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Dive into the research topics where Hirotoshi Fujie is active.

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Journal of Macromolecular Science, Part A | 1992

Preparation and Thermal Decomposition of Cyclic Azoamidinium Salts as Water-Soluble Radical Initiators for Polymerization over A Wide Temperature Range

Hirotoshi Fujie; Kazuo Shiraki; Tsutomu Miyagawa; Noriaki Minamii; Bunichiro Yamada; Takayuki Otsu

Abstract A series of cyclic azoamidinium chlorides as water-soluble initiators were prepared by reactions of the iminoether derived from 2,2′-azobisisobutyronitrile with substituted alkylene diamines. The first-order rate constants for the decomposition of the azoamidinium salts varied from 0.59 × 10−5 to 14.1 × 10−5 s−1 with the ring size and the alkyl substitution of the ring. Decomposition of 2,2′-azobis[2-(imidazoline-2-yl)propane] dihydrochloride was found to be accelerated by alkyl substitution on the imidazolinium ring. However, the azoamidinium compounds having larger rings, 2,2′-azobis[2-(3,4,5-trihydropyrimi-dine-2-yl)propane] dihydrochloride and 2,2′-azobis[2-(4,5,6,7-tetra-hydro-1H-1,3-diazepine-2-yl)propane] dihydrochloride, decomposed at a slower rate than the unsubstituted azobis[2-(imidazoline-2-yl)-propane] dihydrochloride. These new initiators were found to be capable of initiating radical polymerizations of acrylamide and vinyl acetate.


Archive | 1991

Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere

Fumiyoshi Urano; Masaaki Nakahata; Hirotoshi Fujie; Keiji Oono


Archive | 1996

Polymer and resist material

Fumiyoshi Urano; Hirotoshi Fujie; Keiji Oono


Archive | 1995

Pattern formation process

Fumiyoshi Urano; Hirotoshi Fujie; Keiji Oono; Takaaki Negishi


Archive | 1991

Chemical amplified resist material

Fumiyoshi Urano; Masaaki Nakahata; Hirotoshi Fujie; Keiji Oono


Archive | 1998

Resist composition containing specific cross-linking agent

Motoshige Sumino; Hirotoshi Fujie; Akiko Katsuyama; Masayuki Endo


Archive | 1991

Resist material and process for forming pattern using the same

Fumiyoshi Urano; Masaaki Nakahata; Hirotoshi Fujie; Keiji Oono


Archive | 1998

Agent for reducing the substrate dependence of resist

Hirotoshi Fujie; Tohru Souki; Yukiko Uehara


Archive | 1998

Method for reducing the substrate dependence of resist

Hirotoshi Fujie; Tohru Souki; Yukiko Uehara


Archive | 1998

Improving agent for substrate dependence of resist

Hirotoshi Fujie; Toru Soki; Yukiko Uehara; 有紀子 上原; 徹 左右木; 啓利 藤江

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