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Hye-Keun Oh

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Publication

Featured researches published by Hye-Keun Oh.

Journal of the Korean Physical Society | 2005

Reduction of the absorber shadow effect by changing the absorber side wall angle in extreme ultraviolet lithography

Myoung-Sul Yoo; Young-Doo Jeon; Hye-Keun Oh; Jin-Ho Ahn

Journal of the Korean Physical Society | 2006

The influence of transmission reduction by mask haze formation in ArF lithography

Sung-Jin Kim; Jung-Hyuk Cho; Jin-Back Park; Sung-Hyuck Kim; Jaisun Kyoung; Seung-Wook Park; Ilsin An; Hye-Keun Oh

Journal of the Korean Physical Society | 2006

Mask error enhancement factor variation with pattern density for 65 nm and 90 nm line widths

Hye-Young Kang; Chang-Ho Lee; Sung-Hyuck Kim; Hye-Keun Oh

Journal of the Korean Physical Society | 2006

Modeling for resist reflow of an elongated contact hole

Jieun Lee; Kang Baek Kim; Mi-Rim Jung; Hye-Young Kang; Jong-Sun Kim; Joo-Yoo Hong; Hye-Keun Oh; Dai-Gyoung Kim; Jun-Tack Park

Journal of the Korean Physical Society | 2006

Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks

Jung-Hyuk Cho; Jung-Min Sohn; Sung-Hyuck Kim; Jong-Sun Kim; Jin-Back Park; Sung-Jin Kim; Hye-Keun Oh

Journal of the Korean Physical Society | 2003

Prediction of the critical dimensions by using a threshold energy resist model

Ji-Yong Yoo; Young-Keun Kwon; Jun-Taek Park; Dong-Soo Sohn; Sang-Gon Kim; Young-Su Sohn; Hye-Keun Oh; Woo-Sung Han

Journal of the Korean Physical Society | 2005

Calibration-free multichannel ellipsometry for retardance measurement

Ilsin An; J. S. Kyung; Kyoung-Yoon Bang; Ok-Kyung Kim; Hye-Keun Oh; R. W. Collins

Journal of the Korean Physical Society | 2005

Lens aberration effect on the line width for different pattern shapes and duty ratios

Jieun Lee; Seung-Wook Park; Ilsin An; Hye-Keun Oh; Chang-Ho Lee

Journal of the Korean Physical Society | 2004

Aerial image characterization for defects in an extreme-ultraviolet mask

Myoung-Sul Yoo; Seung-Wook Park; Ok-Kyung Kim; Hye-Keun Oh

Journal of the Korean Physical Society | 2003

A practical method of extracting the photoresist exposure parameters by using a dose-to-clear swing curve

Hyoung-Hee Kim; Ji-Yong Yoo; Seung-Wook Park; Young-Keun Kwon; Ilsin An; Hye-Keun Oh

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Collaboration

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Seung-Wook Park

Hanyang University

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Sung-Hyuck Kim

Samsung

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Young-Keun Kwon

Hanyang University

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Chang-Ho Lee

Hanyang University

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Hye-Young Kang

Hanyang University

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Ji-Yong Yoo

Hanyang University

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Jieun Lee

Korea University

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Jin-Back Park

Hanyang University

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Jong-Sun Kim

Hanyang University

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Jung-Hyuk Cho

Samsung

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