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Joachim Wienecke

Jenoptik

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Publication

Featured researches published by Joachim Wienecke.

Archive | 1995

Method for detection of defects in the inspection of structured surfaces

Dietmar Kollhof; Joachim Wienecke; Karl-Heinz Franke; Michael Graef; Heiko Kempe

Archive | 2000

Optical measurement arrangement and method for inclination measurement

Klaus Hallmeyer; Joachim Wienecke; Guenter Hoffmann

Archive | 1994

Detecting faults during inspection of masks, LCDs, circuit boards and semiconductor wafers

Joachim Wienecke; Karl-Heinz Franke; Michael Graef; Heiko Kempe; Dietmar Kollhoff

Archive | 1996

Semiconductor surface structure quality measuring method for integrated circuit manufacture

Michael Graef; Heiko Other; Joachim Wienecke; Karl-Heinz Franke; Lutz Jacob

Archive | 2000

Entkoppelte Wafer Neigungsmessung an Ellipsometer mit Spektralphotometer und Fokusmessung durch Spiegelobjectiv

Klaus Hallmeyer; Günter Hoffmann; Joachim Wienecke

Archive | 1999

Optische Messanordnung und Verfahren zur Neigungsmessung Optical device and method for inclination measurement

Klaus Hallmeyer; Joachim Wienecke; Guenter Hoffmann

Archive | 1999

Optical measuring arrangement and method for the inclination measurement

Klaus Hallmeyer; Joachim Wienecke; Guenter Hoffmann

Archive | 1997

Verfahren zur Fokussierung bei der Abbildung strukturierter Oberflächen von scheibenförmigen Objekten Method for focusing on the figure of structured surfaces of disc-shaped objects

Michael Graef; Joachim Wienecke; Uwe Graf; Guenter Hoffmann; Karl-Heinz Franke; Lutz Jakob

Archive | 1996

Verfahren und Einrichtung zur Auswahl von Meßgebieten bei der Vermessung von Strukturbreiten und Überdeckungsgenauigkeiten in Herstellungsprozessen für integrierte Schaltkreise Method and apparatus for selecting Meßgebieten in the measurement of structure widths and coverage accuracy in manufacturing processes for integrated circuits

Michael Graef; Heiko Other; Joachim Wienecke; Karl-Heinz Franke; Lutz Jacob

Archive | 1995

Procédé d'identification de défauts lors de l'inspection de surfaces structurées.

Dietmar Kollhof; Joachim Wienecke; Karl-Heinz Franke; Michael Graf; Heiko Kempe

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Karl-Heinz Franke

Jenoptik

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Michael Graef

Jenoptik

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Guenter Hoffmann

Leica Microsystems

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Klaus Hallmeyer

Leica Microsystems

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Heiko Other

Jenoptik

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Lutz Jacob

Jenoptik

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Michael Graf

Leica Microsystems

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Günter Hoffmann

Leica Microsystems

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Lutz Jakob

Leica Microsystems

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Uwe Graf

Leica Microsystems

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