Huili Liang

Nanostructure Formation and Passivation of Large-Area Black Silicon for Solar Cell Applications

Nanoscale textured silicon and its passivation are explored by simple low-cost metal-assisted chemical etching and thermal oxidation, and large-area black silicon was fabricated both on single-crystalline Si and multicrystalline Si for solar cell applications. When the Si surface was etched by HF/AgNO(3) solution for 4 or 5 min, nanopores formed in the Si surface, 50-100 nm in diameter and 200-300 nm deep. The nanoscale textured silicon surface turns into an effective medium with a gradually varying refractive index, which leads to the low reflectivity and black appearance of the samples. Mean reflectance was reduced to as low as 2% for crystalline Si and 4% for multicrystalline Si from 300 to 1000 nm, with no antireflective (AR) coating. A black-etched multicrystalline-Si of 156 mm × 156 mm was used to fabricate a primary solar cell with no surface passivation or AR coating. Its conversion efficiency (η) was 11.5%. The cell conversion efficiency was increased greatly by using surface passivation process, which proved very useful in suppressing excess carrier recombination on the nanostructured surface. Finally, a black m-Si cell with efficiency of 15.8% was achieved by using SiO(2) and SiN(X) bilayer passivation structure, indicating that passivation plays a key role in large-scale manufacture of black silicon solar cells.

Dual-band MgZnO ultraviolet photodetector integrated with Si

We have constructed a dual-band ultraviolet photodetector by growing high quality MgxZn1−xO layers on Si substrate with molecular beam epitaxy. The device performance was studied by current-voltage, capacitance-voltage, spectra photoresponse, and time-resolved photoresponse characterizations. It demonstrates a high UV/visible light rejection ratio of more than 2 orders of magnitude and a fast response speed of less than 100 ms. The cutoff wavelength can be at solar-blind (280 nm)/visible-blind (301 nm) region by applying 1 V forward/2 V reverse bias. The working principle of the dual-band photodetector was finally investigated by interpretation of the specific carrier transport behavior with the energy band diagram.

Probing Defects in Nitrogen-Doped Cu2O

Nitrogen doping is a promising method of engineering the electronic structure of a metal oxide to modify its optical and electrical properties; however, the doping effect strongly depends on the types of defects introduced. Herein, we report a comparative study of nitrogen-doping-induced defects in Cu2O. Even in the lightly doped samples, a considerable number of nitrogen interstitials (Ni) formed, accompanied by nitrogen substitutions (NO) and oxygen vacancies (VO). In the course of high-temperature annealing, these Ni atoms interacted with VO, resulting in an increase in NO and decreases in Ni and VO. The properties of the annealed sample were significantly modified as a result. Our results suggest that Ni is a significant defect type in nitrogen-doped Cu2O.

Comparative study of n-MgZnO/p-Si ultraviolet-B photodetector performance with different device structures

A comparative study of n-MgZnO/p-Si UV-B photodetector performance was carried out with different device structures. The experimental results demonstrate superior photoresponse characteristics of the p-n heterojunction detector against the Schottky type metal-semiconductor-metal counterpart, including a sharper cutoff wavelength at 300 nm, a larger peak photoresponsivity of 1 A/W, and a faster response speed. The role of built-in field and low interface scattering in p-n heterojunction is explored, and the energy band diagram of n-MgZnO/p-Si is employed to interpret the efficient suppression of visible light photoresponse from Si substrate, revealing the applicability of this heterostructure in fabrication of deep ultraviolet detectors.

Maskless inverted pyramid texturization of silicon

We discovered a technical solution of such outstanding importance that it can trigger new approaches in silicon wet etching processing and, in particular, photovoltaic cell manufacturing. The so called inverted pyramid arrays, outperforming conventional pyramid textures and black silicon because of their superior light-trapping and structure characteristics, can currently only be achieved using more complex techniques involving lithography, laser processing, etc. Importantly, our data demonstrate a feasibility of inverted pyramidal texturization of silicon by maskless Cu-nanoparticles assisted etching in Cu(NO3)2 / HF / H2O2 / H2O solutions and as such may have significant impacts on communities of fellow researchers and industrialists.

