Jens Lenaerts

Ion yield improvement for static secondary ion mass spectrometry by use of polyatomic primary ions

Static secondary ion mass spectrometry (S-SIMS) is one of the potentially most powerful and versatile tools for the analysis of surface components at the monolayer level. Current improvements in detection limit (LOD) and molecular specificity rely on the optimisation of the desorption-ionisation (DI) process. As an alternative to monoatomic projectiles, polyatomic primary ion (P.I.) bombardment increases ion yields non-linearly. Common P.I. sources are Ga+ (liquid metal ion gun (LMIG), SF5+ (electron ionisation) and the newer Au(n)+, Bi(n)q+ (both LMIG) and C60+ (electron ionisation) sources. In this study the ion yield improvement obtained by using the newly developed ion sources is assessed. Two dyes (zwitterionic and/or thermolabile polar functionalities on a largely conjugated backbone) were analysed as a thin layer using Ga+, SF5+, C60+, Bi+, Bi3(2+) and Bi5(2+) projectiles under static conditions. The study aims at evaluating the improvement in LOD, useful and characteristic yield and molecular specificity. The corrected total ion count values for the different P.I. sources are compared for different instruments to obtain a rough estimate of the improvements. Furthermore, tentative ionisation and fragmentation schemes are provided to describe the generation of radical and adduct ions. Characteristic ion yields are discussed for the different P.I. sources. An overview of the general appearances of the mass spectra obtained with the different P.I. sources is given to stress the major improvement provided by polyatomic P.I.s in yielding information at higher m/z values.

TOF-S-SIMS molecular depth profiling of organic bilayers using mechanical wear test methodology

AbstractRecent publications on static secondary ion mass spectrometry (S-SIMS) focus on molecular depth profiling by using polyatomic or ultra-low energy monoatomic projectiles. Since their applicability depends on the relationship between the ion yield and the depth, which is hard to obtain without extensive studies, a combination of a wear test method with S-SIMS surface analysis was performed in the current study. Using this non-sputtering procedure, the relation between the signal intensity and the local concentration remains in principle the same as that at the surface (which is easy to determine). Mechanical erosion was successfully applied to expose sub-surface material from organic multilayers. Through surface analysis with S-SIMS on the gradually exposed deeper planes, molecular depth profiles could be obtained. The study was conducted on a model system relevant to offset printing, consisting of two polymer layers, containing dyes and a surfactant, cast on an Al substrate. FigureConcept of mechanical erosion followed by S-SIMS surface analysis to obtain molecular depth profiles