Ivo Utke

Gas-assisted focused electron beam and ion beam processing and fabrication

Beams of electrons and ions are now fairly routinely focused to dimensions in the nanometer range. Since the beams can be used to locally alter material at the point where they are incident on a surface, they represent direct nanofabrication tools. The authors will focus here on direct fabrication rather than lithography, which is indirect in that it uses the intermediary of resist. In the case of both ions and electrons, material addition or removal can be achieved using precursor gases. In addition ions can also alter material by sputtering (milling), by damage, or by implantation. Many material removal and deposition processes employing precursor gases have been developed for numerous practical applications, such as mask repair, circuit restructuring and repair, and sample sectioning. The authors will also discuss structures that are made for research purposes or for demonstration of the processing capabilities. In many cases the minimum dimensions at which these processes can be realized are considera...

Granular Co–C nano-Hall sensors by focused-beam-induced deposition

We analyzed the performance of Hall sensors with different Co-C ratios, deposited directly in nano-structured form, using

Small, Minimally Invasive, Direct: Electrons Induce Local Reactions of Adsorbed Functional Molecules on the Nanoscale

Co_2(CO)_8

Tunable Nanosynthesis of Composite Materials by Electron-Impact Reaction†

gas molecules, by focused electron or ion beam induced deposition. Due to the enhanced inter-grain scattering in these granular wires, the Extraordinary Hall Effect can be increased by two orders of magnitude with respect to pure Co, up to a current sensitivity of

High Spatial Resolution Time-of-Flight Secondary Ion Mass Spectrometry for the Masses: A Novel Orthogonal ToF FIB-SIMS Instrument with In Situ AFM

1 \Omega/T

Local electron beam induced reduction and crystallization of amorphous titania films

. We show that the best magnetic field resolution at room temperature is obtained for Co ratios between 60% and 70% and is better than

Density determination of focused-electron-beam-induced deposits with simple cantilever-based method

1 \mu T/Hz^{1/2}

Boron Nitride Nanoporous Membranes with High Surface Charge by Atomic Layer Deposition

. For an active area of the sensor of

Dose and energy dependence of mechanical properties of focused electron-beam-induced pillar deposits from Cu(C5HF6O2)2.

200 \times 200 nm^2

In situ characterization of tensile-bending load bearing ability of multi-walled carbon nanotubes in alumina-based nanocomposites

, the room temperature magnetic flux resolution is