Interface engineering of high-Mg-content MgZnO/BeO/Si for p-n heterojunction solar-blind ultraviolet photodetectors

High-quality wurtzite MgZnO film was deposited on Si(111) substrate via a delicate interface engineering using BeO, by which solar-blind ultraviolet photodetectors were fabricated on the n-MgZnO(0001)/p-Si(111) heterojunction. A thin Be layer was deposited on clean Si surface with subsequent in situ oxidation processes, which provides an excellent template for high-Mg-content MgZnO growth. The interface controlling significantly improves the device performance, as the photodetector demonstrates a sharp cutoff wavelength at 280 nm, consistent with the optical band gap of the epilayer. Our experimental results promise potential applications of this technique in integration of solar-blind ultraviolet optoelectronic device with Si microelectronic technologies.

Broadband antireflection on the silicon surface realized by Ag nanoparticle-patterned black silicon

Broadband antireflection of silicon has been realized by combining black silicon, surface passivation and surface plasmons. Black silicon, fabricated by Ag assisted chemical etching, was employed here to reduce the reflection of incident light with wavelengths below 1100 nm. Due to the increased bandgap caused by the quantum confinement effect and enhanced backward-scattering in our black silicon, light trapping was diminished at the wavelengths above 1100 nm. Ag nanoparticles were deposited on black silicon to obtain the lowest reflectivity at the wavelengths above 1100 nm. Compared with traditionally textured multicrystalline silicon, the average reflectivity of passivated black multicrystalline silicon patterned with 5 nm mass thickness of Ag was decreased to 5.7% in the wavelength range from 300 nm to 1100 nm and was reduced by 20.2% in the wavelength range from 1100 nm to 1400 nm. The surface plasmon effect of the Ag nanoparticles on the black silicon was also demonstrated by surface enhanced Raman scattering, which was observed in the Ag nanoparticle patterned black silicon after being immersed in rhodamine 6g.

Interface Engineering of High Efficiency Organic-Silicon Heterojunction Solar Cells

Insufficient interface conformity is a challenge faced in hybrid organic-silicon heterojunction solar cells because of using conventional pyramid antireflection texturing provoking the porosity of interface. In this study, we tested alternative textures, in particular rounded pyramids and inverted pyramids to compare the performance. It was remarkably improved delivering 7.61%, 8.91% and 10.04% efficiency employing conventional, rounded, and inverted pyramids, respectively. The result was interpreted in terms of gradually improving conformity of the Ag/organic/silicon interface, together with the gradually decreasing serial resistance. Altogether, the present data may guide further efforts arising the interface engineering for mastering high efficient heterojunction solar cells.

Alloy-fluctuation-induced exciton localization in high-Mg-content (0.27 ≤ x ≤ 0.55) wurtzite MgxZn1−xO epilayers

National Science Foundation [50532090, 60606023, 60621091, 10804126, 10974246]; Ministry of Science and Technology of China [2007CB936203, 2009CB929400]; National Synchrotron Radiation Laboratory, Hefei, China; Research Council of Norway

Engineering of optically defect free Cu2O enabling exciton luminescence at room temperature

Cu2O is an interesting semiconductor with extraordinary high exciton binding energy, however exhibiting weak room temperature excitonic luminescence. The issue was addressed in literature emphasizing a detrimental role of native point defects responsible for optical quenching. Resolving the problem, we propose a method to manipulate the Cu and O vacancies contents opening a gateway for optoelectronic applications of Cu2O. Specifically, applying oxygen lean conditions, we observe a remarkable suppression of VCu enabling strong room temperature exciton luminescence, while manipulating with VO reveals no impact on the signal. As a result, the excitonic signature was interpreted in terms of phonon assisted transitions.