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Emerging Lithographic Technologies VIII | 2004

Optimized glass-ceramic substrate materials for EUVL applications

Ina Mitra; Jochen Alkemper; Rolf Mueller; Uwe Nolte; Axel Engel; Hrabanus Hack; Heiko Kohlmann; Volker Wittmer; Wolfgang Pannhorst; Mark J. Davis; Lutz Aschke; Konrad Knapp

EUV substrate materials have to meet enhanced requirements with respect to extreme low thermal expansion, high homogeneity and superior surface quality. A SCHOTT R&D program aims at the development of advanced materials covering these various aspects. The glass-ceramic Zerodur (registered trademark) of SCHOTT represents a substrate material currently used for EUV masks and optics of first generation tools due to its extremely low coefficient of thermal expansion (CTE) and its excellent homogeneity. Zerodur(registered trademark) even allows continuous shifting of the position of zero crossing of the CTE-slope to control the thermal expansion behavior according to varying customer requirements: As a result of specifically adjusted process parameters, samples of Zerodur (registered trademark) exhibit a coefficient of thermal expansion CTE < 5 ppb/K corresponding to the lowest expansion class of the SEMI standard P37 (19 to 25°C) for EUV mask blanks. By further variation of process parameters, the position of zero crossing, e.g. at 22.5°C or 30°C, can be varied, revealing an attractive attribute feature of Zerodur (registered trademark). A new dilatometer type reveals an improved reproducibility of ~ 1ppb/K in the temperature range of 0 to 50°C. A series of CTE(0;50°C) measurements with a test-cube of Zerodur (registered trademark) provides information on CTE homogeneity on a cm-scale: no CTE variation was observed within the error of measurements (1ppb/K) for a block exhibiting ± 3.5*10-6 variation in refractive index. CTE variation can cause surface deformations during changing temperature conditions. A Fizeau-Interferometer was used to record surface roughness at two different temperatures. This non- destructive metrology is regarded as a method to distinguish CTE variation < 1ppb/K. The surface deformation of Zerodur (registered trademark) due to elevated temperature was determined to be lower than the resolution. Both methods to analyze the CTE homogeneity of Zerodur (registered trademark) lead to the result of CTE variation below 1 ppb/K. Surface treatment of glass-ceramic material is a major challenge as final finishing of EUV substrates may increase roughness of super-polished surfaces significantly. Improved new glass-ceramic materials demonstrate optimization of glass-ceramic compositions to nearly meeting the specification of surface roughness after a standard finishing process. Recent achievements of material development reveal CTE-performance of this new glass-ceramic to also be adjustable to varying customer needs as already known for Zerodur (registered trademark). These results are regarded as a promising milestone to develop an optimized glass-ceramic material, because the features of the modified New-Glass Ceramic now better match the key requirements of EUVL substrate materials.


Emerging Lithographic Technologies VII | 2003

Improved materials meeting the demands for EUV substrates

Ina Mitra; Jochen Alkemper; Uwe Nolte; Axel Engel; Rolf Mueller; Simone Ritter; Hrabanus Hack; Klaus Megges; Heiko Kohlmann; Wolfgang Pannhorst; Mark J. Davis; Lutz Aschke; Konrad Knapp

