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Dive into the research topics where Hyunsang Hwang is active.

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Featured researches published by Hyunsang Hwang.


Applied Physics Letters | 2007

Reproducible hysteresis and resistive switching in metal-CuxO-metal heterostructures

Rui Dong; Daeseok Lee; Wenfeng Xiang; Seung-Hwan Oh; Dong-jun Seong; Sungho Heo; Hyejung Choi; Moonjae Kwon; Seong-Bum Seo; M. B. Pyun; Musarrat Hasan; Hyunsang Hwang

Materials showing reversible resistance switching between high-resistance state and low-resistance state at room temperature are attractive for today’s semiconductor technology. In this letter, the reproducible hysteresis and resistive switching characteristics of metal-CuxO-metal (M-CuxO-M) heterostructures driven by low voltages are demonstrated. The fabrication of the M-CuxO-M heterostructures is fully compatible with the standard complementary metal-oxide semiconductor process. The hysteresis and resistive switching behavior are discussed. The good retention characteristics are exhibited in the M-CuxO-M heterostructures by the accurate controlling of the preparation parameters.


Advanced Materials | 2010

Three-Dimensional Integration of Organic Resistive Memory Devices

Sunghoon Song; Byungjin Cho; Tae-Wook Kim; Yongsung Ji; Minseok Jo; Gunuk Wang; Minhyeok Choe; Yung Ho Kahng; Hyunsang Hwang; Takhee Lee

Since the discovery of conducting polymers [ 1 ] , organic-based electronics such as organic light-emitting diodes, transistors, photovoltaics, and memory devices have been spotlighted as potentially innovative devices given their easy and lowcost fabrication by spin-coating or ink-jet printing, and their fl exibility. [ 2–15 ] Among these, organic memories have been extensively investigated for data-storage application. [ 11 , 14 , 16–21 ]


Nanotechnology | 2011

Analog memory and spike-timing-dependent plasticity characteristics of a nanoscale titanium oxide bilayer resistive switching device.

Kyungah Seo; Insung Kim; Seungjae Jung; Minseok Jo; Sangsu Park; Jubong Park; Jungho Shin; Kuyyadi P. Biju; Jaemin Kong; Kwanghee Lee; B. H. Lee; Hyunsang Hwang

We demonstrated analog memory, synaptic plasticity, and a spike-timing-dependent plasticity (STDP) function with a nanoscale titanium oxide bilayer resistive switching device with a simple fabrication process and good yield uniformity. We confirmed the multilevel conductance and analog memory characteristics as well as the uniformity and separated states for the accuracy of conductance change. Finally, STDP and a biological triple model were analyzed to demonstrate the potential of titanium oxide bilayer resistive switching device as synapses in neuromorphic devices. By developing a simple resistive switching device that can emulate a synaptic function, the unique characteristics of synapses in the brain, e.g. combined memory and computing in one synapse and adaptation to the outside environment, were successfully demonstrated in a solid state device.


Advanced Materials | 2010

Rewritable Switching of One Diode–One Resistor Nonvolatile Organic Memory Devices

Byungjin Cho; Tae-Wook Kim; Sunghoon Song; Yongsung Ji; Minseok Jo; Hyunsang Hwang; Gun Young Jung; Takhee Lee

[*] Prof. T. Lee, B. Cho, T.-W. Kim, S. Song, Y. Ji, M. Jo, Prof. H. Hwang, Prof. G.-Y. Jung Department of Materials Science and Engineering Gwangju Institute of Science and Technology 1 Oryong-Dong, Buk-Gu Gwangju 500-712 (Korea) E-mail: [email protected] Prof. T. Lee, Prof. H. Hwang Department of Nanobio Materials and Electronics Gwangju Institute of Science and Technology 1 Oryong-Dong, Buk-Gu Gwangju 500-712 (Korea)


IEEE Electron Device Letters | 2011

Excellent Selector Characteristics of Nanoscale

Myungwoo Son; Joonmyoung Lee; Jubong Park; Jungho Shin; Godeuni Choi; Seungjae Jung; Wootae Lee; Seonghyun Kim; Sangsu Park; Hyunsang Hwang

We herein present a nanoscale vanadium oxide (VO<sub>2</sub>) device with excellent selector characteristics such as a high on/off ratio (>; 50), fast switching speed (<; 20 ns), and high current density (>; 10<sup>6</sup> A/cm2). Owing to extrinsic defects, a large-area device with a 20-nm-thick VO<sub>2</sub> layer underwent an electrical short. In contrast, after scaling the device active area (<; 5 × 10<sup>4</sup> nm<sup>2</sup>), excellent switching uniformity was obtained. This can be explained by the reduced defects and the metal-insulator transition of the whole nanoscale VO<sub>2</sub>. By integrating a bipolar resistive random access memory device with the VO<sub>2</sub> selection device, a significantly improved readout margin was obtained. The VO<sub>2</sub> selection device shows good potential for cross-point bipolar resistive memory applications.


