I A Artyukov

X-Ray reduction imaging of inclined reflective masks at critical angles

We have proposed and simulated optical schemes for producing reduced images by X-ray lasers or harmonic generators at a wavelength of . The mask in this case is placed at a small angle to the optical axis, corresponding to the angle of total external reflection of the material. We have determined the optimal position of the detector (resist) and the corresponding spatial resolution. The results can be used to solve problems in nanotechnology and nanostructuring of surfaces.

Laser-Electron X-Ray Generator

The possibility of developing a laser-electron x-ray generator based on the Thomson scattering of laser radiation by relativistic electrons and prospects for its application are considered. In its specifications (brightness, average intensity, and dimensions), as well as its construction and operation cost, such a generator is intermediate between x-ray tubes and synchrotron sources. The configuration of channels and experimental stations intended for applications of an x-ray laser-electron generator in studies of the elemental composition and structure of materials is discussed.

Soft X-ray microscopy in the spectral region of “carbon window” with the use of multilayer optics and a laser-plasma source

This paper reports on the fabrication and testing of multilayer mirrors for X-ray optical systems operating in the “carbon window” region (at wavelengths from 4.5 to 5.0 nm) and the results of their application in soft X-ray imaging of the internal structure of organic objects. The developed approaches to the fabrication and control of graded Co/C multilayer coatings have made it possible to create an X-ray multimirror system with a maximum known entrance aperture and throughput. The use of the developed high-spatial-resolution X-ray optics can significantly extend the field of practical application of soft X-ray absorption microscopy based on compact laser-plasma sources.

On contrast of biological X-ray nanomicroscopy

We analyse the absorption contrast of histological and cytological preparations, which can be achieved in nanomicroscopic studies using monochromatic radiation in the spectral range of 90 – 600 eV (14 – 2 nm). Two types of unstained biological objects are considered: untreated and fixed in paraffin, and optimum wavelengths are determined for the study of samples with a thickness of 0.5 – 10 μm with a spatial resolution of 100 – 20 nm. Taking into account the efficiency of X-ray optics, the number of source photons required to produce a single image is estimated. It is shown that the greatest interest for the study of fixed objects represents the spectral region of 7 – 14 nm, for which, on the basis of rapidly developing compact sources of incoherent and coherent radiation and effective optics, microscopes for scientific and clinical research can be designed.

Sliced linear zone plates for hard X-ray radiation

Linear zone plates for hard (E > 10 keV) X rays are considered. The technology of the plates includes cutting magnetron-sputtered W5Si3/Si multilayer coatings. The results of numerical computation suggest that this pair of materials provides a high efficiency in the first and second diffraction orders. It is found experimentally that good multilayer structures consisting of several hundreds of layers can be synthesized on silicon and glass substrates. It is shown that they can be cut by ion etching the multilayer coating through a mask.

Single-shot extreme ultraviolet microscopy with 54 nm resolution using a desktop-size capillary discharge laser

A compact full-field photon-based microscope based on a desktop-size 46.9 nm wavelength extreme ultraviolet laser that captures images with a single nanosecond laser pulse and with a measured spatial resolution of 54 nm is described.