The enhanced demands for substrate materials for next-generation optics and masks have initiated detailed investigations on Zerodur as a proposed EUVL substrate material with focus on thermal expansion behavior and surface roughness. As a result of specifically adjusted process parameters, the coefficient of thermal expansion (CTE) was tailored to be a minimum at 22.5°C. Laboratory samples of Zerodur exhibit a CTE < 5 ppb/K corresponding to the lowest expasnion class of the SEMI standard P37 (19 to 25°C) for EUV mask blanks. By further variation of process parameters, the position of zero crossing, e.g. at 30°C, can be varied, revealing an attractive attribute feature of Zerodur. A new dilatometer type was mounted in 2002 with first operatinoal results revealing an improved reproducibility of ~1ppb/K in the temperature range of 0 to 50°C. A series of CTE measurements with a small block of Zerodur provides information on CTE homogeneity on a cm-scale: No CTE variation was observed within the error of measurements for a block exhibiting ± 3.5*10-6 vairtion in refractinve index. CTE variation can cause surface deformations during changing temperature conditions. A first setup of Fizeau-Interferometer with a current resolution of 0.3 nm rms was used to record surface deformation of Zerodur due to elevated temperature was determined to be lower than the current resolution. Both methods to analyze the CTE homogeneity of Zerodur lead to the result of CTE variation below 1 ppb/K, still identifying todays need to improve metrology further. Final finishing of EUV substrates may increase roughness of super-polished surfaces significantly. Using appropriate processes a to surface roughness < 0.25 nm rms under production conditions can be achieved after final finishing of Zerodur. As an improved Zerodur-type material, recent achievements of material development demonstrate the optimization of glass-ceramic composition to nearly meeting the specification of surface roughness after a standard finishing process. These results are regarded as a promising milestone to develop an optimized glass-ceramic material providnig adjusted thermal expansion behavior and surface processability according to the specific demands of EUV technology.


Proceedings of SPIE, the International Society for Optical Engineering | 2001

Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur

Mark J. Davis; Alexander J. Marker; Lutz Aschke; Fredi Schubert; Ewald Moersen; Heiko Kohlmann; Ina Mitra; Jochen Alkemper; Rudolf W. Mueller; John S. Taylor; Kenneth L. Blaedel; Scott Daniel Hector

Detailed thermal expansion measurements and internal homogeneity measurements of the glass-ceramic material Zerodur were undertaken to examine its usefulness for EUVL. Repeat measurements on 100-mm long samples from three castings exhibit an expansion of approximately 12 +/- 2 ppb/K 2 (sigma) in the temperature range of interest for EUVL, corresponding to Class C of the draft SEMI 3148 standard. Internal homogeneity measurements reveal extremely small refractive index variations, suggesting comparably small compositional variations. This in turn is viewed as a necessary but not sufficient condition for high CTE uniformity, a factor required by EUVL applications.


Archive | 2000

Translucent glass-ceramic, process for manufacturing a translucent glass-ceramic as well as its application

Otmar Becker; Roland Dudek; Ina Mitra; Erich Rodek; Christian Roos; Bernd Dr. Rüdinger; Andreas Schminke; Georg-Friedrich Schröder; Friedrich Siebers; Evelin Weiss


Archive | 2001

Cooking stove having a smooth-top glass ceramic cooktop, and a smooth-top glass ceramic cooktop with a glass ceramic cooktop cooking surface, method for production of stoves with smooth-top glass ceramic cooktops and smooth-top glass ceramic cooktops

Ina Mitra; Friedrich Siebers; Otmar Becker; Andreas Schminke; Bernd Dr. Rüdinger; Christian Roos; Evelin Weiss; Roland Dudek; Erich Rodek; Friedrich-Georg Schröder


Journal of the American Ceramic Society | 2008

Ferroelectric and Nonferroelectric (Polar) Piezoelectric Glass–Ceramics

Mark J. Davis; Paula Vullo; Ina Mitra; Peter Blaum; Katherine-Anne Gudgel; Niall J. Donnelly; Clive A. Randall


Archive | 2005

Glas ceramic having a low thermal expansion

Ina Mitra; Jochen Alkemper


Archive | 2005

Low thermal expansion glass ceramic

Jochen Alkemper; Ina Mitra; ミトラ イーナ; アルケンパー ヨッヘン


Archive | 2001

Cooking surface for cooking food having a glass ceramic surface with a glass coating thereon

Ina Mitra; Friedrich Siebers; Jutta Reichert; Cora Krause; Otmar Becker; Michael Bug


Archive | 1999

Transluzente oder opake Glaskeramik mit Hochquarz-Mischkristallen als vorherrschender Kristallphase und deren Verwendung

Ina Mitra; Friedrich Siebers; Klaus Schoenberger; Bernd Ruedinger; Bernd Schultheis

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