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Ichiro Hayashida

Wako Pure Chemical Industries, Ltd

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Publication

Featured researches published by Ichiro Hayashida.

Archive | 1992

Surface treating cleaning method

Ichiro Hayashida; Masahiko Kakizawa; Kenichi Umekita; Hiroyoshi Nawa; Hisashi Muraoka

Archive | 2000

Cleaning agent for a semi-conductor substrate

Masahiko Kakizawa; Kenichi Umekita; Ichiro Hayashida

Archive | 2001

Semiconductor wafer cleaning agent and cleaning method

Masahiko Kakizawa; Mayumi Kimura; Hironori Mizuta; Ichiro Hayashida

Archive | 1995

Surface treating agents and treating process for semiconductors

Ichiro Hayashida; Masahiko Kakizawa

Archive | 2004

Cleaning agent for substrate and cleaning method

Hironori Mizuta; Masahiko Kakizawa; Ichiro Hayashida

Archive | 2008

Etching agent, etching method and liquid for preparing etching agent

Osamu Matsuda; Nobuyuki Kikuchi; Ichiro Hayashida; Satoshi Shirahata

Archive | 2003

Cleaning composition and method of cleaning therewith

Ichiro Hayashida; Hironori Mizuta; Takehisa Kato

Archive | 2003

Polishing composition and rinsing composition

Akihiro Kawase; Toshihiro Miwa; Kenji Sakamoto; Ichiro Hayashida

Archive | 2007

Etching solution for substrate

Takehisa Kato; Masahiko Kakizawa; Ichiro Hayashida

Archive | 2007

Solution de gravure pour un substrat

Takehisa Kato; Masahiko Kakizawa; Ichiro Hayashida

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