Journal of Applied Physics | 2003

\hbox{VO}_{2}

Sanghun Jeon; Hyunsang Hwang

The hygroscopic nature of lanthanide oxides such as Pr2O3, Sm2O3, Gd2O3, and Dy2O3 was characterized by means of x-ray photoelectron spectroscopy and its effect on the electrical characteristics of the compounds was investigated. Among the four samples, Pr2O3 was found to be the most reactive with water which can be attributed to the relatively large ionic radius and lower electronegativity of Pr. In contrast, Dy2O3 was the least reactive with water. A direct correlation between the hygroscopicity and electronegativity of lanthanide elements was found. With increasing hygroscopicity, a significant growth of interfacial oxide with annealing temperature was observed. A clear understanding of the nature of hygroscopic effects and the optimization of process flow will be needed for future high-k gate dielectric application.


Applied Physics Letters | 2006

for High-Density Bipolar ReRAM Applications

Dooho Choi; Dongsoo Lee; Hyunjun Sim; Man Chang; Hyunsang Hwang

Nonvolatile and reversible bistable and multistable resistance states of polycrystalline SrTiOx thin film were studied. The pulse-laser-deposition method was employed to grow the film, and the clear resistance switching was observed under dc bias sweep and voltage pulses. More than two controllable resistance states were observed by applying voltage pulses. These reversible states have a resistance difference by nearly two orders of magnitude, and we verified that this sharp resistance switching takes place at the metal-oxide interface. Excellent reliability characteristics, such as endurance cycles of up to 105 times and data retention time of up to 106s at 125°C demonstrate the promise of SrTiOx film for future nonvolatile random access memory applications.


IEEE Electron Device Letters | 2005

Effect of hygroscopic nature on the electrical characteristics of lanthanide oxides (Pr2O3, Sm2O3, Gd2O3, and Dy2O3)

Dongsoo Lee; Hyejung Choi; Hyunjun Sim; Dooho Choi; Hyunsang Hwang; Myoung-Jae Lee; Sunae Seo; I. K. Yoo

The resistance switching behavior and switching mechanism of nonstoichiometric zirconium oxide thin films were investigated for nonvolatile memory application. The Pt/ZrO/sub x//p/sup +/-Si sandwich structure fabricated by reactive sputtering shows two stable resistance states. By applying proper bias, resistance switching from one to another state can be obtained. The composition in ZrO/sub x/ thin films were confirmed from X-ray photoelectron spectroscope (XPS) analysis, which showed three layers such as top stoichiometric ZrO/sub 2/ layer with high resistance, transition region with medium resistance, and conducting ZrO/sub x/ bulk layer. The resistance switching can be explained by electron trapping and detrapping of excess Zr/sup +/ ions in transition layer which control the distribution of electric field inside the oxide, and, hence the current flow.


international electron devices meeting | 1990

Reversible resistive switching of SrTiOx thin films for nonvolatile memory applications

Hyunsang Hwang; W. Ting; Dim-Lee Kwong; Jack C. Lee

The electrical and physical characteristics of oxynitride grown in N/sub 2/O gas ambient have been studied. The dielectric growth rate in N/sub 2/O was found to be highly controllable and lower than that in O/sub 2/. Auger electron spectroscopy studies of oxynitride show a nitrogen-rich layer near the Si-SiO/sub 2/ interface. Compared with the control oxide, the oxynitride shows excellent electrical characteristics such as excellent diffusion barrier to dopant (BF/sub 2/), a significant reduction in interface state generation, less electron trapping, and much larger charge-to-breakdown under Fowler-Nordheim stress. A significantly lower threshold voltage shift and degradation of subthreshold swing under hot electron stress were also observed. These improvements can be explained by the nitrogen incorporation at Si-SiO/sub 2/ interface. This new oxynitride shows good promise for future ULSI application.<<ETX>>


Journal of Applied Physics | 2011

Resistance switching of the nonstoichiometric zirconium oxide for nonvolatile memory applications

Jungho Shin; Insung Kim; Kuyyadi P. Biju; Minseok Jo; Jubong Park; Joonmyoung Lee; Seungjae Jung; Wootae Lee; Seonghyun Kim; Sangsu Park; Hyunsang Hwang

We report a simple metal-insulator-metal (MIM)-type selection device that can alleviate the sneak current path in cross-point arrays. By connecting a nanometer-scale Pt/TiO2/TiN selection device to a Pt/TiO2−x/TiO2/W resistive random access memory (RRAM), we could significantly reduce read disturbance from unselected memory cells. This selection device could be easily integrated into an RRAM device, in which it suppressed the sneak current and significantly improved the readout margin compared to that obtained for an RRAM not using a selection device. The introduction of this MIM device can fulfill the requirement for an appropriate selection device for bipolar-type RRAM cross-point applications.

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Seungjae Jung

Gwangju Institute of Science and Technology

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Joonmyoung Lee

Gwangju Institute of Science and Technology

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Jubong Park

Gwangju Institute of Science and Technology

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Minseok Jo

Gwangju Institute of Science and Technology

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Seonghyun Kim

Gwangju Institute of Science and Technology

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Wootae Lee

Gwangju Institute of Science and Technology

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Jungho Shin

Gwangju Institute of Science and Technology

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Man Chang

Gwangju Institute of Science and Technology

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Hyejung Choi

Gwangju Institute of Science and Technology

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Sanghun Jeon

Gwangju Institute of Science and Technology

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