John Michael Legare
DuPont
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by John Michael Legare.
Journal of Vacuum Science and Technology | 1999
Mark J. Heller; John Michael Legare; Shuhong Wang; Shu Fukuhara
Perfluoroelastomer (e.g., Kalrez®, Chemraz®, etc.), fluoroelastomer (e.g., Viton®, etc.), and silicone parts are widely used in sealing applications for semiconductor wafer processing equipment. More specifically, they are often used as o-ring seals in dry chemical process equipment (e.g., plasma etchers, ashers, diffusion furnaces, chemical vapor deposition, low pressure chemical vapor deposition, rapid thermal processing, and lamp anneal, etc.). Many of these seals are required to function at process temperatures ranging from 200–300 °C and in some cases higher. The ability of an elastomer to resist thermal degradation has a significant impact on its ability to function effectively as a seal over time. This article evaluates and compares the relative long term sealing performance of perfluoroelastomers having different crosslinking chemistries and other typically specified high performance elastomers. Long-term compression set and seal force retention data are presented, including a discussion of the di...
advanced semiconductor manufacturing conference | 2010
Mark J. Heller; Shinichi Sogo; Joe Chen; John Michael Legare
High or ultra-high vacuum (UHV) processes for integrated circuit manufacturing require close control of vacuum levels and uniform gas composition in the chamber in order to insure optimum process efficiency, product uniformity and product consistency. Outgassing from elastomeric seals can affect both vacuum level and consistency. A test methodology has been developed using a residual gas analyzer to measure the outgassing properties of elastomers. This paper compares the outgassing characteristics of three different types of elastomeric seals (perfluo-roelastomers, fluoroelastomers and silicones) typically used in semiconductor wafer processing using this test method. Data on outgassing rate as a function of time and temperature are presented. While perfluoroelastomers as a material class exhibit the lowest outgassing rate at elevated temperatures, there are some performance variations depending on formulation and compounding.
Archive | 1994
John Michael Legare; Eric W. Thomas
Archive | 1993
John Michael Legare; Anestis Leonidas Logothetis
Journal of Fluorine Chemistry | 2003
Shuhong Wang; John Michael Legare
Archive | 1994
John Michael Legare; Eric W. Thomas
Archive | 1994
John Michael Legare; Anestis Leonidas Logothetis
Archive | 1994
John Michael Legare; Eric W. Thomas
Archive | 1994
John Michael Legare; Anestis Leonidas Logothetis
Archive | 1994
John Michael Legare; Anestis Leonidas Logothetis