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Dive into the research topics where J. P. Harbison is active.

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Featured researches published by J. P. Harbison.


Journal of Vacuum Science and Technology | 1988

Application of reflectance difference spectroscopy to molecular‐beam epitaxy growth of GaAs and AlAs

D. E. Aspnes; J. P. Harbison; A. A. Studna; L. T. Florez

We perform an accuracy analysis of several possible reflectance–difference (RD) configurations that are compatible with standard molecular‐beam epitaxy (MBE) growth chambers, and describe in detail an optical‐bridge system that can determine relative changes in RD signals as small as 5×10−5 under standard growth conditions. Using this system, we determine the RD response of GaAs for changes in surface conditions at different wavelengths and correlate these to simultaneously measured reflection high‐energy electron diffraction (RHEED) intensities. Maximum anisotropies are found at 2.0–2.5 and 3.5 eV for Ga on GaAs and Al on AlAs, respectively, providing a way of spectrally distinguishing Ga–Ga and Al–Al dimers for surface‐chemical investigations, and suggesting that these photon energies are also optimal for modifying growth by light. At photon energies well removed from these anisotropy maxima, RD signals follow changes in surface structure, as RHEED. Our RD‐RHEED correlations provide insight concerning c...


IEEE Journal of Quantum Electronics | 1991

Dynamic, polarization, and transverse mode characteristics of vertical cavity surface emitting lasers

Connie J. Chang-Hasnain; J. P. Harbison; G. Hasnain; A. Von Lehmen; L. T. Florez; N. G. Stoffel

The dynamic, polarization, and transverse mode characteristics of strained InGaAs-GaAs quantum well vertical cavity surface emitting lasers (VCSELs) emitting at 0.98 mu m are investigated. The dynamic behavior of VCSELs with high and low operating voltages and series resistances is compared. A large wavelength chirp in the lasing spectrum was observed for the lasers with high voltage/resistance, even under low-duty-cycle pulse operation. This is thought to be due to resistive heating close to the laser junction. It is observed that the transverse mode structure of VCSELs and their dependence on laser dimensions and drive current are highly analogous to those of edge emitting lasers, whereas the polarization characteristics of the two types of lasers are significantly different. >


Applied Physics Letters | 1990

Van der Waals bonding of GaAs epitaxial liftoff films onto arbitrary substrates

Eli Yablonovitch; D. M. Hwang; T. J. Gmitter; L. T. Florez; J. P. Harbison

Epitaxial liftoff is an alternative to lattice‐mismatched heteroepitaxial growth. Multilayer AlxGa1−xAs epitaxial films are separated from their growth substrates by undercutting an AlAs release layer in HF acid (selectivity ≳108 for x≤0.4). The resulting AlxGa1−xAs films tend to bond by natural intermolecular surface forces to any smooth substrate (Van der Waals bonding). We have demonstrated GaAs thin‐film bonding by surface tension forces onto Si, glass, sapphire, LiNbO3, InP, and diamond substrates, as well as self‐bonding onto GaAs substrates. In transmission electron microscopy the substrate and thin‐film atomic lattices can be simultaneously imaged, showing only a thin (20–100 A) amorphous layer in between.


IEEE Journal of Quantum Electronics | 1991

Multiple wavelength tunable surface-emitting laser arrays

Connie J. Chang-Hasnain; J. P. Harbison; Chun-En Zah; M. W. Maeda; L. T. Florez; N. G. Stoffel; Tien-Pei Lee

Techniques to achieve wavelength multiplexing and tuning capabilities in vertical-cavity surface-emitting lasers (VCSELs) are described, and experimental results are given. The authors obtained 140 unique, uniformly separated, single-mode wavelength emissions from a 7*20 VCSEL array. Large total wavelength span ( approximately 430 AA) and small wavelength separation ( approximately 3 AA) are obtained simultaneously with uncompromised laser performance. All 140 lasers have nearly the same threshold currents, voltages, and resistances. Wavelength tuning is obtained by using a three-mirror coupled-cavity configuration. The three-mirror laser is a two-terminal device and requires only one top contact. Discrete tuning with a range as large as 61 AA is achieved with a small change in drive current of only 10.5 mA. >


Applied Physics Letters | 1993

Epitaxial growth of ferromagnetic ultrathin MnGa films with perpendicular magnetization on GaAs

Masaaki Tanaka; J. P. Harbison; J. DeBoeck; T. Sands; B. Philips; T. L. Cheeks; V. G. Keramidas

We have successfully grown ferromagnetic MnGa ultrathin films on GaAs substrates by molecular beam epitaxy. Reflection high energy electron diffraction and cross‐sectional transmission electron microscopy show that monocrystalline MnGa films are grown with the c axis of the tetragonal unit cell normal to the (001) GaAs substrates. Both magnetization measurements by vibrating sample magnetometer and extraordinary Hall effect (EHE) measurements indicate perpendicular magnetization, with the remnant magnetization of 225 emu/cm3 and EHE resistivity in the range of 0.5–4 μΩ cm at room temperature. The material possesses properties ideal for certain nonvolatile magnetic memory coupled with underlying III‐V circuitry.


Applied Physics Letters | 1994

Epitaxial orientation and magnetic properties of MnAs thin films grown on (001) GaAs: Template effects

M. Tanaka; J. P. Harbison; M. C. Park; Y. S. Park; T. Shin; G. M. Rothberg

We have studied template effects in molecular beam epitaxy (MBE) of ferromagnetic MnAs thin films on (001) GaAs substrates. When As2 flux was first supplied without Mn flux on the (001) GaAs prior to the MnAs growth, the surface reconstruction was disordered c(4×4), a more As‐rich surface than c(4×4). The growth direction of the MnAs thin film grown on this surface is [1100] and the easy magnetization axis was found to be along the [1120] of MnAs and the [110] of GaAs. In contrast, when one monolayer of Mn was first deposited on the c(4×4) GaAs surface and then As2 flux was supplied to grow MnAs, the growth direction of the MnAs thin film was found to be mainly [1101], and the easy magnetization axis was along the [1120] of MnAs and the [110] of GaAs, 90° different with respect to the substrate. These results indicate the importance of the very first monolayer in controlling the epitaxial orientation and magnetic properties of epitaxial ferromagnetic MnAs thin films.


