J. Penuelas

Epitaxial graphene on cubic SiC(111)/Si(111) substrate

Epitaxial graphene films grown on silicon carbide (SiC) substrate by solid state graphitization is of great interest for electronic and optoelectronic applications. In this paper, we explore the properties of epitaxial graphene films on 3C-SiC(111)Si(111) substrate. X-ray photoelectron spectroscopy and scanning tunneling microscopy were extensively used to characterize the quality of the few-layer graphene (FLG) surface. The Raman spectroscopy studies were useful in confirming the graphitic composition and measuring the thickness of the FLG samples.

The role of nickel and titanium in the formation of ohmic contacts on p-type 4H?SiC

The formation of low resistivity ohmic contacts to p-type 4H–SiC is achieved. Transfer length method (TLM)-based structures were fabricated on 0.8 µm thick epitaxial p-type silicon carbide (4H–SiC) layers. TLM metal patterns were obtained by a lift-off procedure and electron beam deposition of Ni, Ti and Al. The electrical properties of the contacts were examined using current/voltage measurements. Contact resistivity as a function of annealing was investigated over the temperature range from 700 to 1000 °C. The lowest contact resistivity of 1.5 × 10−5 Ω cm2 was obtained for the Ni/Ti/Al/Ni contact after annealing at 800 °C for 90 s. Using secondary ion mass spectrometry, energy-dispersive x-ray spectroscopy and x-ray diffraction measurements, we quantitatively and qualitatively determined the formation and the nature of the ohmic contact to p-type SiC.

LaAlO3/Si capacitors: Comparison of different molecular beam deposition conditions and their impact on electrical properties

A study of the structural and electrical properties of amorphous LaAlO3 (LAO)/Si thin films fabricated by molecular beam deposition (MBD) is presented. Two substrate preparation procedures have been explored namely a high temperature substrate preparation technique—leading to a step and terraces surface morphology—and a chemical HF-based surface cleaning. The LAO deposition conditions were improved by introducing atomic plasma-prepared oxygen instead of classical molecular O2 in the chamber. An Au/Ni stack was used as the top electrode for its electrical characteristics. The physico-chemical properties (surface topography, thickness homogeneity, LAO/Si interface quality) and electrical performance (capacitance and current versus voltage and TunA current topography) of the samples were systematically evaluated. Deposition conditions (substrate temperature of 550 °C, oxygen partial pressure settled at 10−6 Torr, and 550 W of power applied to the O2 plasma) and post-depositions treatments were investigated t...

Direct growth of InAsP/InP quantum well heterostructures on Si using crystalline SrTiO3/Si templates

Integrating III-V semiconductors on Si is one of the major challenges of epitaxial growth and presents important applicative interest. We describe here an approach based on the use of crystalline SrTiO3 (STO)/Si templates. The structural and optical properties of InAsP/InP quantum well heterostructures grown directly on Si and on STO/Si templates are compared. Using STO/Si templates strongly improves the structural properties of the III-V heterostructure, and allows observing room-temperature photoluminescence from the quantum well.

Polarization properties of single and ensembles of InAs/InP quantum rod nanowires emitting in the telecom wavelengths

The absorption and emission polarization properties of InAs quantum rods embedded in InP nanowires (NWs) are investigated by mean of (micro-)photoluminescence spectroscopy. It is shown that the degree of linear polarization of emission (0.94) and absorption (0.5) of a single NW can be explained by the photonic nature of the NW structure. Knowing these parameters, optical properties of single NWs and ordered ensembles of these NWs can be correlated one to another via proposed model, so that polarization properties of NWs can be studied using ordered ensembles on as-grown samples. As an example, the polarization anisotropy is investigated as a function of the excitation wavelength on a NW ensemble and found to be in agreement with theoretical prediction.

Growth process of nanosized aluminum thin films by pulsed laser deposition for fluorescence enhancement

Pulsed laser deposition was used to deposit aluminum thin films of various thicknesses (tAl) ranging from 5 to 40 nm and to investigate their growth process when they are deposited onto SiO2 and Y2O3. Atomic force microscopy and x-ray reflectivity measurements show that the structure of the Al films are related to the wettability properties of the underlaying layer. Onto SiO2, ultra-smooth layers of aluminum are obtained, due to a perfect wetting of SiO2 by Al. In contrast when deposited onto Y2O3, percolated Al layers are observed with apparent pore size decreasing from 200 to 82 nm as t(Al) is increased from 5 to 40 nm, respectively. This particular morphology is related to partial dewetting of Al on Y2O3. These two different growth mechanisms of aluminum depend therefore on the surface properties of SiO2 and Y2O3. The plasmon resonance of such Al nanostructures in the UV region was then analyzed by studying the coupling between Eu(3+) rare earth emitters and Al.

Interface accommodation mechanism for weakly interacting epitaxial systems

We report here an interface accommodation mechanism observed by using in situ grazing incidence X-ray diffraction in the very early stages of Ge epitaxial growth on SrTiO3. This mechanism leads to interface-localized misfit accommodation and involves two regimes: very early dislocation emergence followed by a damped collective oscillatory lattice parameter evolution. We show that this behavior is compatible with the simplest nonlinear Frenkel-Kontorova model assuming the weak elastic-chain/substrate interaction.

GaAs Core/SrTiO3 Shell Nanowires Grown by Molecular Beam Epitaxy

We have studied the growth of a SrTiO3 shell on self-catalyzed GaAs nanowires grown by vapor-liquid-solid assisted molecular beam epitaxy on Si(111) substrates. To control the growth of the SrTiO3 shell, the GaAs nanowires were protected using an arsenic capping/decapping procedure in order to prevent uncontrolled oxidation and/or contamination of the nanowire facets. Reflection high energy electron diffraction, scanning electron microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy were performed to determine the structural, chemical, and morphological properties of the heterostructured nanowires. Using adapted oxide growth conditions, it is shown that most of the perovskite structure SrTiO3 shell appears to be oriented with respect to the GaAs lattice. These results are promising for achieving one-dimensional epitaxial semiconductor core/functional oxide shell nanostructures.

Structure and morphology of Ge nanowires on Si (001): Importance of the Ge islands on the growth direction and twin formation

Understanding and controlling the structural properties of Ge nanowires are important for their current and future use in technological applications. In this study, the initial stages of the heteroepitaxial growth of Ge nanowires on Si(001) via the Au catalyzed vapor-liquid-solid (VLS) method are investigated. We observe a Ge island located at the base of each nanowire. We propose that these islands are formed by the VLS mechanism and initiate the nanowire growth. Analysis of the islands morphology helps to explain the 〈011〉 growth direction commonly observed for Ge nanowires. Moreover, our observations provide an insight into the formation of twins that propagate along the growth direction.

Chemical reactivity between sol–gel deposited Pb(Zr,Ti)O3 layers and their GaAs substrates

We show how chemical interactions between the growing material and the substrate affect the crystallization of Pb(Zr,Ti)O3 (PZT) thin films on SrTiO3-templated GaAs substrates. A liquid PZT precursor (sol) is spin-coated on STO/GaAs pseudo-substrates grown by molecular beam epitaxy and crystallized by annealing under air. Complete crystallization of the PZT layers cannot be achieved due to significant oxidation of the GaAs substrate which enhances As diffusion through the structure and further formation of parasitic compounds containing Pb, Sr and As due to the strong chemical affinity between As anions and Pb and Sr cations. These mechanisms are extensively studied based on X-ray diffraction measurements carried out in situ during annealing and on transmission electron microscopy experiments including energy-dispersive X-ray analyses.