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Jan Evert Van Der Werf

ASML Holding

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Publication

Featured researches published by Jan Evert Van Der Werf.

Archive | 2001

Method of measuring overlay

Rene Monshouwer; Jacobus Hermanus Maria Neijzen; Jan Evert Van Der Werf

Archive | 2004

Inspection apparatus, sample and inspection method

Jan Evert Van Der Werf; Arie Jeffrey Den Boef; Cristian-Nicolae Presura

Archive | 2001

Method of measuring alignment of a substrate with respect to a reference alignment mark

Rene Monshouwer; Jacobus Hermanus Maria Neijzen; Jan Evert Van Der Werf

Archive | 2004

Device manufacturing method, device manufactured thereby and a mask for use in the method

Jan Evert Van Der Werf; Erik Roelof Loopstra; Hans Meiling; Johannes Hubertus Josephina Moors; Martinus Hendrikus Antonius Leenders

Archive | 2004

Alignment system and lithographic apparatus equipped with such an alignment system

Cristian Presura; Jan Evert Van Der Werf

Archive | 2003

Method of detecting mask defects, a computer program and reference substrate

Jan Evert Van Der Werf; Auke Jan Mud

Archive | 2004

Device manufacturing method, lithographic apparatus and device manufactured thereby

Joost Jeroen Ottens; Levinus Pieter Bakker; Wilhelmus Josephus Box; Jan Van Elp; Frank Jeroen Pieter Schuurmans; Jan Evert Van Der Werf

Archive | 2005

Lithographic apparatus, device manufacturing method and radiation system

Ralph Kurt; Levinus Pieter Bakker; Frank Jeroen Pieter Schuurmans; Jan Evert Van Der Werf

Archive | 2004

Holographic mask for lithographic apparatus and device manufacturing method

Bernardus Hendrikus Wilhelmus Hendriks; Jan Evert Van Der Werf

Archive | 2004

Apparatus and method for inspecting a patterned part of a sample

Jan Evert Van Der Werf; Arie Jeffrey Den Boef; Cristian-Nicolae Presura

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Collaboration

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