John W. Spiewak | Researchain

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Archive | 1987

Polyarylamine compounds and systems utilizing polyarylamine compounds

Jean M. Frechet; Sylvie Gauthier; William W. Limburg; Rafik O. Loutfy; Dasarao K. Murti; John W. Spiewak

Archive | 1988

Photoresponsive imaging members with polyurethane blocking layers

Huoy-Jen Yuh; Beng S. Ong; John W. Spiewak; Constance J. Thornton

Archive | 1987

Arylamine polymers and systems utilizing arylamine polymers

John F. Yanus; John W. Spiewak; Dale S. Renfer; William W. Limburg

Archive | 1989

Conductive and blocking layers for electrophotographic imaging members

Huoy-Jen Yuh; John W. Spiewak; Constance J. Thornton; Joseph Mammino; Robert C. U. Yu; Vincent E. Hamilton; William W. Limburg; Cindy C. Chen

Archive | 1987

Process for fabricating a belt

Donald S. Sypula; Merlin E. Scharfe; Dennis A. Abramsohn; Paul J. Brach; Clifford H. Griffiths; Deborah Nichol-Landry; Andrew R. Melnyk; John W. Spiewak; Joseph Mammino; Edward C. Williams; Lieng-Huang Lee; Christine J. Tarnawskyj

Archive | 1992

ELECTROPHOTOGRAPHIC IMAGING MEMBER WITH BLOCKING LAYER CONTAINING UNCROSSLINKED CHEMICALLY MODIFIED COPOLYMER

John W. Spiewak; Huoy-Jen Yuh; Joseph Mammino; Robert C. U. Yu; Cindy C. Chen; Raymond K. Crandall; Steven J. Grammatica

Archive | 1992

Electrophotographic imaging member having unmodified hydroxy methacrylate polymer charge blocking layer

John W. Spiewak; Huoy-Jen Yuh; Constance J. Thornton; Dennis A. Abramsohn; Deborah Nichol-Landry; Joseph Mammino; Ronald F. Ziolo; Robert C. U. Yu; Kathleen M. Carmichael; Neil S. Patterson

Archive | 1994

Liquid developer compositions with block copolymers

James R. Larson; John W. Spiewak; J. Mort; Inan Chen; Martin A. Abkowitz; Homer Antoniadis

Archive | 1984

Process for preparing a phthalocyanine

Geoffrey Allison Page; Emery G. Tokoli; Robert T. Cosgrove; John W. Spiewak

Archive | 1993

Single layer photoreceptor

John W. Spiewak; John F. Yanus; Damodar M. Pai; Joseph Mammino; Dennis A. Abramsohn; William W. Limburg; Dale S. Renfer; Chei-Jen Chen; Paul J. DeFeo; Steven J. Grammatica; J. Michael Ishler; Merlin E. Scharfe; Donald S. Sypula

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