Joan Vila-Comamala

Translation position determination in ptychographic coherent diffraction imaging

Accurate knowledge of translation positions is essential in ptychography to achieve a good image quality and the diffraction limited resolution. We propose a method to retrieve and correct position errors during the image reconstruction iterations. Sub-pixel position accuracy after refinement is shown to be achievable within several tens of iterations. Simulation and experimental results for both optical and X-ray wavelengths are given. The method improves both the quality of the retrieved object image and relaxes the position accuracy requirement while acquiring the diffraction patterns.

Characterization of high-resolution diffractive X-ray optics by ptychographic coherent diffractive imaging

We have employed ptychographic coherent diffractive imaging to completely characterize the focal spot wavefield and wavefront aberrations of a high-resolution diffractive X-ray lens. The ptychographic data from a strongly scattering object was acquired using the radiation cone emanating from a coherently illuminated Fresnel zone plate at a photon energy of 6.2 keV. Reconstructed images of the object were retrieved with a spatial resolution of 8 nm by combining the difference-map phase retrieval algorithm with a non-linear optimization refinement. By numerically propagating the reconstructed illumination function, we have obtained the X-ray wavefield profile of the 23 nm round focus of the Fresnel zone plate (outermost zone width, Δr = 20 nm) as well as the X-ray wavefront at the exit pupil of the lens. The measurements of the wavefront aberrations were repeatable to within a root mean square error of 0.006 waves, and we demonstrate that they can be related to manufacturing aspects of the diffractive optical element and to errors on the incident X-ray wavefront introduced by the upstream beamline optics.

Advanced thin film technology for ultrahigh resolution X-ray microscopy

Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metal organic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved.

Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime

X-ray microscopy based on Fresnel zone plates is a powerful technique for sub-100 nm resolution imaging of biological and inorganic materials. Here, we report on the modeling, fabrication and characterization of zone-doubled Fresnel zone plates for the multi-keV regime (4-12 keV). We demonstrate unprecedented spatial resolution by resolving 15 nm lines and spaces in scanning transmission X-ray microscopy, and focusing diffraction efficiencies of 7.5% at 6.2 keV photon energy. These developments represent a significant step towards 10 nm spatial resolution for hard X-ray energies of up to 12 keV.

Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating

Due to the ability of 100 keV electrons to penetrate deep into resist with little scattering, we were able to directly write various dense and high aspect ratio nanostructures in 540 nm and 1.1 microm thick layers of poly(methyl methacrylate) (PMMA) resist. The PMMA molds produced by electron beam lithography were developed using a high contrast developer. The molds were used to transfer the pattern into metallic nanostructures by filling the developed trenches with Au by electroplating. By exposing lines narrower than the target width, we observed improved process latitude and line width control. The obtained aspect ratios of the dense structures are nearly 20 in 1.1 microm PMMA layers and > 16 for structures electroplated into this PMMA mold. The fabrication method was successfully applied to produce Au diffractive x-ray Fresnel zone plates of exceptionally good quality with 50 and 70 nm outermost zones using 540 nm and 1.1 microm thick PMMA molds. In addition, we also produced regular arrays of high aspect ratio and dense Au nanorods with periods down to 100 nm and high aspect ratio split-ring resonators.

Reconstruction of an astigmatic hard X-ray beam and alignment of K-B mirrors from ptychographic coherent diffraction data.

We have used coherent X-ray diffraction experiments to characterize both the 1-D and 2-D foci produced by nanofocusing Kirkpatrick-Baez (K-B) mirrors, and we find agreement. Algorithms related to ptychography were used to obtain a 3-D reconstruction of a focused hard X-ray beam waist, using data measured when the mirrors were not optimally aligned. Considerable astigmatism was evident in the reconstructed complex wavefield. Comparing the reconstructed wavefield for a single mirror with a geometrical projection of the wavefront errors expected from optical metrology data allowed us to diagnose a 40 μrad misalignment in the incident angle of the first mirror, which had occurred during the experiment. Good agreement between the reconstructed wavefront obtained from the X-ray data and off-line metrology data obtained with visible light demonstrates the usefulness of the technique as a metrology and alignment tool for nanofocusing X-ray optics.

Nanofocusing of hard X-ray free electron laser pulses using diamond based Fresnel zone plates

A growing number of X-ray sources based on the free-electron laser (XFEL) principle are presently under construction or have recently started operation. The intense, ultrashort pulses of these sources will enable new insights in many different fields of science. A key problem is to provide x-ray optical elements capable of collecting the largest possible fraction of the radiation and to focus into the smallest possible focus. As a key step towards this goal, we demonstrate here the first nanofocusing of hard XFEL pulses. We developed diamond based Fresnel zone plates capable of withstanding the full beam of the worlds most powerful x-ray laser. Using an imprint technique, we measured the focal spot size, which was limited to 320 nm FWHM by the spectral band width of the source. A peak power density in the focal spot of 4×1017 W/cm2 was obtained at 70 fs pulse length.

Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics

A technique for quantitatively characterizing the complex-valued focal wavefield of arbitrary optics is described and applied to reconstructing the coherent focused beam produced by a reflective/diffractive hard X-ray mirror. This phase-retrieval method, based on ptychography, represents an important advance in X-ray optics characterization because the information obtained and potential resolution far exceeds that accessible to methods of directly probing the focus. Ptychography will therefore be well-suited for characterizing and aligning future nanofocusing X-ray optics.

High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating.

The efficiencies of several Fresnel zone plates, that were fabricated using a direct-write method with high-energy electrons, were measured over a wide range of photon energies.

Zone-doubled Fresnel zone plates for high-resolution hard X-ray full-field transmission microscopy

The use of zone-doubled Fresnel zone plates for sub-20 nm spatial resolution in full-field transmission X-ray microscopy and tomography at the hard X-ray regime (8–10 keV) is demonstrated.