Hongchang Wang

X-ray wavefront characterization using a rotating shearing interferometer technique

A fast and accurate method to characterize the X-ray wavefront by rotating one of the two gratings of an X-ray shearing interferometer is described and investigated step by step. Such a shearing interferometer consists of a phase grating mounted on a rotation stage, and an absorption grating used as a transmission mask. The mathematical relations for X-ray Moiré fringe analysis when using this device are derived and discussed in the context of the previous literature assumptions. X-ray beam wavefronts without and after X-ray reflective optical elements have been characterized at beamline B16 at Diamond Light Source (DLS) using the presented X-ray rotating shearing interferometer (RSI) technique. It has been demonstrated that this improved method allows accurate calculation of the wavefront radius of curvature and the wavefront distortion, even when one has no previous information on the grating projection pattern period, magnification ratio and the initial grating orientation. As the RSI technique does not require any a priori knowledge of the beam features, it is suitable for routine characterization of wavefronts of a wide range of radii of curvature.

At-wavelength metrology of hard X-ray mirror using near field speckle

We present a method to measure the surface profile of hard X-ray reflective optics with nanometer height accuracy and sub-millimetre lateral resolution. The technique uses X-ray near-field speckle, generated by a scattering membrane translated using a piezo motor, to infer the deflection of X-rays from the surface. The method provides a nano-radian order accuracy on the mirror slopes in both the tangential and sagittal directions. As a demonstration, a pair of focusing mirrors mounted in a Kirkpatrick-Baez (KB) configuration were characterized and the results were in good agreement with offline metrology data. It is hoped that the new technique will provide feedback to optic manufacturers to improve mirror fabrication and be useful for the online optimization of active, nano-focusing mirrors on modern synchrotron beamlines.

Broadband Mo∕Si multilayer transmission phase retarders for the extreme ultraviolet

Experimental results on aperiodic broadband transmission molybdenum/silicon multilayer phase retarders for the extreme ultraviolet range are presented. The broadband phase retarders were designed using a numerical method and made using direct current magnetron sputtering on silicon nitride membrane. The polarization properties of these aperiodic transmission phase retarders have been investigated using the soft x-ray polarimeter at BESSY-II. The measured phase shift was about 42° in the wavelength range of 13.8–15.5nm, and the corresponding s-component transmission (Ts) decreased from 6% to 2% with increasing wavelength.

Complete polarization analysis of extreme ultraviolet radiation with a broadband phase retarder and analyzer

The polarization state of the BESSY UE56/1-PGM beamline radiation in the broad wavelength range of 12.7–15.5nm was measured using a molybdenum/silicon transmission phase retarder and a reflection analyzer with aperiodic multilayer interference structures, which can broaden the spectral response of these optical elements. The characteristics of the circular polarized undulator radiation, as well as the polarization properties of the two polarizing elements, were determined by a complete polarization analysis. Furthermore, the polarization of the radiation as a function of the undulator shift setting was also measured at the wavelength of 13.1nm by use of the broadband phase retarder-analyzer pair.

Broadband multilayer polarizers for the extreme ultraviolet

Nonperiodic molybdenum/silicon broadband multilayer polarizers have been designed using numerical optimization algorithm and fabricated using direct current magnetron sputtering. Their performances have been characterized using the high precision eight-axis soft x-ray polarimeter at the BESSY facility. Different multilayers have measured s-polarized reflectivities of 27% at 13.1nm and higher than 15% over the wavelength range of 13–19nm. Nearly constant s reflectivity, up to 37%, is observed over the 15–17nm wavelength range, where the degree of polarization is more than 98%. Furthermore, these multilayer polarizers also show high s reflectivity and polarization over a broad angular range at fixed wavelength.

From synchrotron radiation to lab source: advanced speckle-based X-ray imaging using abrasive paper

X-ray phase and dark-field imaging techniques provide complementary and inaccessible information compared to conventional X-ray absorption or visible light imaging. However, such methods typically require sophisticated experimental apparatus or X-ray beams with specific properties. Recently, an X-ray speckle-based technique has shown great potential for X-ray phase and dark-field imaging using a simple experimental arrangement. However, it still suffers from either poor resolution or the time consuming process of collecting a large number of images. To overcome these limitations, in this report we demonstrate that absorption, dark-field, phase contrast, and two orthogonal differential phase contrast images can simultaneously be generated by scanning a piece of abrasive paper in only one direction. We propose a novel theoretical approach to quantitatively extract the above five images by utilising the remarkable properties of speckles. Importantly, the technique has been extended from a synchrotron light source to utilise a lab-based microfocus X-ray source and flat panel detector. Removing the need to raster the optics in two directions significantly reduces the acquisition time and absorbed dose, which can be of vital importance for many biological samples. This new imaging method could potentially provide a breakthrough for numerous practical imaging applications in biomedical research and materials science.

Fast optimization of a bimorph mirror using x-ray grating interferometry

An x-ray grating interferometer was employed for in situ optimization of an x-ray bimorph mirror. Unlike many other at-wavelength techniques, only a single interferogram image, captured out of the focal plane, is required, enabling the optical surface to be quickly optimized. Moiré fringe analysis was used to calculate the wavefront slope error, which is proportional to the mirrors slope error. Using feedback from grating interferometry, the slope error of a bimorph mirror was reduced to <200  nrad (rms) in only two iterations. This technique has the potential to create photon beams with spatially homogeneous intensities for use in synchrotron and free electron laser beam lines.

Extreme ultraviolet broadband Mo/Y multilayer analyzers

Broadband extreme ultraviolet molybdenum/yttrium aperiodic multilayer analyzers were designed for polarization experiments in 8.5–11.7nm wavelength range. The multilayer analyzers were made using direct current magnetron sputtering and characterized using the soft x-ray polarimeter at BESSY-II facility. Measured s reflectivities at the Brewster angle are 5.5% for a multilayer designed for 8.5–10.1nm wavelength range and 6.1% for one designed for 9.1–11.7nm. The multilayers also exhibit high polarization degree up to 98.79%. In addition, the multilayer was also measured over 38°–52° angular range at the fixed wavelength of 10.2nm and the mean s reflectivity is 6.2%.

X-ray submicrometer phase contrast imaging with a Fresnel zone plate and a two dimensional grating interferometer

The application of a two dimensional (2D) grating interferometer-Fresnel zone plate combination for quantitative submicron phase contrast imaging is reported. The combination of the two optical elements allows quick recovery of the phase shift introduced by a sample in a hard X-ray beam, avoiding artifacts observed when using the one dimensional (1D) interferometer for a sample with features oriented in the unsensitive direction of the interferometer. The setup provides submicron resolution due to the optics magnification ratio and a fine sensitivity in both transverse orientations due to the 2D analysis gratings. The method opens up possibilities for sub-micro phase contrast tomography of microscopic objects made of light and/or homogeneous materials with randomly oriented features.

Broad angular multilayer analyzer for soft X-rays

Using numerical optimization algorithm, non-periodic Mo/Si, Mo/Be, and Ni/C broad angular multilayer analyzers have been designed. At the wavelength of 13 nm and the angular range of 45~49 degrees , the Mo/Si and Mo/Be multilayer can provide the plateau s-reflectivity of 65% and 45%, respectively. At 5.7 nm, the s-reflectivity of Ni/C multilayer is 16% in the 44~46 degrees range. The non-periodic Mo/Si broad angular multilayer was also fabricated using DC magnetron sputtering, and characterized using the soft X-ray polarimeter at BESSY. The s-reflectivity is higher than 45.6% over the angular range of 45~49 degrees at 13 nm, where, the degree of polarization is more than 99.98%.