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Dive into the research topics where Hiroshi Moriuma is active.

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Featured researches published by Hiroshi Moriuma.


Proceedings of SPIE, the International Society for Optical Engineering | 1999

Contrast enhancement by alkali decomposable additives in chemically amplified negative i-line resists

Yasunori Uetani; Hiroshi Moriuma; Yuko Hirai; Yoshiyuki Takata; Airi Yamada

We reported the novel alkali decomposable additives improve dissolution contrast in quinonediazide type positive resists. We have found that NHSE also improves dissolution contrast in chemically amplified negative resists. Good profiles and resolution are obtained by adding NHSE in the chemically amplified negative i-line resist system.


23rd Annual International Symposium on Microlithography | 1998

Contrast enhancement by alkali-decomposable additives in quinonediazide-type positive resists

Yasunori Uetani; Jun Tomioka; Hiroshi Moriuma; Yoshiko Miya

We have developed the new contrast enhancement method using an alkali decomposable compound. This compound is hydrophobic and water insoluble, but decomposes to water soluble hydrophilic compounds by contact with alkaline developer. This solubility change makes high dissolution contrast between exposed and unexposed area. Good profiles are obtained by addition of this compound to quinonediazide type positive resist.


Archive | 1992

Positive type radiation sensitive resist composition

Hiroshi Moriuma; Hirotoshi Nakanishi; Yasunori Uetani


Archive | 1993

Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive

Yasunori Uetani; Hiroshi Moriuma


Archive | 2002

Resin composition for intermediate layer of three-layer resist

Isao Yahagi; Yasunori Uetani; Hiroshi Moriuma


Archive | 1991

POSITIVE RESIST COMPOSITION CONTAINING 1,2-QUINONE DIAZIDE COMPOUND, ALKALI-SOLUBLE RESIN AND POLYHYDROXY PHENOL ADDITIVE COMPOUND

Hiroshi Moriuma; Haruyoshi Osaki; Takeshi Hioki; Yasunori Uetani


Archive | 2003

Amplification type positive resist composition

Akira Kamabuchi; Yasunori Uetani; Hiroshi Moriuma


Archive | 2000

Positive resist compositions comprising a hydroxyphenyl ketone

Hiroshi Moriuma; Yoshiyuki Takata


Archive | 1994

Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

Takeshi Hioki; Seiko Kurio; Yasunori Uetani; Yasunori Doi; Hiroshi Moriuma


Archive | 1992

Positive radiation-sensitive resist composition

Hiroshi Moriuma; Hirotoshi Nakanishi; Yasunori Uetani

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