Jeremiah D. Brown

Spatially polarizing autocloned elements

A space-variant polarization converting element is introduced that utilizes an autocloning effect to produce high aspect ratio from birefringent gratings. This method utilizes a multilayer deposition process on a template to convert a linearly polarized incident beam to an azimuthally polarized output at a wavelength of 1.55 microm with more than 90% efficiency.

Development of a two-dimensional phase-grating mask for fabrication of an analog-resist profile

Fabrication of a thick analog profile with photoresist is a difficult task in photolithography. We demonstrate that a binary phase-grating photomask with an appropriate period and duty cycles is capable of manipulating the exposure illumination in an analog fashion and can be used for fabrication of the desired analog micro-optics profiles on the surface of a thick photoresist. By choosing the proper period and variation of duty cycle of the phase-grating mask, one can create the desired analog intensity of exposure illumination for an optical stepper. This allows the formation of a wide range of analog micro-optics profiles with an SPR 220-7 photoresist. The numerical convolution of the diffraction efficiency curve and resist exposure characteristics is used to predict the final resist profile and also to design the appropriate duty-cycle distribution for the binary phase grating. As a demonstration of this technology, we fabricated a variety of micro-optical elements, such as a positive lens, ring lens, prism, and vortex of approximately 100-200 microm diameter, by using a phase-grating mask fabricated in a poly(methyl methacrylate) electron-beam resist.

Analog micro-optics fabrication by use of a binary phase grating mask

In this paper, we present a new photo-mask technology capable of forming a continuous relief micro-optic profile on thick photo-resist. This technique eliminates many of the drawbacks of gray-scale and half-tone masking technology. An optical stepper is used to fabricate binary phase gratings of pi phase depth on a transparent quartz reticle. When the phase reticle is used in the stepper an analog intensity profile is created on the wafer. The period is constrained allowing for control of the 0th order in the stepper. The duty cycle of the phase gratings can be varied in such a way to provide the proper analog intensity profile for a wide range of micro-optics on the photo-resist. The design, analysis, and fabrication procedures of this technique will be discussed.

Micro-optic fabrication with subdomain masking

An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in integrated circuit manufacturing and can be applied to thick and thin photoresists and is based on additive lithographic techniques introduced elsewhere [Appl. Opt. 41, 6176 (2002)]. We chose a simple subdomain basis set to transform the two-dimensional basis patterns into a family of various three-dimensional micro-optic elements using exposure control to modulate the third dimension. We demonstrate the capability to sculpt the photoresist into a variety of three-dimensional micro-optic elements by performing multiple exposures using elements from the subdomain basis set, without resorting to multiple etching steps.

Additive lithography for refractive micro-optics

An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in Integrated Circuit manufacturing and can be applied to thick and thin photoresists. The additive concept is centered on the idea of using multiple exposures to remove the desired amount of resist without resorting to multiple etching steps. This presentation will explain how the additive technique, used with thin and thick resists, will revolutionize our capability to efficiently form refractive lenses and micro-optics for optical beam shaping and transforming. The quality and reproducibility of these elements will also be discussed.

Improved fabrication accuracy of Bragg gratings

Bragg gratings have been used relatively extensively in recent years due to their highly dispersive and wavelength selective nature. Typically used as a reflective structure, the gratings reflect specific wavelengths at specific locations along the structure based on the grating periodicity to spatially shape an incident pulse of light according to its spectral components. Usually the purpose is to either compress or stretch the pulse. Unfortunately, fabrication tolerances severely limit the amount of chirp per unit of waveguide length that can be placed on a Bragg grating. For some applications, a few nanometers of chirp over a meter or more of waveguide would be ideal, yet placement accuracy of individual features is usually far less than is needed for such a task. We propose an alternative fabrication method which would provide a long grating with substantially increased placement accuracy. Instead of fashioning the grating in the typical linear manner, a waveguide is fabricated in a spiral shape. This has been done for delay lines and amplifier structures in the past. However, we propose to incorporate a radial grating underneath it. This provides us an additional degree of freedom, since the period of the grating changes very linearly with its radius, and a waveguide can be accurately positioned on top of it so as to gradually spiral inwards (or outwards) and change radius (and, hence, grating period) very slowly along its length. We present fabrication results, optical comparisons between similar linear and spiral structures, and preliminary theoretical modeling of the structures.

Polarization converting element for minimizing the losses in cylindrical hollow waveguides

Bending loss is the biggest drawback to hollow waveguides used for light delivery applications such as laser ablation. One way to overcome this limitation without changing the fiber design or fabrication is to engineer the input light to excite specific modes with better optical properties. Our first order calculations of the transmission and bending losses inside the cylindrical hollow waveguides showed that the TE01 mode suffers the least amount of losses. To selectively excite this mode, it is desired to design an optical component that converts incident linearly polarized light into a rotating wave similar to the TE01 mode. This work focuses on the design and fabrication of a subwavelength structure that converts the input polarization into that of the TE01 mode.

Refractive micro-optics fabrication with a 1-D binary phase grating mask applicable to MOEMS processing

We present a new photomask technology capable of forming a continuous rotationally symmetric microstructure in thick photoresist. This technique eliminates many of the drawbacks of grayscale and half-tone masking technology. A binary phase grating of pi phase depth on a transparent quartz mask plate is fabricated in PMMA resist using an e-beam direct writing technique. When the phase mask is used in the stepper, an analog intensity profile is created on the wafer. The period is constrained, allowing for control of the zero-order in the stepper. The duty cycle of the phase gratings can be varied in such a way to provide the proper analog intensity profile for a wide range of micro-optics on the photoresist. The design, analysis, and fabrication procedures of this technique are discussed. This processing technique can be applied to many MOEMS devices that require refractive elements for optical processing. The method greatly simplifies the device process, reducing the cost and improving the device yield.

Design and Optimization of TE

In this work, we present an innovative approach for designing small-scale microcavity resonators. By introducing a gold cladding around the structure, we may significantly reduce the mode volume and simultaneously increase the cavitys quality Q-factor. By making use of the TE011 mode, as opposed to the more traditional HE111 mode, we may further reduce the mode volume while taking advantage of decreased loss into the metal layer due to the optimal polarization choice. We demonstrate a means to design and optimize the cavity geometry to obtain desired spectral characteristics through the use of particle swarm optimization, and we present a cavity operating at 1.5 mum with a Q value exceeding 300 000 and a modal volume of less than 0.9(lambda/n)3.

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Particle swarm optimization is used to design innovative geometries of micro-cavity optical resonators with very high q-factors at desired resonances. The quality factor and resonant frequency of the cavity are evaluated using eigenmode analysis.