Jeffrey C. Benzing

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Publication

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Archive | 1994

Induction plasma source

Jeffrey C. Benzing; Eliot K. Broadbent; J. Kirkwood H. Rough

Archive | 1991

Gas-based substrate protection during processing

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart

Archive | 1990

Gas-based backside protection during substrate processing

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart

Archive | 1994

Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart

Archive | 1996

Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart; Lawrence C. Lane; Edward J. McInerney

Archive | 1994

Wafer surface protection in a gas deposition process

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart

Archive | 1995

Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart; Lawrence C. Lane; Edward J. McInerney

Archive | 1995

Gas-based substrate deposition protection

Everhardus P. van de Ven; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart

Archive | 1991

Apparatus for and method of protection during substrate processing

Den Ven Everhardus P. Van; Eliot K. Broadbent; Jeffrey C. Benzing; Barry L. Chin; Christopher W. Burkhart

Archive | 1997

Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil

Jeffrey A. Tobin; Jeffrey C. Benzing; Eliot K. Broadbent; J. Kirkwood H. Rough

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De Ven Everhardus P. Van

National Semiconductor

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AmeriCorps VISTA

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Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot

Dive into the research topics where Jeffrey C. Benzing is active.

Publication

Featured researches published by Jeffrey C. Benzing.

Induction plasma source

Gas-based substrate protection during processing

Gas-based backside protection during substrate processing

Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate

Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus

Wafer surface protection in a gas deposition process

Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus

Gas-based substrate deposition protection

Apparatus for and method of protection during substrate processing

Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil

Collaboration

Dive into the Jeffrey C. Benzing's collaboration.