Huang Qiushi

Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens

The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 mu m-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 mu m. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.

X-ray nanometer focusing at the SSRF based on a multilayer Laue lens*

We designed and fabricated a multilayer Laue lens (MLL) as a hard X-ray focusing device. WSi2/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sample was fabricated by using direct current (DC) magnetron sputtering technology and then was sliced and thinned to form an MLL. The thickness of each layer was determined by scanning electron microscopy (SEM) image analysis with marking layers. The focusing property of the MLL was measured at Beamline 15U, Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 92 nm are obtained at photon energy of 14 keV.