Jilin Zhang

Microphase Separation of Block Copolymer Thin Films

Today, high-ordered micro- and nano-patterned surfaces are widely used in many areas, such as in the preparation of super-thin dielectric films, photonic crystals, antireflective films, super-non-wetting surfaces, bio-compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano-scale structures (<100u2009nm), the development of other micro- and nano-patterning techniques that can be used to fabricate long-range ordered features - especially nanoscale arrays - is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length-scales of 10-50u2009nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long-range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order-order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given.

Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer

In this paper, the authors have systematically studied the microphase separation and crystallization during spin coating of an ABC triblock copolymer, polystyrene-b-poly(2-vinylpyridine)-b-poly(ethylene oxide) (PS-b-P2VP-b-PEO). The microphase separation of PS-b-P2VP-b-PEO and the crystallization of PEO blocks can be modulated by the types of the solvent and the substrate, the spinning speed, and the copolymer concentration. Ordered microphase-separated pattern, where PEO and P2VP blocks adsorbed to the substrate and PS blocks protrusions formed hexagonal dots above the P2VP domains, can only be obtained when PS-b-P2VP-b-PEO is dissolved in N,N-dimethylformamide and the films are spin coated onto the polar substrate, silicon wafers or mica. The mechanism of the formation of regular pattern by microphase separation is found to be mainly related to the inducement of the substrate (middle block P2VP wetting the polar substrate), the quick vanishment of the solvent during the early stage of the spin coating, and the slow evaporation of the remaining solvent during the subsequent stage. On the other hand, the probability of the crystallization of PEO blocks during spin coating decreases with the reduced film thickness. When the film thickness reaches a certain value (3.0 nm), the extensive crystallization of PEO is effectively prohibited and ordered microphase-separated pattern over large areas can be routinely prepared. When the film thickness exceeds another definite value (12.0 nm), the crystallization of PEO dominates the surface morphology. For films with thickness between these two values, microphase separation and crystallization can simultaneously occur.