Ingvild Julie Thue Jensen

Nanoscale mapping of optical band gaps using monochromated electron energy loss spectroscopy

Using monochromated electron energy loss spectroscopy in a probe-corrected scanning transmission electron microscope we demonstrate band gap mapping in ZnO/ZnCdO thin films with a spatial resolution below 10 nm and spectral precision of 20 meV.

Direct-to-indirect bandgap transitions in ⟨110⟩ silicon nanowires

The bandstructure of ⟨110⟩ silicon nano wires (SiNWs) with diameters (d) up to 6.1 nm were studied using density functional theory. Three types of surface termination were investigated: H, F, and OH; all giving quantum confinement induced direct bandgaps in the investigated size range. Comparison of the calculated results to reported experimental values showed that trends in the bandstructure behaviour were well reproduced. By studying the relative decrease of global and local minima in the conduction band minimum with increasing d, it was possible to predict a direct-to-indirect bandgap transition at d = 9.2, 9.5, and 11.4 nm for H, F, and OH terminated NWs, respectively.

Substoichiometric Silicon Nitride – An Anode Material for Li-ion Batteries Promising High Stability and High Capacity

Silicon is often regarded as a likely candidate to replace graphite as the main active anode material in next-generation lithium ion batteries; however, a number of problems impacting its cycle stability have limited its commercial relevance. One approach to solving these issues involves the use of convertible silicon sub-oxides. In this work we have investigated amorphous silicon sub-nitride as an alternative convertible silicon compound by comparing the electrochemical performance of a-SiNx thin films with compositions ranging from pure Si to SiN0.89. We have found that increasing the nitrogen content gradually reduces the reversible capacity of the material, but also drastically increases its cycling stability, e.g. 40 nm a-SiN0.79 thin films exhibited a stable capacity of more than 1,500 mAh/g for 2,000 cycles. Consequently, by controlling the nitrogen content, this material has the exceptional ability to be tuned to satisfy a large range of different requirements for capacity and stability.

Reply to Comment on ‘Nanoscale mapping of optical band gaps using monochromated electron energy loss spectroscopy’ by Zhan, Granerød, Venkatachalapathy, Johansen, Jensen, Kuznetsov and Prytz in Nanotechnology 28 (2017) 105703

We respond to the comment by Thomas Walther and reaffirm the findings of our original article.

Reply to Comment on ‘Nanoscale mapping of optical band gaps using monochromated electron energy loss spectroscopy’

We respond to the comment by Thomas Walther and reaffirm the findings of our original article.

Formation of nanoporous Si upon self-organized growth of Al and Si nanostructures.

Nanostructured materials offer unique electronic and optical properties compared to their bulk counterparts. The challenging part of the synthesis is to create a balance between the control of design, size limitations, up-scalability and contamination. In this work we show that self-organized Al nanowires in amorphous Si can be produced at room temperature by magnetron co-sputtering using two individual targets. Nanoporous Si, containing nanotunnels with dimensions within the quantum confinement regime, were then made by selective etching of Al. The material properties, film growth, and composition of the films were investigated for different compositions. In addition, the reflectance of the etched film has been measured.

Improving carrier transport in Cu 2 O thin films by rapid thermal annealing

Cuprous oxide (Cu2O) is a promising material for large scale photovoltaic applications. The efficiencies of thin film structures are, however, currently lower than those for structures based on Cu2O sheets, possibly due to their poorer transport properties. This study shows that post-deposition rapid thermal annealing (RTA) of Cu2O films is an effective approach for improving carrier transport in films prepared by reactive magnetron sputtering. The as-deposited Cu2O films were poly-crystalline, p-type, with weak near band edge (NBE) emission in photoluminescence spectra, a grain size of ~100 nm and a hole mobility of 2-18 cm2 V-1 s-1. Subsequent RTA (3 min) at a pressure of 50 Pa and temperatures of 600-1000 °C enhanced the NBE by 2-3 orders of magnitude, evidencing improved crystalline quality and reduction of non-radiative carrier recombination. Both grain size and hole mobility were increased considerably upon RTA, reaching values above 1 µm and up to 58 cm2 V-1 s-1, respectively, for films annealed at 900-1000 °C. These films also exhibited a resistivity of ~50-200 Ω cm, a hole concentration of ~1015 cm-3 at room temperature, and a transmittance above 80%.

Bandgap and band edge positions in compositionally graded ZnCdO

Introducing Cd into ZnO allows for bandgap engineering, potentially with particularly interesting properties to observe in compositionally graded samples. In this work, compositionally graded Zn1–xCdxO samples with 0 ≤ x < 0.16 were made using metal organic vapour phase epitaxy. The chemical composition was studied using scanning transmission electron microscopy, while the band structure of the samples was investigated using a combination of cathodoluminescence spectroscopy and X-ray photoelectron spectroscopy (XPS). It is found that the reduction of the bandgap in our samples is caused by changes in the conduction band. The position of the Fermi level relative to the vacuum level, i.e., the workfunction, was also found to change upon addition of Cd, giving an apparent shift in the valence band when evaluated from the XPS valence spectra.

Interface phenomena in magnetron sputtered Cu2O/ZnO heterostructures

The interface between ZnO and Cu2O has been predicted to be a good candidate for use in thin film solar cells. However, the high predicted conversion efficiency has yet to be fully realized experimentally. To explore the underlying causes of this we investigate the interface between ZnO and Cu2O in magnetron sputtered samples. Two different sample geometries were made: In the first set thin layers of ZnO were deposited on Cu2O (type A), while in the second set the order was reversed (type B). Using x-ray photoelectron spectroscopy (XPS), an intermediate CuO layer was identified regardless of the order in which the Cu2O and ZnO layers were deposited. The presence of a CuO layer was supported by transmission electron microscopy (TEM) results. Changes in the electron hole screening conditions were observed in CuO near the interface with ZnO, manifested as changes in the relative peak-to-satellite ratio and the degree of asymmetric broadness in the Cu 2p peak. The suppression of the Cu 2p satellite characteristic of CuO may cause the CuO presence to be overlooked and cause errors in determinations of valence band offsets (VBOs). For the type A samples, we compare four different approaches to XPS-based determination of VBO and find that the most reliable results are obtained when the thin CuO layer and the altered screening conditions at the interface were taken into account. The VBOs were found to range between 2.5 eV and 2.8 eV. For the B type samples a reduction of the Cu 2p-LMM Auger parameter was found as compared to bulk Cu2O, indicative of quantum confinement in the Cu2O overlayer.

Structure and optical properties of aSiAl and aSiAlHx magnetron sputtered thin films

Thin films of homogeneous mixture of amorphous silicon and aluminum were produced with magnetron sputtering using 2-phase Al–Si targets. The films exhibited variable compositions, with and without the presence of hydrogen, aSi1−xAlx and aSi1−xAlxHy. The structure and optical properties of the films were investigated using transmission electron microscopy, X-ray photoelectron spectroscopy, UV-VisNIR spectrometry, ellipsometry, and atomistic modeling. We studied the effect of alloying aSi with Al (within the range 0–25 at. %) on the optical band gap, refractive index, transmission, and absorption. Alloying aSi with Al resulted in a non-transparent film with a low band gap ( 1 eV. Variations of the Al and hydrogen content allowed for tuning of the optoelectronic properties. The films are stable up to a temperature of 300 °C. At this temperature, we observed Al induced crystallization of the amorphous silicon and the presence of large Al part...