Jaeseong Lee

Microwave flexible transistors on cellulose nanofibrillated fiber substrates

In this paper, we demonstrate microwave flexible thin-film transistors (TFTs) on biodegradable substrates towards potential green portable devices. The combination of cellulose nanofibrillated fiber (CNF) substrate, which is a biobased and biodegradable platform, with transferrable single crystalline Si nanomembrane (Si NM), enables the realization of truly biodegradable, flexible, and high performance devices. Double-gate flexible Si NM TFTs built on a CNF substrate have shown an electron mobility of 160 cm2/V·s and fT and fmax of 4.9 GHz and 10.6 GHz, respectively. This demonstration proves the microwave frequency capability and, considering todays wide spread use of wireless devices, thus indicates the much wider utility of CNF substrates than that has been demonstrated before. The demonstration may also pave the way toward portable green devices that would generate less persistent waste and save more valuable resources.

A Simplified Method of Making Flexible Blue LEDs on a Plastic Substrate

A much-simplified method of making flexible GaN blue light-emitting diode (LED) array on a plastic substrate was demonstrated. A sticky elastomeric stamp was first brought into contact with prefabricated GaN LED array on a sapphire substrate. Laser liftoff was applied by shining laser light through the sapphire substrate. The released LED array sitting on the stamp was transferred to a polyethylene terephthalate substrate that was coated with an adhesive layer to finish the fabrication process. Careful investigation of the built-in stress in the GaN LED layer using Raman spectroscopy revealed that the maximum stress that allows for intact GaN LED layer release and transfer was 0.7 GPa. The method drastically simplifies the cumbersome conventional GaN layer transferring method while preserving the original layout of the GaN LED array. Due to its simple and practical characteristics, the method is expected to greatly facilitate the development of versatile transferrable GaN LED applications on various substrates at a much-reduced cost.

Single-lobe, surface-normal beam surface emission from second-order distributed feedback lasers with half-wave grating phase shift

Half-wave phase shifts were fabricated in the center of second-order GaAs gratings, for use in surface-emitting, horizontal-cavity, semiconductor diode lasers (λ=0.98 μm). Incorporating such gratings in diode lasers with distributed-feedback (DFB) active regions and distributed Bragg reflectors (DBRs) is found to provide surface-normal, single-lobe beam emission, as predicted by theory. InGaAs/AlGaAs/InGaP, two-quantum-well structures are employed. A 500-μm-long GaAs/Au second-order grating with half-wave phase shift represents the DFB region, which provides feedback and unidirectional light outcoupling. GaAs/SiO2/Au, 500-μm-long, second-order gratings are the DBR regions, on either side of the DFB region, which provide both frequency-selective feedback as well as unidirectional outcoupling. Lateral-mode control is achieved via a 2.5-μm-wide ridge waveguide. Surface emission is obtained through a 80-μm-wide window stripe in the metallization on the substrate n-side. Single-frequency lasing in an orthonorm...

Asymmetric broad waveguide diode lasers (/spl lambda/ = 980 nm) of large equivalent transverse spot size and low temperature sensitivity

980-nm InGaAs-InGaAsP diode lasers of asymmetric broad-waveguide (BW) transverse structure are demonstrated. Single-transverse-mode devices have equivalent (transverse) spot sizes of 0.8 /spl mu/m (i.e., significantly larger than for symmetric BW structures), which are obtained at no price in device-parameter temperature sensitivity. Built-in discrimination against the first-order transverse mode allows fundamental-transverse-mode operation in relatively narrow beams (/spl theta//sub /spl perp// = 34/spl deg/). For 2-mm-long 100-/spl mu/m-wide-stripe uncoated devices with double-quantum-well active regions, the threshold-current density is as low as 190 A/cm/sup 2/, while the characteristic temperatures for the threshold-current density T/sub 0/, and the external differential quantum efficiency T/sub 1/ are high: 183 K and 650 K, respectively.

Comprehensive above-threshold analysis of large-aperture (8–10 μm) antiresonant reflecting optical waveguide diode lasers

An above-threshold analysis of 8–10-μm-core antiresonant reflecting optical waveguide (ARROW) lasers is performed, including the carrier-induced index depression, carrier diffusion, and gain spatial hole burning (GSHB). The study is done as a function of the (transverse) optical-mode confinement factor Γ and the core width. Just as for index-guided devices, it is found that ARROW devices (i.e., index-antiguided devices) are much less immune to multimoding via GSHB the smaller the value of Γ. For the case Γ=3%, the high-order mode of most concern reaches the threshold much earlier than for the case Γ=1%, due both to gain-profile distortion as well as to distortion of the effective-index profile (in the device core) with increasing drive level. Devices of 8.5-μm-wide cores and Γ=1%, are found to stay single-mode to at least 40× threshold, which in turn allows the projection of stable, single-mode operation to 1.2 W output power. In contrast, 10-μm-core devices become multimode at around 10× threshold. Preli...

