James K. Hirvonen
Arizona State University
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Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
1. General features and fundamental concepts 2. Interatomic potentials 3. Dynamics of binary elastic collisions 4. Cross-section 5. Ion stopping 6. Ion range and range distribution 7. Radiation damage and spikes 8. Ion-solid simulations and irradiation enhanced transport 9. Sputtering 10. Order-disorder under irradiation and ion implantation metallurgy 11. Ion beam mixing 12. Phase transformations 13. Ion beam assisted deposition 14. Applications of ion beam processing techniques 15. Ion beam system features Appendices: A. Crystallography B. Table of contents C. Density of states D. Derivation of the Thomas-Fermi differential equations E. Centre-of-mass and laboratory scattering angles F. Miedemas semi-empirical model for the enthalpy of formation in the liquid and solid state G. Implantation metallurgy - study of equilibrium alloys.
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
Introduction The bombardment of a growing film with energetic particles has been observed to change for the better a number of characteristics and properties, critical to the performance of thin films and coatings, such as adhesion, densification of films grown at low substrate temperatures, modification of residual stresses, control of texture (orientation), modification of grain size and morphology, modification of optical properties, and modification of hardness and ductility. The process of simultaneous thin-film deposition and directed ion bombardment from an ion source has been labeled by a variety of terms including: ion assisted coating (IAC); ion assisted deposition (IAD); ion vapor deposition (IVD); ion beam enhanced deposition (IBED); dynamic recoil mixing (DRM) at high energies; and ion beam assisted deposition (IBAD). This term, ion beam assisted deposition , or IBAD, will be used here in favor of its growing acceptance by the energetic-particle–solid interaction research community. The important role of ions in thin-film deposition techniques has long been realized by the coating community. It is difficult, however, in many of the plasma based coating techniques, to separate out the degree to which ion and neutral particle fluxes as well as ion energies affect resultant coating properties. Mattox (1982) showed as early as 1963 that energetic ions within plamsa had an important influence on coating properties in his early development of ion plating. In addition, other plasma-based deposition processes, such as activated reactive evaporation (ARE), developed by R. F. Bunshah and co-workers (Bunshah, 1982), employ ionization to promote film properties.
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
Study of metallurgical phenomena Ion implantation is a powerful tool, useful in the study of alloying phenomena in metals, but the technique has been exploited in that capacity by only a few researchers. The following discussion, taken from the work of S. M. Myers, gives examples of its use for this purpose. Myers (1980) was one of the first to fully utilize ion implantation to study metallurgical phenomena. The as-implanted ‘surface’ alloy is often metastable on the basis of extended solubilities, as discussed in Chapter 10. Upon heating, the implanted structure returns to an equilibrium situation, and the tracing of this evolution to equilibrium serves to help determine properties such as diffusion rates, solid solubilities, and solute trapping. The study of this transition can be aided by the use of ion beam analysis methods, as well as by conventional electron microscopy, as described below. Myers outlines the evolution of the ion implanted depth distribution and the formalism required to extract the pertinent solid state parameters from the analysis; his approach is paraphrased below. Diffusion and the composition profile The quantitative determination of metallurgical properties relies principally on analysis of the time-dependent composition profile obtained during annealing. This analysis involves certain approximations, depending upon the particular experiment, and Myers has outlined the mathematics for certain specific cases, assuming the host to be semi-infinite. The evolution of the implanted distribution during thermal annealing, performed after the implantation has been completed, is of greatest interest.
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
1. General features and fundamental concepts 2. Interatomic potentials 3. Dynamics of binary elastic collisions 4. Cross-section 5. Ion stopping 6. Ion range and range distribution 7. Radiation damage and spikes 8. Ion-solid simulations and irradiation enhanced transport 9. Sputtering 10. Order-disorder under irradiation and ion implantation metallurgy 11. Ion beam mixing 12. Phase transformations 13. Ion beam assisted deposition 14. Applications of ion beam processing techniques 15. Ion beam system features Appendices: A. Crystallography B. Table of contents C. Density of states D. Derivation of the Thomas-Fermi differential equations E. Centre-of-mass and laboratory scattering angles F. Miedemas semi-empirical model for the enthalpy of formation in the liquid and solid state G. Implantation metallurgy - study of equilibrium alloys.
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
1. General features and fundamental concepts 2. Interatomic potentials 3. Dynamics of binary elastic collisions 4. Cross-section 5. Ion stopping 6. Ion range and range distribution 7. Radiation damage and spikes 8. Ion-solid simulations and irradiation enhanced transport 9. Sputtering 10. Order-disorder under irradiation and ion implantation metallurgy 11. Ion beam mixing 12. Phase transformations 13. Ion beam assisted deposition 14. Applications of ion beam processing techniques 15. Ion beam system features Appendices: A. Crystallography B. Table of contents C. Density of states D. Derivation of the Thomas-Fermi differential equations E. Centre-of-mass and laboratory scattering angles F. Miedemas semi-empirical model for the enthalpy of formation in the liquid and solid state G. Implantation metallurgy - study of equilibrium alloys.
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
1. General features and fundamental concepts 2. Interatomic potentials 3. Dynamics of binary elastic collisions 4. Cross-section 5. Ion stopping 6. Ion range and range distribution 7. Radiation damage and spikes 8. Ion-solid simulations and irradiation enhanced transport 9. Sputtering 10. Order-disorder under irradiation and ion implantation metallurgy 11. Ion beam mixing 12. Phase transformations 13. Ion beam assisted deposition 14. Applications of ion beam processing techniques 15. Ion beam system features Appendices: A. Crystallography B. Table of contents C. Density of states D. Derivation of the Thomas-Fermi differential equations E. Centre-of-mass and laboratory scattering angles F. Miedemas semi-empirical model for the enthalpy of formation in the liquid and solid state G. Implantation metallurgy - study of equilibrium alloys.
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen
Archive | 1996
Michael Nastasi; J. W. Mayer; James K. Hirvonen