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Dive into the research topics where Hisashi Kasahara is active.

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Proceedings of SPIE, the International Society for Optical Engineering | 2005

A comprehensive reticle handling and storage approach for optimized fab yields

Atsushi Nobe; Hideaki Kawashima; Akinori Kurikawa; Hisashi Kasahara; Fumiko Ohta; Yasushi Okubo

In the field, each customer uses their owned designed reticle case as for shipping, storage. To modify the case is so expensive that it is very difficult to improve, especially in time respect. At the blank suppliers, they ship their mask blanks packing into their owned designed multiple shipper, however the market needs single shipper with next generation blanks to prevent from particle and outgas of case material damage. At the mask shops, most of them use MP567 (Trade mark of Dainichi Shoji K.K.) single case which was designed about 15years ago to ship their products to their customers. It is not designed for robot handling, so contamination from manual handling makes reticle damaged. Adhesive tape is also required to seal it, so chemical contamination will be occurred on quartz glass, i.e. haze. At the IC fabs, scanner case such as Nikon, Canon and ASML case is the most common in their process. However these cases are not airtight, so they cannot be handled under class 10000 circumstances. RSP (Reticle SMIF Pod) has a capability of automatic transportation, however it is not airtight case. We develop new mask case named Universal Reticle Pod (URP) at affordable price, airtight and chemical tight so as to be used as shipping, storage and process case. We evaluate it as blanks shipping case, so we would like to report its results.


Archive | 2005

Manufacturing method of mask blank glass substrate, manufacturing method of mask blank, mask blank glass substrate, and mask blank

Hisashi Kasahara; Akinori Kurikawa; Yasushi Okubo; 靖 大久保; 明典 栗川; 比佐志 笠原


Archive | 2006

Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask

Akinori Kurikawa; Hisashi Kasahara; Yasushi Okubo


Archive | 2005

Method for manufacturing glass substrate for mask blanks, glass substrate for mask blanks, method for manufacturing mask blanks, and mask blanks

Hisashi Kasahara; Akinori Kurikawa; Hiroshi Oshiba; 広巳 大柴; 明典 栗川; 比佐志 笠原


Archive | 2009

Photomask manufacturing method

Yasushi Okubo; Hisashi Kasahara


Archive | 2008

Glass substrate for mask blank, method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, and method for manufacturing mask

Hisashi Kasahara; Yasushi Okubo; 靖 大久保; 比佐志 笠原


Archive | 2011

マスクブランク用ガラス基板、マスクブランク、マスクおよび反射型マスク並びにこれらの製造方法

Hisashi Kasahara; Yasushi Okubo; 靖 大久保; 比佐志 笠原


Archive | 2011

Mask blank glass substrate, mask blank, mask and reflective mask and method for manufacturing these

Hisashi Kasahara; Yasushi Okubo; 靖 大久保; 比佐志 笠原


Archive | 2009

MASK BLANK GLASS SUBSTRATE, MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, AND MASK MANUFACTURING METHOD

Hisashi Kasahara; Yasushi Okubo


Archive | 2009

Maskenrohlingglassubstrat, Maskenrohlingglassubstratherstellungsverfahren, Maskenrohlingherstellungsverfahren und Maskenherstellungsverfahren Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing processes and mask manufacturing process

Hisashi Kasahara; Yasushi Okubo

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