Jingming Liu
Chinese Academy of Sciences
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Publication
Featured researches published by Jingming Liu.
Journal of Electronic Materials | 2012
Yongbiao Bai; Jingming Liu; Huajun Shen; Peng Ma; Xin Yu Liu; Liwei Guo
The effect of annealing on the characteristics of Pd/Au contacts to p-type GaN/Al0.45Ga0.55N was investigated. The electrical characteristics of Pd/Au contacts and a p-GaN/AlGaN sample were measured after annealing at different temperatures from 550°C to 850°C. Changes in the surface electrical characteristic of p-GaN/AlGaN material were observed after each annealing step. It is indicated that the surface electrical characteristic of p-GaN/AlGaN material plays an important role in the current transport through Pd/Au pads. A possible reason for those changes is impurity contamination, most likely oxygen and carbon contamination introduced from processing. The microstructure of Pd on p-GaN/AlGaN was investigated by glancing-incidence x-ray diffraction (GXRD). The results of GXRD show that the AlPd2 and GaPd2 phases were formed at the interface after annealing, and the formation of these phases could be effective for forming ohmic contacts on p-GaN/AlGaN.
Journal of Semiconductors | 2017
Xiaoyu Chen; Youwen Zhao; Zhiyuan Dong; Guiying Shen; Yongbiao Bai; Jingming Liu; Hui Xie; Jiangbian He
SiN x /SiO x passivation and double side P-diffusion gettering treatment have been used for the fabrication of c-Si solar cells. The solar cells fabricated have high open circuit voltage and short circuit current after the double P-diffusion treatment. In addition to better surface passivation effect, SiN x /SiO x layer has lower reflectivity in long wavelength range than conventional SiN x film. As a consequence, such solar cells exhibit higher conversion efficiency and better internal quantum efficiency, compared with conventional c-Si solar cells.
Journal of Semiconductors | 2016
Jie Su; Tong Liu; Jingming Liu; Jun Yang; Guiying Shen; Yongbiao Bai; Zhiyuan Dong; Youwen Zhao
Beta-type gallium oxide (β-Ga2O3) is a new attractive material for optoelectronic devices. Different methods had been tried to grow high quality β-Ga2O3 crystals. In this work, crystal growth of Ga2O3 has been carried out by chemical vapor transport (CVT) method in a closed quartz tube using C as transport agent and sapphire wafer as seed. The CVT mass flux has been analyzed by theoretical calculations based on equilibrium thermodynamics and 1D diffusional mass transport. The crystal growth experimental results are in agreement with the theoretical predictions. Influence factors of Ga2O3 crystal growth, such as temperature distribution, amount of C as transport agent used, have also been discussed. Structural (XRD) and optical (Raman spectroscopy, photoluminescence spectrum) properties of the CVT-Ga2O3 crystal are presented.
Journal of Vacuum Science and Technology | 2013
Jingming Liu; Youwen Zhao; Zhiyuan Dong; Fengyun Yang; Fenghua Wang; Kewei Cao; Tong Liu; Hui Xie; Teng Chen
Residual impurities and contamination on semi-insulating (SI) InP wafers are detrimental for epitaxial growth and device performance, especially because residual silicon on an SI-InP wafer surface is electrically active and generates an n-type conduction layer at the interface between the epilayer and the InP substrate. In order to reduce the concentration of Si and improve surface quality, the authors investigate a wet-chemical cleaning process for ready-to-use InP substrates. A novel and practical cleaning process was developed by adding an alkaline solution to the conventional acidic cleaning process. Time-of-flight secondary mass spectrometry, a very powerful analysis technique to characterize surfaces and investigate any organic and inorganic contamination present on the InP surface, was used after the samples were etched under different cleaning processes. The results show that the novel etching process effectively reduces the Si contamination.
Journal of Semiconductors | 2017
Jie Su; Tong Liu; Jingming Liu; Jun Yang; Guiying Shen; Yongbiao Bai; Zhiyuan Dong; Fangfang Wang; Youwen Zhao
GaSb is the most suitable substrate in the epitaxial growth of mixed semiconductors of GaSb system. In this work, Te-doped GaSb bulk crystals with different doping concentration have been annealed at 550 ℃ for 100 h in ambient antimony. The annealed samples have been studied by Hall effect measurement, infrared (IR) optical transmission, Glow discharge mass spectroscopy (GDMS) and photoluminescence (PL) spectroscopy. After annealing, Te-doped GaSb samples exhibit a decrease of carrier concentration and increase of mobility, along with an improvement of below gap IR transmission. Native acceptor related electrical compensation analysis suggests a formation of donor defect with deeper energy level. The mechanism of the variation of the defect and its influence on the material properties are discussed.
Chinese Physics B | 2016
Jie Su; Tong Liu; Jingming Liu; Jun Yang; Yongbiao Bai; Guiying Shen; Zhiyuan Dong; Fangfang Wang; Youwen Zhao
Undoped p-type GaSb single crystals were annealed at 550–600 °C for 100 h in ambient antimony. The annealed GaSb samples were investigated by Hall effect measurement, glow discharge mass spectroscopy (GDMS), infrared (IR) optical transmission and photoluminescence (PL) spectroscopy. Compared with the as-grown GaSb single crystal, the annealed GaSb samples have lower hole concentrations and weak native acceptor related PL peaks, indicating the reduction of the concentration of gallium antisite related native acceptor defects. Consequently, the below gap infrared transmission of the GaSb samples is enhanced after the thermal treatment. The mechanism about the reduction of the native defect concentration and its influence on the material property were discussed.
Materials Science in Semiconductor Processing | 2015
Dongyan Tao; Yu Cheng; Jingming Liu; Jie Su; Tong Liu; Fengyun Yang; Fenghua Wang; Kewei Cao; Zhiyuan Dong; Youwen Zhao
Science China-technological Sciences | 2015
Hui Xie; Tong Liu; Jingming Liu; Kewei Cao; Zhiyuan Dong; Jun Yang; Youwen Zhao
Materials Science in Semiconductor Processing | 2018
Guiying Shen; Youwen Zhao; Yongbiao Bai; Ding Yu; Jingming Liu; Hui Xie; Zhiyuan Dong; Jun Yang; Fengyun Yang; Fenghua Wang
Journal of Electronic Materials | 2018
Guiying Shen; Youwen Zhao; Jingming Liu; Yongbiao Bai; Zhiyuan Dong; Hui Xie; Xiaoyu Chen