Jifa Tian

Electronic transport in chemical vapor deposited graphene synthesized on Cu: Quantum Hall effect and weak localization

We report on electronic properties of graphene synthesized by chemical vapor deposition (CVD) on copper then transferred to SiO2/Si. Wafer-scale (up to 4 in.) graphene films have been synthesized, consisting dominantly of monolayer graphene as indicated by spectroscopic Raman mapping. Low temperature transport measurements are performed on microdevices fabricated from such CVD graphene, displaying ambipolar field effect (with on/off ratio ∼5 and carrier mobilities up to ∼3000 cm2/V s) and “half-integer” quantum Hall effect, a hall-mark of intrinsic electronic properties of monolayer graphene. We also observe weak localization and extract information about phase coherence and scattering of carriers.

Observation of topological surface state quantum Hall effect in an intrinsic three-dimensional topological insulator

Experimentalists have observed the predicted half-integer quantum Hall effect using the topological insulator BiSbTeSe2, which exhibits topological surface states at room temperature, with each surface contributing a half quantum of Hall conductance.

Effect of electron-beam irradiation on graphene field effect devices

Electron beam exposure is a commonly used tool for fabricating and imaging graphene-based devices. Here, we present a study of the effects of electron-beam irradiation on the electronic transport properties of graphene and the operation of graphene field-effect transistors (GFETs). Exposure to a 30 keV electron-beam caused negative shifts in the charge-neutral point (CNP) of the GFET, interpreted as due to n-doping in the graphene from the interaction of the energetic electron beam with the substrate. The shift in the CNP is substantially reduced for suspended graphene devices. The electron beam is seen to also decrease the carrier mobilities and minimum conductivity, indicating defects created in the graphene. The findings are valuable for understanding the effects of radiation damage on graphene and for the development of radiation-hard graphene-based electronics.

Atomic-Scale Investigation of Graphene Grown on Cu Foil and the Effects of Thermal Annealing

We have investigated the effects of thermal annealing on ex-situ chemically vapor deposited submonolayer graphene islands on polycrystalline Cu foil at the atomic-scale using ultrahigh vacuum scanning tunneling microscopy. Low-temperature annealed graphene islands on Cu foil (at ∼430 °C) exhibit predominantly striped Moiré patterns, indicating a relatively weak interaction between graphene and the underlying polycrystalline Cu foil. Rapid high-temperature annealing of the sample (at 700-800 °C) gives rise to the removal of Cu oxide and the recovery of crystallographic features of the copper that surrounds the intact graphene. These experimental observations of continuous crystalline features between the underlying copper (beneath the graphene islands) and the surrounding exposed copper areas revealed by high-temperature annealing demonstrates the impenetrable nature of graphene and its potential application as a protective layer against corrosion.

Direct Imaging of Graphene Edges: Atomic Structure and Electronic Scattering

We report an atomically resolved scanning tunneling microscopy investigation of the edges of graphene grains synthesized on Cu foils by chemical vapor deposition. Most of the edges are macroscopically parallel to the zigzag directions of graphene lattice. These edges have microscopic roughness that is found to also follow zigzag directions at atomic scale, displaying many ∼120° turns. A prominent standing wave pattern with periodicity ∼3a/4 (a being the graphene lattice constant) is observed near a rare-occurring armchair-oriented edge. Observed features of this wave pattern are consistent with the electronic intervalley backscattering predicted to occur at armchair edges but not at zigzag edges.

Graphene Induced Surface Reconstruction of Cu

An atomic-scale study utilizing scanning tunneling microscopy (STM) in ultrahigh vacuum (UHV) is performed on large single crystalline graphene grains synthesized on Cu foil by a chemical vapor deposition (CVD) method. After thermal annealing, we observe the presence of periodic surface depressions (stripe patterns) that exhibit long-range order formed in the area of Cu covered by graphene. We suggest that the observed stripe pattern is a Cu surface reconstruction formed by partial dislocations (which appeared to be stair-rod-like) resulting from the strain induced by the graphene overlayer. In addition, these graphene grains are shown to be more decoupled from the Cu substrate compared to previously studied grains that exhibited Moiré patterns.

