Hisashi Mitsuhashi

Novel fluorinated compounds that improve durability of antistick layer for quartz mold

In recent years, the reduction in pattern size is driving the rapid adoption of nanoimprint lithography (NIL). Since nanoimprinting since is contact printing, a higher separation force might damage the master and/or the imprint tool, either of which degrades pattern quality. One of the biggest concerns in NIL utilization is the mold-release characteristic of the master and the resin. Although Optool DSXTM (DAIKIN Ind. Ltd.) is a de facto standard as mold release reagent, there is a problem with its UV-NIL durability. Accordingly, we focused on developing new fluorinated low molecular weight perfluorocompounds to enhance the mold-release characteristic of the resist. This paper reports that resists containing these fluroinated compounds offer improved durability as antistick layers for quartz molds subjected to repeated UV-NIL exposure.

Novel fluorinated compounds for releasing material in nanoimprint lithography

In recent years, utilization and reduction of pattern size are following nanoimprint lithography (NIL) quickly. In nanoimprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. There is a mold-release characteristic of a master and resin as one of the biggest subjects in utilization. Although Optool DSXTM (DAIKIN Ind. Ltd.) is an de facto standard as mold releasing reagent now, there is a problem in durability at UV-NIL. Then, we focused on the material which raises the mold-release characteristic of resist. The new fluorinated copolymers based on α-chloroacrylate and the low molecular weight perfluorocompounds, added to resist was developed. In this paper, we will report these synthesis method, specific properties such as static contact angle, releasing force and further fluorinated compounds were segregated resin surface.