Jeff Th. M. De Hosson

Enhanced Strain in Functional Nanoporous Gold with a Dual Microscopic Length Scale Structure

We have synthesized nanoporous Au with a dual microscopic length scale by exploiting the crystal structure of the alloy precursor. The synthesized mesoscopic material is characterized by stacked Au layers of submicrometer thickness. In addition, each layer displays nanoporosity through the entire bulk. It is shown that the thickness of these layers can be tailored via the grain size of the alloy precursor. The two-length-scale structure enhances the functional properties of nanoporous gold, leading to charge-induced strains of amplitude up to 6%, which are roughly 2 orders of magnitude larger than in nanoporous Au with the standard one-length-scale porous morphology. A model is presented to describe these phenomena.

Supramolecular Route to Well-Ordered Metal Nanofoams

Metal nanofoams with a porosity above 50% v/v have recently attracted great interest in materials science due to their interesting properties. We demonstrate a new straightforward route to prepare such nanofoams using diblock copolymer-based PS-block-P4VP(PDP) supramolecules that self-assemble into a bicontinuous gyroid morphology, consisting of PS network channels in a P4VP(PDP) matrix. After dissolving the PDP, the P4VP collapses onto the PS struts and a free-standing bicontinuous gyroid template of 50-100 μm thickness and interconnected, uniformly sized pores is formed. The hydrophilic P4VP corona facilitates the penetration of water-based plating reagents into the porous template and enables a successful metal deposition. After plating, the polymer is simply degraded by heating, resulting in a well-ordered inverse gyroid nickel foam. Essential to this approach is the removal of only one part of the matrix (i.e., PDP). Therefore, the template accounts for 50% v/v or more. The porosity characteristics (amount, size of pores) can be tuned by selecting the appropriate copolymer and by adjusting the amount of PDP.

Metallic Muscles at Work: High Rate Actuation in Nanoporous Gold/Polyaniline Composites

Metallic muscles made of nanoporous metals suffer from serious drawbacks caused by the usage of an aqueous electrolyte for actuation. An aqueous electrolyte prohibits metallic muscles from operating in dry environments and hampers a high actuation rate due to the low ionic conductivity of electrolytes. In addition, redox reactions involved in electrochemical actuation severely coarsen the ligaments of nanoporous metals, leading to a substantial loss in performance of the actuator. Here we present an electrolyte-free approach to put metallic muscles to work via a metal/polymer interface. A nanocoating of polyaniline doped with sulfuric acid was grown onto the ligaments of nanoporous gold. Dopant sulfate anions coadsorbed into the polymer coating matrix were exploited to tune the nanoporous metal surface stress and subsequently generate macroscopic dimensional changes in the metal. Strain rates achieved in the single-component nanoporous metal/polymer composite actuator are 3 orders of magnitude higher than that of the standard three-component nanoporous metal/electrolyte hybrid actuator.

Hybrid Polyamide/Silica Nanocomposites : Synthesis and Mechanical Testing

A hybrid inorganic-polymer composite was formed through nanosize silica filler particles ( 0.5.

Influence of capping layers on the crystallization of doped SbxTe fast-growth phase-change films

Isothermal crystallization of doped SbxTe fast-growth phase-change films, with and without capping layers, was investigated using transmission electron microscopy, which provided direct and quantitative information on nucleation and growth processes separately. Two types of amorphous dielectric layers, ZnS–SiO2 and GeCrN, were used for sandwiching the SbxTe films to form typical trilayer stacks, which are the active part in applications. The nucleation and growth parameters of SbxTe films were found to be influenced by the dielectric capping layers. The crystal growth rate is temperature dependent and it reduces when the film is sandwiched between the dielectric layers. The reduction in growth rate differs with the capping layer type. The capping layer influence on the growth rate is pronounced at lower temperatures ∼160°C, but tends to vanish at higher temperatures ∼200°C. The activation energy for crystal growth is 2.4±0.3eV for an uncapped film and it increases ∼40% when the capping layers, GeCrN or Zn...