Scanning gate microscopy on graphene: charge inhomogeneity and extrinsic doping

We have performed scanning gate microscopy (SGM) on graphene field effect transistors (GFET) using a biased metallic nanowire coated with a dielectric layer as a contact mode tip and local top gate. Electrical transport through graphene at various back gate voltages is monitored as a function of tip voltage and tip position. Near the Dirac point, the response of graphene resistance to the tip voltage shows significant variation with tip position, and SGM imaging displays mesoscopic domains of electron-doped and hole-doped regions. Our measurements reveal substantial spatial fluctuation in the carrier density in graphene due to extrinsic local doping from sources such as metal contacts, graphene edges, structural defects and resist residues. Our scanning gate measurements also demonstrate graphenes excellent capability to sense the local electric field and charges.

Ambipolar graphene field effect transistors by local metal side gates

We demonstrate ambipolar graphene field effect transistors individually controlled by local metal side gates. The side gated field effect can have on/off ratio comparable with that of the global back gate, and can be tuned in a large range by the back gate and/or a second side gate. We also find that the side gated field effect is significantly stronger by electrically floating the back gate compared to grounding the back gate, consistent with the finding from electrostatic simulation.

Electrical injection and detection of spin-polarized currents in topological insulator Bi2Te2Se.

Topological insulators (TIs) are an unusual phase of quantum matter with nontrivial spin-momentum-locked topological surface states (TSS). The electrical detection of spin-momentum-locking of TSS has been lacking till very recently. Many of the results are from samples with significant bulk conduction, such as Bi2Se3, where it can be challenging to separate the surface and bulk contribution to the spin signal. Here, we report spin potentiometric measurements in flakes exfoliated from bulk insulating Bi2Te2Se crystals, using two outside nonmagnetic contacts for driving a DC spin helical current and a middle ferromagnetic (FM)-Al2O3 contact for detecting spin polarization. The voltage measured by the FM electrode exhibits a hysteretic step-like change when sweeping an in-plane magnetic field between opposite directions along the easy axis of the FM contact. Importantly, the direction of the voltage change can be reversed by reversing the direction of current, and the amplitude of the change as measured by the difference in the detector voltage between opposite FM magnetization increases linearly with increasing current, consistent with the current-induced spin polarization of spin-momentum-locked TSS. Our work directly demonstrates the electrical injection and detection of spin polarization in TI and may enable utilization of TSS for applications in nanoelectronics and spintronics.

Quantum and Classical Magnetoresistance in Ambipolar Topological Insulator Transistors with Gate-tunable Bulk and Surface Conduction

Weak antilocalization (WAL) and linear magnetoresistance (LMR) are two most commonly observed magnetoresistance (MR) phenomena in topological insulators (TIs) and often attributed to the Dirac topological surface states (TSS). However, ambiguities exist because these phenomena could also come from bulk states (often carrying significant conduction in many TIs) and are observable even in non-TI materials. Here, we demonstrate back-gated ambipolar TI field-effect transistors in (Bi0.04Sb0.96)2Te3 thin films grown by molecular beam epitaxy on SrTiO3(111), exhibiting a large carrier density tunability (by nearly 2 orders of magnitude) and a metal-insulator transition in the bulk (allowing switching off the bulk conduction). Tuning the Fermi level from bulk band to TSS strongly enhances both the WAL (increasing the number of quantum coherent channels from one to peak around two) and LMR (increasing its slope by up to 10 times). The SS-enhanced LMR is accompanied by a strongly nonlinear Hall effect, suggesting important roles of charge inhomogeneity (and a related classical LMR), although existing models of LMR cannot capture all aspects of our data. Our systematic gate and temperature dependent magnetotransport studies provide deeper insights into the nature of both MR phenomena and reveal differences between bulk and TSS transport in TI related materials.