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Jeffrey Todd Carey

Eastman Kodak Company

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Publication

Featured researches published by Jeffrey Todd Carey.

Chemistry of Materials | 2008

Thin-Film Morphology Control in Naphthalene-Diimide-Based Semiconductors: High Mobility n-Type Semiconductor for Organic Thin-Film Transistors

Deepak Shukla; Shelby Forrester Nelson; Diane Carol Freeman; Manju Rajeswaran; Wendy G. Ahearn; Dianne M. Meyer; Jeffrey Todd Carey

Archive | 2007

Deposition system for thin film formation

David H. Levy; Roger S. Kerr; Jeffrey Todd Carey

Archive | 2009

System for thin film deposition utilizing compensating forces

David H. Levy; Roger S. Kerr; Jeffrey Todd Carey

Archive | 2005

N,N'-dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors

Deepak Shukla; Diane Carol Freeman; Shelby Forrester Nelson; Jeffrey Todd Carey; Wendy G. Ahearn

Archive | 2005

N-type semiconductor materials for thin film transistors

Deepak Shukla; Diane Carol Freeman; Shelby Forrester Nelson; Jeffrey Todd Carey; Wendy G. Ahearn

Archive | 2006

Configurationally controlled N,N'-Dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors

Deepak Shukla; Thomas Robert Welter; Jeffrey Todd Carey; Manju Rajeswaran; Wendy G. Ahearn

Archive | 2008

Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head

David H. Levy; Roger S. Kerr; Jeffrey Todd Carey

Archive | 2006

Naphthalene based tetracarboxylic diimides as semiconductor materials

Deepak Shukla; Diane Carol Freeman; Shelby Forrester Nelson; Jeffrey Todd Carey; Wendy G. Ahearn

Archive | 2007

Naphthalene-based tetracarboxylic diimide compounds as semiconductor materials

Deepak Shukla; Thomas Robert Welter; Jeffrey Todd Carey; Manju Rajeswaran; Wendy G. Ahearn

Archive | 2008

Verfahren zum herstellen dünner filme mit gaszuführvorrichtung mit räumlicher trennung reaktiver gase und vorbeigeführtem substrat

David H. Levy; Roger S. Kerr; Jeffrey Todd Carey

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Collaboration

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Deepak Shukla

Eastman Kodak Company

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Wendy G. Ahearn

Eastman Kodak Company

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Diane Carol Freeman

Eastman Kodak Company

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Shelby Forrester Nelson

Eastman Kodak Company

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David H. Levy

Eastman Kodak Company

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Roger S. Kerr

Eastman Kodak Company

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Manju Rajeswaran

Eastman Kodak Company

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Thomas Robert Welter

Eastman Kodak Company

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Dianne M. Meyer

Eastman Kodak Company

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