the detection circuits, which was supposed to be the cause of the previous limitation on Q-patterns from the 10 and 35 GHz SQUIDs. An improved system including a 10 or 35 GHz SQUID has possible applications to the measurement of signals due to even faster magnetic flux changes.


Japanese Journal of Applied Physics | 1980

An Ultrafast Operation of Microwave SQUID's Biased at 35 GHz

Hiroo Fuma; Yukinobu Miki; Taizo Masumi

A microwave SQUID biased at 35 GHz with a Nb point contact has been improved in its characteristic performance, by changing the configuration of a SQUID, from the 35 GHz size to the 9 GHz size which is oversize for the 35 GHz microwave. About a 10 times larger signal output and higher frequency response up to 100 MHz have been directly obtained. Further, it has been confirmed for the first time that the SQUID biased at 35 GHz does respond up to the 9 GHz input signal by using the Bessel function method.


Archive | 1997

Silicon carbide semiconductor device with trench

Takeshi Miyajima; Norihito Tokura; Kazukuni Hara; Hiroo Fuma


Archive | 2006

Rotating electrical machine and hybrid drive unit provided with the same

Kazunari Moriya; Yukio Inaguma; Hiroo Fuma


Archive | 2010

Vehicle mounted converter

Hiroo Fuma; Takaji Umeno; Kota Manabe


Archive | 2008

Driving circuit for power semiconductor element

Hiroo Fuma; Hiromichi Kuno; Satoshi Hirose; Naoyoshi Takamatsu


Archive | 1995

Trench semiconductor device and process of producing same.

Kazukuni Hara; Norihito Tokura; Takeshi Miyajima; Hiroo Fuma; Hiroyuki Kano

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