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Featured researches published by Ichiro Ichikawa.


Computer Aided Innovation of New Materials II#R##N#Proceedings of the Second International Conference and Exhibition on Computer Applications to Materials and Molecular Science and Engineering–CAMSE '92, Pacifico Yokohama, Yokohama, Japan, September 22–25, 1992 | 1993

Phase Transition Study of Liquid Crystalline Polymers by MD Simulations

Shinya Fukutomi; Ichiro Ichikawa; Mototsugu Yoshida; Akinobu Shiga

Molecular dynamics simulations are studied using mesogenic core model for liquid crystalline polymer. A temperature dependence of L/D ratio of the mesogen is analyzed. Simulations for typical liquid crystalline molecule TBBA (telephthal-bis-4-n-buthylaniline) are carried out under the constant temperature(at 100K intervals in the region 100–1000K). Time-averaged L/D calculated from the simulation data becomes smaller as temperature becomes higher. A deflection point exists in the region 500K-600K. Standard deviation of L/D changes drastically in the region 520K-540K. This temperature region corresponds to experimental isotropic-nematic transition temperature.


Archive | 1976

Process for producing transparent block copolymer resin

Tamotsu Miki; Shizuo Narisawa; Ichiro Ichikawa; Hideki Horiike


Archive | 1977

Method for producing transparent block copolymer resin

Tamotsu Miki; Shizuo Narisawa; Ichiro Ichikawa; Hideki Horiike


Archive | 1985

Method of purifying tantalum

Kenji Niwa; Ichiro Ichikawa


Archive | 1984

Alkaline solution for developing positive photoresists

Kenji Niwa; Ichiro Ichikawa


Archive | 1985

Production of high-purity lithium carbonate

Ichiro Ichikawa; Kenji Niwa; Yutaka Suzuki


Archive | 1987

Method of separating and purifying tantalum and niobium-containing compounds

Kenji Niwa; Ichiro Ichikawa; Masaharu Motone


Archive | 1978

Process for producing block copolymer from conjugated diene and vinyl aromatic

Tamotsu Miki; Shizuo Narisawa; Hideki Horiike; Ichiro Ichikawa


Archive | 1986

Positive photoresist aqueous developer solution containing quaternary ammonium hydroxide with aliphatic ketone or cyclic ether alone or with amine as development modifier

Kenji Niwa; Ichiro Ichikawa


Archive | 1985

Verfahren zur reinigung von tantal. Method for cleaning of tantalum.

Kenji Niwa; Ichiro Ichikawa

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