Jean-Paul Booth

Capacitively-coupled electrostatic (cce) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof

Passive capacitively-coupled electrostatic (cce) probe arrangement for detecting plasma instabilities in a plasma processing chamber

Rf-biased capacitively-coupled electrostatic (rfb-cce) probe arrangement for characterizing a film in a plasma processing chamber

Passive capacitively-coupled electrostatic (cce) probe arrangement for detecting in-situ arcing events in a plasma processing chamber

Methods for automatically characterizing a plasma

Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber

Plasma unconfinement sensor and methods thereof

Methods and apparatus for normalizing optical emission spectra

Processing system for detecting in-situ arcing events during substrate processing

Systems for automatically characterizing a plasma