Jeong Ho Mun

Multicomponent Nanopatterns by Directed Block Copolymer Self-Assembly

Complex nanopatterns integrating diverse nanocomponents are crucial requirements for advanced photonics and electronics. Currently, such multicomponent nanopatterns are principally created by colloidal nanoparticle assembly, where large-area processing of highly ordered nanostructures raises significant challenge. We present multicomponent nanopatterns enabled by block copolymer (BCP) self-assembly, which offers device oriented sub-10-nm scale nanopatterns with arbitrary large-area scalability. In this approach, BCP nanopatterns direct the nanoscale lateral ordering of the overlaid second level BCP nanopatterns to create the superimposed multicomponent nanopatterns incorporating nanowires and nanodots. This approach introduces diverse chemical composition of metallic elements including Au, Pt, Fe, Pd, and Co into sub-10-nm scale nanopatterns. As immediate applications of multicomponent nanopatterns, we demonstrate multilevel charge-trap memory device with Pt-Au binary nanodot pattern and synergistic plasmonic properties of Au nanowire-Pt nanodot pattern.

Flexible and transferrable self-assembled nanopatterning on chemically modified graphene.

Figure 1 . (a) Transferrable self-assembled nanopatterning procedure. See text for details. SEM images of lamellar BCP nanotemplates transferred onto (b) right angled fracture edge of silicon wafer and (c) microscale ZnO hillock. (d) Photograph and (e) SEM image of cylindrical BCP nanotemplates transferred onto syringe needle surface. Block copolymer (BCP) self-assembly generates dense and periodic nanodomains, whose characteristic dimensions can be as small as 3 nm. [ 1–3 ] Such self-assembly in thin fi lms can create two-dimensional lithographic nanotemplates with pattern precision barely attainable by other methods. [ 4–9 ] Substantial progress in the synergistic integration of BCP selfassembly with e-beam lithography and ArF or other photolithography, demonstrates that this self-assembly based nanopatterning is a promising technology to complement the resolution limit of a conventional lithography. [ 10–20 ] Meanwhile, BCP self-assembled nanopatterning has been regarded as an intrinsic two-dimensional patterning method specifi cally useful for hard and fl at inorganic substrates. [ 4 , 21 ] The wellestablished processing steps involved with the formation of uniform thickness, ultrathin (typically less than 100 nm) BCP fi lm via spin casting and subsequent thermal/solvent annealing are generally considered incompatible to three-dimensional geometries or conventional fl exible polymer substrates with low chemical/thermal stability and surface roughness typically larger than nanoscale. In this work, mechanically robust but compliant chemically modifi ed graphene (CMG) fi lm [ 22 , 23 ] is introduced as a transferrable and disposable substrate for the self-assembled nanopatterning of nonplanar, fl exible, and even multistack device oriented structures. Taking advantage of the high chemical/ thermal stability, genuine atomic scale fl atness, and mechanical robustness with compliance, graphene based materials can be excellent substrates for nanopatterning (Supporting Information, Table S1). [ 24 , 25 ] While pristine graphene has a low surface energy, CMG prepared via

Au–Ag Core–Shell Nanoparticle Array by Block Copolymer Lithography for Synergistic Broadband Plasmonic Properties

Localized surface plasmon resonance of metallic nanostructures receives noticeable attention in photonics, electronics, catalysis, and so on. Core-shell nanostructures are particularly attractive due to the versatile tunability of plasmonic properties along with the independent control of core size, shell thickness, and corresponding chemical composition, but they commonly suffer from difficult synthetic procedures. We present a reliable and controllable route to a highly ordered uniform Au@Ag core-shell nanoparticle array via block copolymer lithography and subsequent seeded-shell growth. Size-tunable monodisperse Au nanodot arrays are generated by block copolymer self-assembly and are used as seed layers to grow Ag shells with variable thickness. The resultant Au@Ag core-shell nanoparticle arrays exhibit widely tunable broadband enhancement of plasmonic resonance, greatly surpassing single-element nanoparticle or homogeneous alloy nanoparticle arrays. Surface-enhanced Raman scattering of the core-shell nanoparticle arrays showed an enhancement factor greater than 270 from Au nanoparticle arrays.

Graphoepitaxy of Block‐Copolymer Self‐Assembly Integrated with Single‐Step ZnO Nanoimprinting

A highly efficient, ultralarge-area nanolithography that integrates block-copolymer lithography with single-step ZnO nanoimprinting is introduced. The UV-assisted imprinting of a photosensitive sol-gel precursor creates large-area ZnO topographic patterns with various pattern shapes in a single-step process. This straightforward approach provides a smooth line edge and high thermal stability of the imprinted ZnO pattern; these properties are greatly advantageous for further graphoepitaxial block-copolymer assembly. According to the ZnO pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block-copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of ZnO trench depth enabled by nanoimprinting, generated complex hierarchical nanopatterns, where surface-parallel and surface-perpendicular nanocylinder arrays are alternately arranged. The stability of this complex morphology is confirmed by self-consistent field theory (SCFT) calculations. The highly ordered graphoepitaxial nanoscale assembly achieved on transparent semiconducting ZnO substrates offers enormous potential for photonics and optoelectronics.

Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer

Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization of silicon or oxides for display applications. Two-dimensional materials such as graphene exhibit remarkable physical properties and are under intensive development for the manufacture of flexible devices. Here we demonstrate an area-selective ultrafast nanofabrication method using low intensity infrared or visible laser irradiation to direct the self-assembly of block copolymer films into highly ordered manufacturing-relevant architectures at the scale below 12 nm. The fundamental principles underlying this light-induced nanofabrication mechanism include the self-assembly of block copolymers to proceed across the disorder-order transition under large thermal gradients, and the use of chemically modified graphene films as a flexible and conformal light-absorbing layers for transparent, nonplanar, and mechanically flexible surfaces.

Monodisperse pattern nanoalloying for synergistic intermetallic catalysis.

Nanoscale alloys attract enormous research attentions in catalysis, magnetics, plasmonics and so on. Along with multicomponent synergy, quantum confinement and extreme large surface area of nanoalloys offer novel material properties, precisely and broadly tunable with chemical composition and nanoscale dimension. Despite substantial progress of nanoalloy synthesis, the randomized positional arrangement and dimensional/compositional inhomogeneity of nanoalloys remain significant technological challenges for advanced applications. Here we present a generalized route to synthesize single-crystalline intermetallic nanoalloy arrays with dimensional and compositional uniformity via self-assembly. Specific electrostatic association of multiple ionic metal complexes within self-assembled nanodomains of block copolymers generated patterned monodisperse bimetallic/trimetallic nanoalloy arrays consisting of various elements, including Au, Co, Fe, Pd, and Pt. The precise controllability of size, composition, and intermetallic crystalline structure of nanoalloys facilitated tailored synergistic properties, such as accelerated catalytic growth of vertical carbon nanotubes from Fe-Co nanoalloy arrays.

Highly tunable refractive index visible-light metasurface from block copolymer self-assembly

The refractive index of natural transparent materials is limited to 2–3 throughout the visible wavelength range. Wider controllability of the refractive index is desired for novel optical applications such as nanoimaging and integrated photonics. We report that metamaterials consisting of period and symmetry-tunable self-assembled nanopatterns can provide a controllable refractive index medium for a broad wavelength range, including the visible region. Our approach exploits the independent control of permeability and permittivity with nanoscale objects smaller than the skin depth. The precise manipulation of the interobject distance in block copolymer nanopatterns via pattern shrinkage increased the effective refractive index up to 5.10. The effective refractive index remains above 3.0 over more than 1,000 nm wavelength bandwidth. Spatially graded and anisotropic refractive indices are also obtained with the design of transitional and rotational symmetry modification.

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning

One of the fundamental challenges encountered in successful incorporation of directed self-assembly in sub-10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory-Huggins interaction parameter (χ). Herein, reliable, fab-compatible, and ultrafast directed self-assembly of high-χ block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 °C) by flash light irradiation enables large grain growth of sub-10 nm scale self-assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self-assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self-assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self-assembly of sub-10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light-absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll-to-roll processability.

Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning.

Ordered metal nanopatterns are crucial requirements for electronics, magnetics, catalysts, photonics, and so on. Despite considerable progress in the synthetic route to metal nanostructures, highly ordered metal nanopatterning over a large-area is still challenging. Nanodomain swelling block copolymer lithography is presented as a general route to the systematic morphology tuning of metal nanopatterns from amphiphilic diblock copolymer self-assembly. Selective swelling of hydrophilic nanocylinder domains in amphiphilic block copolymer films during metal precursor loading and subsequent oxygen based etching generates diverse shapes of metal nanopatterns, including hexagonal nanoring array and hexagonal nanomesh and double line array in addition to common nanodot and nanowire arrays. Solvent annealing condition of block copolymer templates, selective swelling of hydrophilic cylinder nanodomains, block copolymer template thickness, and oxygen based etching methods are the decisive parameters for systematic morphology evolution. The plasmonic properties of ordered Au nanopatterns are characterized and analyzed with finite differential time domain calculation. This approach offers unprecedented opportunity for diverse metal nanopatterns from commonly used diblock copolymer self-assembly.

Controlled Segmentation of Metal Nanowire Array by Block Copolymer Lithography and Reversible Ion Loading

Spatial arrangement of 1D nanomaterials may offer enormous opportunities for advanced electronics and photonics. Moreover, morphological complexity and chemical diversity in the nanoscale components may lead to unique properties that are hardly anticipated in randomly distributed homogeneous nanostructures. Here, controlled chemical segmentation of metal nanowire arrays using block copolymer lithography and subsequent reversible metal ion loading are demonstrated. To impose chemical heterogeneity in the nanowires generated by block copolymer lithography, reversible ion loading method highly specific for one particular polymer block is introduced. Reversibility of the metal ion loading enables area-selective localized replacement of metal ions in the self-assembled patterns and creates segmented metal nanowire arrays with different metallic components. Further integration of this method with shear aligning process produces high aligned segmented metal nanowire array with desired local chemical compositions.