Ji-Hwan Kwon

Strain-induced spin states in atomically ordered cobaltites.

Epitaxial strain imposed in complex oxide thin films by heteroepitaxy is recognized as a powerful tool for identifying new properties and exploring the vast potential of materials performance. A particular example is LaCoO(3), a zero spin, nonmagnetic material in the bulk, whose strong ferromagnetism in a thin film remains enigmatic despite a decade of intense research. Here, we use scanning transmission electron microscopy complemented by X-ray and optical spectroscopy to study LaCoO(3) epitaxial thin films under different strain states. We observed an unconventional strain relaxation behavior resulting in stripe-like, lattice modulated patterns, which did not involve uncontrolled misfit dislocations or other defects. The modulation entails the formation of ferromagnetically ordered sheets comprising intermediate or high spin Co(3+), thus offering an unambiguous description for the exotic magnetism found in epitaxially strained LaCoO(3) films. This observation provides a novel route to tailoring the electronic and magnetic properties of functional oxide heterostructures.

Defect-related room-temperature ferroelectricity in tensile-strained SrTiO3 thin films on GdScO3 (110) substrates

We investigate room-temperature (RT) ferroelectricity in tensile-strained SrTiO3 (STO) thin films grown on GdScO3 (110) substrates. To separate the strain and the defect dipole effect, we apply an electric field to measure the polarization in the direction perpendicular to the elongation axis, and the RT ferroelectric polarization is found to be perpendicular to that axis. These results clearly demonstrate the importance of the contribution of defect dipoles to the RT ferroelectricity observed in STO thin films.

Large-scale assembly of highly flexible low-noise devices based on silicon nanowires

Recently, integrated flexible devices based on silicon nanowires (Si-NWs) have received significant attention as high performance flexible devices. However, most previous assembly methods can generate only specifically-shaped devices and require unconventional facilities, which has been a major hurdle for industrial applications. Herein, we report a simple but very efficient method for assembling Si-NWs into virtually generally-shape patterns on flexible substrates using only conventional microfabrication facilities, allowing us to mass-produce highly flexible low-noise devices. As proof of this method, we demonstrated the fabrication of highly bendable top-gate transistors based on Si-NWs. These devices showed typical n-type semiconductor behaviors, and exhibited a much lower noise level compared to previous flexible devices based on organic conductors or other nanowires. In addition, the gating behaviors and low-noise characteristics of our devices were maintained, even under highly bent conditions.

Morphology transformation of patterned, uniform and faceted GaN microcrystals

We report on the growth and characterization of patterned and uniformly distributed GaN microcrystals with well-defined facets and epitaxy. The microcrystals were grown on a mask patterned by lithography. The GaN microcrystals were formed by selective-area epitaxy using metal-organic chemical-vapour deposition. The GaN microcrystals have similar sizes and shapes. Each microcrystal consists of an upper and a lower part, which are rotated by 30°. Transmission electron microscopy shows that there is a rather clear interface between the two parts of the crystal, suggesting a sudden change in the growth direction. We performed ab initio calculations for the surface energies of hexagonal GaN, and the growth morphology is explained based on surface energy considerations.

Electron energy-loss spectroscopy analysis of HfO2 dielectric films on strained and relaxed SiGe∕Si substrates

In this investigation, HfO2 thin films were deposited on strained and strain-relaxed epitaxial-SiGe∕Si substrates, and subsequently subjected to annealing. Electron energy-loss spectroscopy analysis was used to investigate the electronic structure and composition of the film as well as the interfacial layer (IL). While the energy-loss function of the dielectric films revealed predominant Si diffusion in the strained substrates, post deposition annealing (PDA) significantly influenced the diffusion and altered the local composition of the IL in strain-relaxed substrates. Analysis of electronic structures revealed the origin of significant loss of Ge atoms at the IL during PDA.

Electrical properties of the amorphous interfacial layer between Al electrodes and epitaxial NiO films

The amorphous interfacial layer (a-IL) between Al electrode and epitaxial NiO films were studied using electron energy-loss spectroscopy (EELS) and energy-dispersive x-ray spectroscopy. Two distinct properties were found in the a-IL, i.e., a lower metallic and an upper insulating layer. EELS results revealed that the metallic Ni atoms were responsible for the conducting nature of the lower oxide amorphous layer. The resistance behavior of Al/a-IL/epi-NiO was changed from a high to a low resistance state after forming process. The resistance change could be explained by the formation of a nanocrystalline metal alloy in the insulating amorphous layer.