Sharpened VO2 Phase Transition via Controlled Release of Epitaxial Strain

Phase transitions in correlated materials can be manipulated at the nanoscale to yield emergent functional properties, promising new paradigms for nanoelectronics and nanophotonics. Vanadium dioxide (VO2), an archetypal correlated material, exhibits a metal-insulator transition (MIT) above room temperature. At the thicknesses required for heterostructure applications, such as an optical modulator discussed here, the strain state of VO2 largely determines the MIT dynamics critical to the device performance. We develop an approach to control the MIT dynamics in epitaxial VO2 films by employing an intermediate template layer with large lattice mismatch to relieve the interfacial lattice constraints, contrary to conventional thin film epitaxy that favors lattice match between the substrate and the growing film. A combination of phase-field simulation, in situ real-time nanoscale imaging, and electrical measurements reveals robust undisturbed MIT dynamics even at preexisting structural domain boundaries and significantly sharpened MIT in the templated VO2 films. Utilizing the sharp MIT, we demonstrate a fast, electrically switchable optical waveguide. This study offers unconventional design principles for heteroepitaxial correlated materials, as well as novel insight into their nanoscale phase transitions.

Ultra-thin distributed Bragg reflectors via stacked single-crystal silicon nanomembranes

In this paper, we report ultra-thin distributed Bragg reflectors (DBRs) via stacked single-crystal silicon (Si) nanomembranes (NMs). Mesh hole-free single-crystal Si NMs were released from a Si-on-insulator substrate and transferred to quartz and Si substrates. Thermal oxidation was applied to the transferred Si NM to form high-quality SiO2 and thus a Si/SiO2 pair with uniform and precisely controlled thicknesses. The Si/SiO2 layers, as smooth as epitaxial grown layers, minimize scattering loss at the interface and in between the layers. As a result, a reflection of 99.8% at the wavelength range from 1350 nm to 1650 nm can be measured from a 2.5-pair DBR on a quartz substrate and 3-pair DBR on a Si substrate with thickness of 0.87 μm and 1.14 μm, respectively. The high reflection, ultra-thin DBRs developed here, which can be applied to almost any devices and materials, holds potential for application in high performance optoelectronic devices and photonics applications.

Epitaxial VO2 thin film-based radio-frequency switches with thermal activation

In this paper, we report on the demonstration of thermally triggered “normally ON” radio-frequency (RF) switches based on epitaxial vanadium dioxide (VO2) thin films with a SnO2 template on (001) TiO2 substrates. Fast insulator-to-metal phase transition of the epitaxial VO2 at a relatively low temperature allowed RF switches made of the VO2 to exhibit sharp changes in the RF insertion loss during cooling and heating at 60 °C and 66 °C, respectively. The change of RF insertion loss due to phase transition is greater than 15 dB. The VO2 RF switches also completed the transition of S21 within less than 3 °C and showed a low-loss operation frequency of up to 24.2 GHz with a low insertion loss of −1.36 dB and isolation of 17.56 dB at 12.03 GHz, respectively. The demonstration suggests that epitaxial VO2-based RF switches can be used in switching elements up to Ku-band RF circuits.

Light absorption enhancement in Ge nanomembrane and its optoelectronic application

In this study, the light absorption property of Ge nanomembrane (Ge NM), which incorporates hydrogen (H), in near-infrared (NIR) wavelength range was analyzed. Due to the presence of a large amount of structural defects, the light absorption coefficient of the Ge layer becomes much higher (10 times) than that of bulk Ge in the wavelength range of 1000 ~1600 nm. Increased light absorption was further measured from released Ge NM that has H incorporation in comparison to that of bulk Ge, proving the enhanced light absorption coefficient of H incorporated Ge. Finally, metal-semiconductor-metal (MSM) photodetectors were demonstrated using the H incorporated Ge on GeOI.

Resonant cavity germanium photodetector via stacked single-crystalline nanomembranes

In this paper, the authors report resonant cavity (RC) metal-semiconductor-metal (MSM) germanium nanomembrane (Ge NM) photodetectors via transfer printing. The dislocation-free Ge NM layer was transferred onto an ultrathin Si NM/SiO2 distributed Bragg reflector. As a result, a low dark current density of 1 × 10−9 A/μm2 and a quantum efficiency of 17.3% at 1.55 μm, which is twice larger than the quantum efficiency without a bottom mirror, were measured from the transferred RC MSM Ge photodetector. The enhancement of the quantum efficiency is verified by simulation.