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Dive into the research topics where Jeffrey Donald Jones is active.

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Featured researches published by Jeffrey Donald Jones.


Ibm Journal of Research and Development | 1993

Mass transfer of an impinging jet confined between parallel plates

Oscar A. Moreno; Robert H. Katyl; Jeffrey Donald Jones; Peter A. Moschak

An understanding of the mass transfer behavior of an impinging jet can be usefully applied to wet chemical processes such as water rinsing, photoresist development, and metal etching or plating. Theoretical and experimental methods were used to study the mass transfer characteristics of an axisymmetric impinging jet confined between two parallel plates. Such a configuration was used because of its potential applicability to the fabrication of printed wiring boards. The CFD (computational fluid dynamics) method was used to model fluid flow and mass transfer. An electrochemical probe based on the ferro-ferricyanide system was used to experimentally determine the mass transfer coefficients and to evaluate the applicability of the theoretical methods used. An etching method was used to characterize the mass transfer rates in a typical cupric chloride etching solution. A new observation of the effect of jet instability on the etching rate in the central impingement zone is discussed.


international symposium on electronics and the environment | 1994

Fluid head-source reduction process technology

G.A. Bendz; M.S. Horan; Jeffrey Donald Jones; F.A. Tavares

The fluid head is an exciting new technology developed at IBM Endicott. It is based on the fluid bearing principle, where small volumes of high speed fluid, hold and support and process a panel. This process is confined very close to the product and is able to deliver controlled amounts of fluids resulting in: less water usage; emission reduction; better chemical containment; reduced atomization; less hazardous waste; and less energy consumption. In this paper, comparisons of equipment utilizing the fluid head in rinsing, and drying devices are compared with conventional dip and spray processes. Parameters of ionic contamination, debris removal, electrical usage, as well as water usage and reduction in floor space are compared.<<ETX>>


Archive | 1994

Apparatus and method for fluid processing of electronic packaging with flow pattern change

Jeffrey Donald Jones; Robert H. Katyl; Thomas Lawrence Miller; Oscar A. Moreno


Archive | 1995

Method for fluid treating a substrate

Fraser Patrick Donlan Jr.; David Dwight Hare; Jeffrey Donald Jones; Thomas Lawrence Miller; Ronald James Moore; Richard Francis Nelson


Archive | 2000

Apparatus, and corresponding method, for chemically etching substrates.

Edward Jay Frankoski; Jeffrey Donald Jones; Robert H. Katyl; Lyn Braxton Ratcliff


Archive | 1995

Apparatus for chemically etching substrates

Edward Jay Frankoski; Jeffrey Donald Jones; Robert H. Katyl; Lyn Braxton Ratcliff


Archive | 1998

Fluid treatment apparatus and method applicable for PCB etching

Steven Lindz Bard; Gerald Andrei Bendz; Michael James Chnestaro; John Robert Chapura; Edward Jay Frankoski; Michael Shawn Horan; Jeffrey Donald Jones


Archive | 1994

Etching apparatus and method therefor

Edward Jay Frankoski; Jeffrey Donald Jones; Robert H. Katyl; Lyn Braxton Ratcliff; エドワード・ジェイ・フランコスキー; ジェフリー・ドナルド・ジョーンズ; リン・ブラクストン・ラットクリフ; ロバート・ヘンリー・カタイル


Archive | 1994

Vorrichtung zur Behandlung von Gegenständen mit Flüssigkeiten Device for treatment of objects with liquids

Steven Lindz Bard; Gerald Andrei Bendz; Michael James Canestaro; John Robert Chapura; Edward Jay Frankoski; Michael Shawn Horan; Jeffrey Donald Jones; James Steven Kamperman; John Robert Kjelgaard; Jack Marlyn Mccreary


Archive | 1994

Vorrichtung zur Behandlung von Gegenständen mit Flüssigkeiten

Steven Lindz Bard; Gerald Andrei Bendz; Michael James Canestaro; John Robert Chapura; Edward Jay Frankoski; Michael Shawn Horan; Jeffrey Donald Jones; James Steven Kamperman; John Robert Kjelgaard; Jack Marlyn Mccreary

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