Hitoshi Tsuji

Wafer stage apparatus for attracting and holding semiconductor wafer

Method of manufacturing a semiconductor device involving sidewall spacer formation

Method of etching isolation and alignment mark regions using a single resist mask

Making a semiconductor device with ammonia treatment of photoresist

Method of forming contact holes

Method of forming a thin film pattern with a trapezoidal cross section

Method of forming micro patterns

Method of manufacturing HEMT device using novolak-based positive-type resist

Method of making a negative photoresist image

Method of manufacturing a semiconductor device, including a step of forming a pattern on a photo-resist film