Molecule-by-Molecule Writing Using a Focused Electron Beam

The resolution of lithography techniques needs to be extended beyond their current limits to continue the trend of miniaturization and enable new applications. But what is the ultimate spatial resolution? It is known that single atoms can be imaged with a highly focused electron beam. Can single atoms also be written with an electron beam? We verify this with focused electron-beam-induced deposition (FEBID), a direct-write technique that has the current record for the smallest feature written by (electron) optical lithography. We show that the deposition of an organometallic precursor on graphene can be followed molecule-by-molecule with FEBID. The results show that mechanisms that are inherent to the process inhibit a further increase in control over the process. Hence, our results present the resolution limit of (electron) optical lithography techniques. The writing of isolated, subnanometer features with nanometer precision can be used, for instance, for the local modification of graphene and for catalysis.

Polarity-dependent reversible resistance switching in Ge–Sb–Te phase-change thin films

In this paper, we demonstrate reversible resistance switching in a capacitorlike cell using a Ge–Sb–Te film that does not rely on amorphous-crystalline phase change. The polarity of the applied electric field switches the cell resistance between lower- and higher-resistance states, as was observed in current-voltage characteristics. Moreover, voltage pulses less than 1.25V showed this switching within time scales of microseconds with more than 40% contrast between the resistance states. The latter are found to be nonvolatile for months. The switching could also be achieved at nanoscales with atomic force microscopy with a better resistance contrast of three orders of magnitude.

Influence of electron beam exposure on crystallization of phase-change materials

Isothermal crystallization of amorphous SbxTe films capped with ZnS-SiO2 or GeCrN layers was performed using in situ heating within a transmission electron microscope. The effect of the electron beam of the microscope on the crystallization process was investigated. It was found that electron irradiation during the crystallization process leads to a continuous increase in the crystal growth velocity. For SbxTe sandwiched between ZnS-SiO2 the effect of the electron beam was equivalent to a temperature rise of about 10 K, without affecting the activation energy for growth. However, for SbxTe sandwiched between GeCrN the activation energy for growth was also decreased due to electron beam exposure. The observed variations in the crystal growth rates are attributed to relaxations within the initial amorphous phase initiated by thermal energy and/or electron irradiation.

Microstructure and Properties of TiB/Ti-6Al-4V Coatings Produced With Laser Treatments

TiB/Ti-6Al-4V metal-matrix composite (MMC) layers were produced on Ti-6Al-4V substrates by laser cladding. A TiB2/Ti powder mixture was used as a precursor to obtain a dispersion of TiB needles in the Ti alloy matrix, with the aid of an exothermic reaction between TiB2 and Ti. A eutectic microstructure was obtained that consisted of an extremely homogeneous dispersion of TiB eutectic needles in the Ti alloy matrix, having a volume fraction as high as 0.33. Also, an equilibrium-like microstructure was found, consisting of a dispersion of both primary and eutectic TiB needles inside the Ti alloy matrix. An analysis of the geometry of the layers was performed and proved successful in determining the percentage of B. Further, it correctly predicted the variation of atomic B content as a function of laser power. The relative wear resistance coefficient, defined as the wear coefficient of the uncoated matrix divided by that of coating, shows an improvement by a factor as high as 1500 for the eutectic microstructure.

Focused helium and neon ion beam induced etching for advanced extreme ultraviolet lithography mask repair

The gas field ion microscope was used to investigate helium and neon ion beam induced etching of nickel as a candidate technique for extreme ultraviolet (EUV) lithography mask editing. No discernable nickel etching was observed for room temperature helium exposures at 16 and 30 keV in the dose range of 1 × 1015–1 × 1018 He+/cm2; however, transmission electron microscopy (TEM) revealed subsurface damage to the underlying Mo-Si multilayer EUV mirror. Subsequently, neon beam induced etching at 30 keV was investigated over a similar dose range and successfully removed the entire 50 nm nickel top absorber film at a dose of ∼3 × 1017 Ne+/cm2. Similarly, TEM revealed subsurface damage in the underlying Mo-Si multilayer. To further understand the helium and neon damage, the authors simulated the ion–solid interactions with our EnvizION Monte-Carlo model, which reasonably correlated the observed damage and bubble formation to the nuclear energy loss and the implanted inert gas concentration, respectively. A critical nuclear energy density loss of ∼80 eV/nm3 and critical implant concentration of ∼2.5 × 1020 atoms/cm3 have been estimated for damage generation in the multilayer structure.