Hirotsugu Yasuda

Luminous chemical vapor deposition and interface engineering

FUNDAMENTALS OF LUMINOUS CHEMICAL VAPOR DEPOSITION Introduction Domain of LCVD Luminous Gas Phase Creation of Chemically Reactive Species in LCVD Growth and Deposition Mechanisms Dangling Bonds Chemical Structures of Organic Compounds for LCVD Deposition Kinetics Ablation by Luminous Gas (Low Pressure Plasma) Competitive Ablation and Polymerization Internal Stress in Material Formed by LCVD OPERATION OF LUMINOUS CHEMICAL VAPOR DEPOSITION AND TREATMENT Modes of Operation and Scale-Up Principle CD & Alternating Current Discharge Anode Magnetron Discharge Low-Pressure Cascade Arc Torch (LPCAT) Anode Magetron Torch Primary, Secondary, and Pulsed Discharges Rector Size Flow Pattern Composition Graded Transition Phase Tumbler Reactor FUNDAMENTALS OF SURFACE AND INTERFACE Surface Configuration Surface State Surface Dynamics Contact Angle and Wettability Sessile Bubble Formation and Detachment INTERFACE ENGINEERING. Principle for Interface Egnineering Creation of Imperturbable Surface Creating Adhesion to Substrate Surfaces Corrosion Protection of Aluminum Alloys Corrosion of Ion Vapor Deposited (IVD) Aluminum Corrosion Protection of Cold Rolled Steel and Pure Iron Membrane Preparation and Modification Application of LCVD in Biomaterials Economical Advantages of LCVD