Optical Engineering | 1990

Surface-Emitting Microlasers for Photonic Switching and Interchip Connections

J. L. Jewell; Yong-Hee Lee; Axel Scherer; S. L. McCall; N. A. Olsson; J. P. Harbison; L. T. Florez

Vertical-cavity electrically pumped surface-emitting microlasers are formed on GaAs substrates at densities greater than two million per square centimeter. Two wafers were grown with ln0.2Ga0.8As active material composing three 80 ? thick quantum wells in one and a single quantum well (SQW) 100 ? thick in the other. Lasing was seen in devices as small as 1 .5 ?m diameter with <0.05 ?m3 active material. SQW microlasers 5 x 5 ?m square had room-temperature cw current thresholds as low as 1.5 mA with 983 nm output wavelength. 10 x 10 ?m square SQW microlasers were modulated by a pseudorandom bit generator at 1 Gb/s with less than 10-10 bit error rate. Pulsed output >170 mW was obtained from a 100?m square device. The laser output passes through the nominally transparent substrate and out its back side, a configuration well suited for micro-optic integration and photonic switching and interchip connections.


Applied Physics Letters | 1989

Electronic passivation of GaAs surfaces through the formation of arsenic—sulfur bonds

C. J. Sandroff; M. S. Hegde; L. A. Farrow; C. C. Chang; J. P. Harbison

X‐ray photoelectron spectroscopy reveals that the remarkable electronic quality of GaAs/sulfide interfaces can be ascribed to the formation of AsxSy phases which grow on an oxide‐free GaAs surface. While one of these phases is akin to As2S3, another shows significant in‐plane S—S bonding. Raman experiments indicate that the band bending on this disulfide‐ terminated surface has been reduced to 0.12 eV.


Materials Science Reports | 1990

Stable and epitaxial metal/III-V semiconductor heterostructures

T. Sands; C.J. Palmstrøm; J. P. Harbison; V. G. Keramidas; N. Tabatabaie; T.L. Cheeks; R. Ramesh; Yaron Silberberg

Long before the advent of nanofabrication and quantum-effect devices, the technological limitations imposed by polycrystalline, multiphase and thermally unstable contacts to III-V semiconductors were of concern to forward-looking materials scientists. In the early 1980s, efforts to elucidate the complex behaviour of reactive metal/III-V systems were initiated. These early efforts evolved slowly and culminated in the recent achievement of stable and epitaxial metallizations to III-V semiconductors. In this review, we first describe the criteria that must be met for the fabrication of metal/III-V heterostructures. Bulk phase equilibria are useful guides for selecting metal/semiconductor combinations which will not react during growth at moderate temperatures or during subsequent processing steps. We show, however, that phase stability is not sufficient for the fabrication of ultrathin metal overlayers or buried metal heterostructures. Growth conditions must be carefully optimized and combined with the appropriate selection of metallic phases with high melting points in order to suppress the strong tendency for island formation during growth and film agglomeration during overgrowth or processing. In our discussion of metal/semiconductor hetero-structures we highlight the relationship between symmetry differences and defects (domain boundaries) with particular emphasis on semiconductor overlayers grown on high-symmetry metals. Our work and that of others has shown that stable and epitaxial metallizations to III-V semiconductors as well as more complex metal/III-V heterostructures can be achieved with two classes of metallic materials; the transition-metal gallides and aluminides with the CsCl structure (TM-III) and the rare-earth monopnictides with the NaCl structure (RE-V). We discuss and compare the growth of these III-V/TM-III/III-V and III-V/RE-V/III-V heterostructures by molecular beam epitaxy, focusing special attention to the initial stages of growth of metallic films on III-V substrates and III-V overlayers on metallic films. Going beyond the strictly materials issues, we describe the electrical properties of such heterostructures, including stable enhanced-barrier Schottky contacts and semiconductor-clad metallic quantum wells, structures which may be the basis for exciting and novel electronic, photonic and magnetic devices.


Applied Physics Letters | 1990

Transverse mode characteristics of vertical cavity surface-emitting lasers

Connie J. Chang-Hasnain; Meir Orenstein; A. Von Lehmen; L. T. Florez; J. P. Harbison; N. G. Stoffel

Transverse mode characteristics of vertical cavity surface‐emitting (VC‐SE) lasers are described. The mode structure is investigated as a function of the transverse dimension for proton‐implanted gain‐guided VC‐SE lasers. A comparison is made to an air‐post index‐guided structure. The lasing modes and the evolution of the modes with increasing drive current for the VC‐SE lasers are observed to be highly analogous to those of the edge‐emitting lasers. Broad‐area gain‐guided lasers lase in the fundamental TEM00 mode near threshold. At higher currents, high‐order modes are successively excited. A 5 μm square proton‐implanted gain‐guided VC‐SE laser emits a single mode. On the other hand, an air‐post index‐guided SE laser, due to the large index difference between the laser and the cladding, emits multiple transverse modes. Moreover, we show that the gain‐guided VC‐SE lasers exhibit better device characteristics than the air‐post index‐guided lasers.

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Axel Scherer

California Institute of Technology

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R. Bhat

Telcordia Technologies

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Meir Orenstein

Technion – Israel Institute of Technology

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K. Kash

Case Western Reserve University

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