Jinxiao Wang

Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition

An inductively coupled plasma (ICP) system with the adjustable distance between the inductance coil and substrates was designed to effectively utilize the spatial confinement of ICP discharge, and then control the gas-phase transport process. The effects of the gas phase processes on the crystallinity and preferred orientation of silicon films deposited on glass were systematically investigated. The investigation was conducted in the ICP-chemical vapor deposition process with the precursor gas of a SiH4∕H2 mixture at a substrate temperature of 350°C. Highly crystallized silicon films with different preferred orientations, (111) or (220), could be selectively deposited by adjusting the SiH4 dilution ratio [R=[SiH4]∕([SiH4]+[H2])] or total working pressure. When the total working pressure is 20Pa, the crystallinity of the silicon films increases with the increase of the SiH4 dilution ratio, while the preferred orientation was changed from (111) to (220). In the case of the fixed SiH4 dilution (10%), the sil...

The effect of hydrogen on Cu3N thin films deposited by radio frequency magnetron sputtering

The Cu3N films were synthesized at room temperature by radio frequency magnetron sputtering in various H2+N2 mixture atmosphere on a glass substrate. The introduction of hydrogen promoted the crystallization of Cu3N distinctly, and the optimized growth of (100) plane was strong. Compared to the films with no hydrogen introduced, the electrical resistivity decreased by several magnitudes and the optical energy gap decreased notably too. A conspicuous improvement of electrical and optical properties was achieved, but the surface morphology did not gain any modification; on the contrary, the introduction of hydrogen engendered the protuberances on the surface of the films. The thermal stability was investigated by heating the films in vacuum chamber at different temperatures. The films decomposed at 150°C initially and at 250°C entirely; the thermal stability is not as good as Cu3N films with no hydrogen included. The films were characterized by x-ray diffraction, UV-visible spectrum, four-point probe, and f...