Hirotaka Ikeda

High-quality, 2-inch-diameter m-plane GaN substrates grown by hydride vapor phase epitaxy on acidic ammonothermal seeds

In this paper, we discusse the origin of basal-plane stacking faults (BSFs) generated in the homoepitaxial hydride vapor phase epitaxy (HVPE) growth of m-plane gallium nitride (GaN). We investigated the effects of seed quality, especially dislocation density, on BSF generation during homoepitaxy. The results clearly identify basal-plane dislocation in the seed as a cause of BSF generation. We realized high-quality m-plane GaN substrates with a 2-in. diameter using HVPE on low-dislocation-density m-plane seeds.

Low-resistivity m-plane freestanding GaN substrate with very low point-defect concentrations grown by hydride vapor phase epitaxy on a GaN seed crystal synthesized by the ammonothermal method

An m-plane freestanding GaN substrate satisfying both low resistivity (ρ = 8.5 × 10−3 Ωcm) and a low point-defect concentration, being applicable to vertically conducting power-switching devices, was grown by hydride vapor phase epitaxy on a nearly bowing-free bulk GaN seed wafer synthesized by the ammonothermal method in supercritical ammonia using an acidic mineralizer. Its threading dislocation and basal-plane staking-fault densities were approximately 104 cm−2 and lower than 100 cm−1, respectively. A record-long fast-component photoluminescence lifetime of 2.07 ns at room temperature was obtained for the near-band-edge emission, reflecting a significantly low concentration of nonradiative recombination centers composed of Ga vacancies.

Determination of absolute value of quantum efficiency of radiation in high quality GaN single crystals using an integrating sphere

Omnidirectional photoluminescence (ODPL) measurement using an integrating sphere was carried out to absolutely quantify the quantum efficiency of radiation ( η) in high quality GaN single crystals. The total numbers of photons belonging to photoluminescence (PL photons) and photons belonging to an excitation source (excitation photons) were simultaneously counted in the measurement, and η was defined as a ratio of the number of PL photons to the number of absorbed excitation photons. The ODPL spectra near the band edge commonly showed a two-peak structure, which originates from the sharp absorption edge of GaN. A methodology for quantifying internal quantum efficiency ( ηint) from such experimentally obtained η is derived. A record high ηint of typically 15% is obtained for a freestanding GaN crystal grown by hydride vapor phase epitaxy on a GaN seed crystal synthesized by the ammonothermal method using an acidic mineralizer, when the excitation photon energy and power density were 3.81 eV and 60 W/cm2, r...

Electronic and optical characteristics of an m-plane GaN single crystal grown by hydride vapor phase epitaxy on a GaN seed synthesized by the ammonothermal method using an acidic mineralizer

Fundamental electronic and optical properties of a low-resistivity m-plane GaN single crystal, which was grown by hydride vapor phase epitaxy on a bulk GaN seed crystal synthesized by the ammonothermal method in supercritical ammonia using an acidic mineralizer, were investigated. The threading dislocation and basal-plane staking-fault densities of the crystal were around 104 cm−2 and less than 100 cm−1, respectively. Oxygen doping achieved a high electron concentration of 4 × 1018 cm−3 at room temperature. Accordingly, a photoluminescence (PL) band originating from the recombination of hot carriers was observed at low temperatures, even under weak excitation conditions. The simultaneous realization of low-level incorporation of Ga vacancies (VGa) less than 1016 cm−3 was confirmed by using the positron annihilation technique. Consistent with our long-standing claim that VGa complexes are the major nonradiative recombination centers in GaN, the fast-component PL lifetime of the near-band-edge emission at room temperature longer than 2 ns was achieved.

Demonstration of omnidirectional photoluminescence (ODPL) spectroscopy for precise determination of internal quantum efficiency of radiation in GaN single crystals

For rating unambiguous performance of a light-emitting semiconductor material, determination of the absolute quantum efficiency (AQE) of radiation, which is basically a product of internal quantum efficiency (IQE) and light-extraction efficiency, is the most delightful way. Here, we propose the use of omnidirectional photoluminescence (ODPL) spectroscopy for quantifying AQE of the near-band-edge (NBE) emission, in order to evaluate bulk GaN crystals and wafers. When the measurement was carried out in the air, the AQE showed a continuous decrease most likely due to the formation of extrinsic nonradiative recombination channels at the surface by photo-pumping. However, such an influence was suppressed by measuring ODPL in an inert ambient such as nitrogen or in vacuum. Consequently, AQE was revealed to depend on the photo-pumping density. The increase in AQE of the NBE emission caused by the increase in the excess carrier concentration was significant, indicating gradual saturation of nonradiative recombina...

Local excitation and emission dynamics of an isolated single basal-plane stacking-fault in GaN studied by spatio-time-resolved cathodoluminescence

Local excitation and emission dynamics of an isolated “Type-I1” basal-plane stacking-fault (BSF) in very low dislocation density GaN were studied using spatio-time-resolved cathodoluminescence. The low temperature lifetime of the BSF emission was quantified to be 640 ps. The carrier diffusion length was estimated by observing the temporal delay of the BSF peak relative to the free-exciton signal as a function of distance from the BSF. The results indicate that the near-band-edge emission leads to subsequent optical excitation of the BSF that increases the apparent diffusion length. Limiting the observation volume can improve the spatial resolution.