Joakim Andersson

High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

The commonly used current-voltage characteristics are found inadequate for describing the pulsed nature of the high power impulse magnetron sputtering (HIPIMS) discharge; rather, the description needs to be expanded to current-voltage-time characteristics for each initial gas pressure. Using different target materials (Cu, Ti, Nb, C, W, Al, and Cr) and a pulsed constant-voltage supply, it is shown that the HIPIMS discharges typically exhibit an initial pressure dependent current peak followed by a second phase that is power and material dependent. This suggests that the initial phase of a HIPIMS discharge pulse is dominated by gas ions, whereas the later phase has a strong contribution from self-sputtering. For some materials, the discharge switches into a mode of sustained self-sputtering. The very large differences between materials cannot be ascribed to the different sputter yields but they indicate that generation and trapping of secondary electrons play a major role for current-voltage-time characteristics. In particular, it is argued that the sustained self-sputtering phase is associated with the generation of multiply charged ions because only they can cause potential emission of secondary electrons, whereas the yield caused by singly charged metal ions is negligibly small.

Frictional behavior of diamondlike carbon films in vacuum and under varying water vapor pressure

Frictional behavior of diamondlike carbon films in vacuum and under varying water vapor pressure

The Absence of Plasma in "Spark Plasma Sintering"

Spark plasma sintering (SPS) is a remarkable method for synthesizing and consolidating a large variety of both novel and traditional materials. The process typically uses moderate uni-axial pressures (<100 MPa) in conjunction with a pulsing on-off DC current during operation. There are a number of mechanisms proposed to account for the enhanced sintering abilities of the SPS process. Of these mechanisms, the one most commonly put forth and the one that draws the most controversy involves the presence of momentary plasma generated between particles. This study employees three separate experimental methods in an attempt to determine the presence or absence of plasma during SPS. The methods employed include: in-situ atomic emission spectroscopy, direct visual observation and ultra-fast in-situ voltage measurements. It was found using these experimental techniques that no plasma is present during the SPS process. This result was confirmed using several different powders across a wide spectrum of SPS conditions.

Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion

Pulsed magnetron sputtering was demonstrated in high vacuum: no sputter gas was used at any time. Sustained self-sputtering was initiated by multiply charged ions from a short vacuum arc. Copper ion currents to an ion collector in excess of 30A were measured, implying a plasma density of about 6×1018m−3. This technology may prove useful for metal coatings free of noble gas inclusions and suggests that magnetrons could operate in the vacuum of space. In addition to coating objects in space, the momentum of the sputtered atoms and ions may be utilized in space thrusters.

Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply charged titanium ions were identified by isotope-induced broadening at mass/charge 12. Due to their high potential energy, Ti4+ ions give a high yield of secondary electrons, which in turn are likely to be responsible for the generation of multiply charged states.

Drifting potential humps in ionization zones: the "propeller blades" of high power impulse magnetron sputtering

Ion energy distribution functions measured for high power impulse magnetron sputtering show features, such as a broad peak at several 10 eV with an extended tail, as well as asymmetry with respect to E×B, where E and B are the local electric and magnetic field vectors, respectively. Here it is proposed that those features are due to the formation of a potential hump of several 10 V in each of the traveling ionization zones. Potential hump formation is associated with a negative-positive-negative space charge that naturally forms in ionization zones driven by energetic drifting electrons.

Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas

Excitation and ionization conditions in traveling ionization zones of high power impulse magnetron sputtering plasmas were investigated using fast camera imaging through interference filters. The images, taken in end-on and side-on views using light of selected gas and target atom and ion spectral lines, suggest that ionization zones are regions of enhanced densities of electrons, and excited atoms and ions. Excited atoms and ions of the target material (Al) are strongly concentrated near the target surface. Images from the highest excitation energies exhibit the most localized regions, suggesting localized Ohmic heating consistent with double layer formation.

Local Electronic Structure of Functional Groups in Glycine As Anion, Zwitterion, and Cation in Aqueous Solution

Nitrogen and oxygen K emission spectra of glycine in the form of anions, zwitterions, and cations in aqueous solution are presented. It is shown that protonation has a dramatic influence on the local electronic structure and that the functional groups give a distinct spectral fingerprint.

Insights into “near-frictionless carbon films”

A form of hydrogenated diamond-like-carbon, “near-frictionless carbon,” developed at Argonne National Laboratory has been studied by several spectroscopic techniques to determine the hydrogen content and carbon bonding within the film. The techniques used include hydrogen forward scattering, ultraviolet Raman spectroscopy, Fourier transform infrared spectroscopy, near-edge x-ray absorption fine structure, and fluctuation microscopy. These complementary techniques reveal the different types of carbon bonding, such as sp2 and sp3, the medium-range order in the film, and its composition.

On the deactivation of the dopant and electronic structure in reactively sputtered transparent Al-doped ZnO thin films

We report on the possible origin of electrical heterogeneities in 4 at% Al-doped ZnO (AZO) reactively sputtered films. It is found through the Zn L3 and Al K edge x-ray absorption near-edge structure that a fraction of the Al dopant is deactivated by its positioning in octahedral conformation with oxygen. This fraction as well as the conductivity, optical bandgap and c-axis parameter of ZnO wurtzite are all found to depend on the sample position during deposition. The present results suggest the formation of a metastable Al2O3(ZnO)m homologous phase that degrades the electrical conductivity.