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Publication
Featured researches published by John A. Adams.
Thin Solid Films | 1997
Thomas Frederick Allen Bibby; John A. Adams; Karey Holland; Gerald A. Krulik; Paul Parikh
Abstract Initial results of chemical mechanical planarization (CMP) of 8 inch diameter thermal oxide (TOX) and TEOS sheet film semiconductor wafers using CMP slurry that have been reprocessed are presented. The slurry is reprocessed in an on-line system that has been fitted onto an IPEC Planar model 472 CMP system. Slurry consumption during the testing was at one-fifth of normal CMP slurry consumption for the system. CMP results showed no differences between wafers polished with 100% fresh slurry and those polished with reprocessed slurry.
Archive | 1999
Thomas Frederick Allen Bibby; John A. Adams; Robert A. Eaton; Christopher E. Barns; Charles Hannes
Archive | 1998
Fred E. Mitchel; John A. Adams; Thomas Frederick Allen Bibby
Archive | 2001
John A. Adams; Robert A. Eaton; Charles Chen
Archive | 2001
Thomas Frederick Allen Bibby; John A. Adams
Archive | 2000
John A. Adams; Thomas Frederick Allen Bibby
Archive | 2001
Thomas Frederick Allen Bibby; John A. Adams
Archive | 2001
John A. Adams; Robert A. Eaton
Journal of Vacuum Science & Technology B | 1999
John A. Adams; Thomas Frederick Allen Bibby
Archive | 2000
Thomas Frederick Allen Bibby; John A. Adams; Mark Meloni; Christopher E. Barns
