J. Sinkkonen
Helsinki University of Technology
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Featured researches published by J. Sinkkonen.
Applied Physics Letters | 2001
Leonid Khriachtchev; Markku Räsänen; Sergei Novikov; J. Sinkkonen
Experimental evidence of population inversion and amplified spontaneous emission was found for Si nanocrystallites embedded in SiO2 surrounding under pumping with 5 ns light pulses at 380, 400, and 500 nm. As an important property, our experiments show a short lifetime of the population inversion allowing a generation of short (a few nanosecond) amplified light pulses in the Si/SiO2 lattice. The estimate for optical gain in the present samples is 6 cm−1 at 720 nm.
Journal of Applied Physics | 2007
Antti Haarahiltunen; Hele Väinölä; O. Anttila; Marko Yli-Koski; J. Sinkkonen
Heterogeneous iron precipitation in silicon was studied experimentally by measuring the gettering efficiency of oxide precipitate density of 1×1010cm−3. The wafers were contaminated with varying iron concentrations, and the gettering efficiency was studied using isothermal annealing in the temperature range from 300to780°C. It was found that iron precipitation obeys the so-called s-curve behavior: if iron precipitation occurs, nearly all iron is gettered. For example, after 30min annealing at 700°C, the highest initial iron concentration of 8×1013cm−3 drops to 3×1012cm−3, where as two lower initial iron concentrations of 5×1012 and 2×1013cm−3 remain nearly constant. This means that the level of supersaturation plays a significant role in the final gettering efficiency, and a rather high level of supersaturation is required before iron precipitation occurs at all. In addition, a model is presented for the growth and dissolution of iron precipitates at oxygen-related defects in silicon during thermal proces...
Journal of Applied Physics | 1999
Leonid Khriachtchev; Markku Räsänen; Sergei Novikov; Olli Kilpelä; J. Sinkkonen
Raman study of very thin (⩽3.5 nm) Si layers constituting Si/SiO2 superlattices and grown by molecular beam epitaxy is described. The Raman spectra show systematic dependence on thickness of the Si layers, which highlights the variety of disordered microstructures in the Si/SiO2 superlattices. A clear change in the vibrational properties is found to occur in the 0.8–3.5 nm thickness region. In particular, the Raman spectra are typical for amorphous silicon for the thicker layers, and the characteristic phonon band disappears for the thinner layers, presumably representing another form of Si coordination with a small Raman scattering cross section. In addition, absorption of the material changes essentially with the Si-layer thickness. Photoluminescence is detected from the Si/SiO2 superlattices, the superlattices with 1.2 and 1.8 nm Si layers being the most efficient emitters among our samples, and the photoluminescence is blueshifted with the decrease of the Si-layer thickness. The Raman spectra show no ...
Journal of Applied Physics | 2009
Antti Haarahiltunen; Hele Savin; Marko Yli-Koski; Heli Talvitie; J. Sinkkonen
We propose a quantitative model for phosphorus diffusion gettering (PDG) of iron in silicon, which is based on a special fitting procedure to experimental data. We discuss the possibilities of the underlying physics of the segregation coefficient. Finally, we show that the proposed PDG model allows quantitative analysis of gettering efficiency of iron at various processing conditions.
Journal of The Electrochemical Society | 2003
Hele Väinölä; Marko Yli-Koski; Antti Haarahiltunen; J. Sinkkonen
12 cm 23 can be detected by this method. It is demonstrated that positive corona charge can be used to prevent out-diffusion of interstitial copper, while negative charge enables copper to freely diffuse to the wafer surfaces. It was observed that the precipitation rate of copper increased significantly when the bias-light intensity is raised above a certain critical level. In addition, the copper precipitation rate was discovered to be much higher in samples which have internal gettering sites. These findings suggest that (i) high intensity light reduces the electrostatic repulsion between positively charged interstitial copper ions and copper precipitates enabling copper to precipitate in the wafer bulk even at a low concentration level, and ( ii) during high intensity illumination, oxygen precipitates provide effective heterogeneous nucleation sites for copper.
Applied Physics Letters | 2008
Antti Haarahiltunen; Heli Talvitie; Hele Savin; Marko Yli-Koski; Muhammad Imran Asghar; J. Sinkkonen
In this paper, a model is presented for boron diffusion gettering of iron in silicon during thermal processing. In the model, both the segregation of iron due to high boron doping concentration and heterogeneous precipitation of iron to the surface of the wafer are taken into account. It is shown, by comparing simulated results with experimental ones, that this model can be used to estimate boron diffusion gettering efficiency of iron under a variety of processing conditions. Finally, the application of the model to phosphorus diffusion gettering is discussed.
Applied Physics Letters | 2005
Hele Väinölä; Eero Saarnilehto; Marko Yli-Koski; Antti Haarahiltunen; J. Sinkkonen; G. Berenyi; T. Pavelka
We propose a method to measure trace copper contamination in p-type silicon using the microwave photoconductivity decay (μ-PCD) technique. The method is based on the precipitation of interstitial copper, activated by high-intensity light, which results in enhanced minority carrier recombination activity. We show that there is a quantitative correlation between the enhanced recombination rate and the Cu concentration by comparing μ-PCD measurements with transient ion drift and total reflection x-ray fluorescence measurements. The results indicate that the method is capable of measuring Cu concentrations down to 1010cm−3. There are no limitations to wafer storage time if corona charge is used on the oxidized wafer surfaces as the charge prevents copper outdiffusion. We briefly discuss the role of oxide precipitates both in the copper precipitation and in the charge carrier recombination processes.
Applied Physics Letters | 1995
J. Sinkkonen; J. Ruokolainen; P. Uotila; A. Hovinen
The spatial collection efficiency C(z) is the probability that a photon absorbed at the point z in the cell will yield a charge carrier into the current. The C function is obtained from the spectral response by means of the inverse Laplace transformation. It gives important information on the cell parameters such as diffusion length, junction depth, surface recombination velocity, etc. Examples of c‐Si and thin‐film CdS/CdTe cells are given.
Applied Physics Letters | 2005
Antti Haarahiltunen; Hele Väinölä; O. Anttila; Eero Saarnilehto; Marko Yli-Koski; Jan Storgårds; J. Sinkkonen
A model is presented for the growth and dissolution of iron precipitates at oxygen-related defects in silicon during thermal processing. The heterogeneous nucleation of iron is taken into account by special growth and dissolution rates, which are inserted into a set of modified chemical rate equations. This approach allows us to calculate the size distribution of iron precipitates and the residual iron concentration. By comparing the simulated results with experimental ones, it is proven that this model can be used to estimate the internal gettering efficiency of iron under a variety of processing conditions.
Journal of Crystal Growth | 1997
S.V. Novikov; J. Sinkkonen; Olli Kilpelä; S.V. Gastev
SiSiO2 superlattices were grown by MBD using in situ oxidation by RF-plasma source. Room temperature photoluminescence (PL) was observed in the spectral range 1.9–2.3 eV. PL spectra show blueshifts due to the quantum confinement of the energy states in ultrathin silicon layers.