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Featured researches published by Jon L. Ebert.


Fuel Processing Technology | 1995

Chemical composition and size distributions for fly ashes

Sarbajit Ghosal; Jon L. Ebert; Sidney A. Self

Abstract Inter-particle variations in particle diameter and chemical composition in coal fly ashes are significant, and can be quantitatively studied using currently available microanalytical techniques. One such technique, computer controlled scanning electron microscopy (CCSEM), is now routinely used to determine chemical compositions and diameters of individual fly ash particles, using statistically significant sample sizes. This paper proposes simple mathematical formulae for expressing the inter-particle variations. Additionally, these formulae can be used for economically storing the large amount of data generated by CCSEM. Two apparent limitations of the CCSEM technique are discussed — one relating to the measurement of size distribution, and the other to determining the iron oxide distribution in the ash. These limitations are imposed by statistical considerations, and by artifacts of sample preparation techniques.


conference on decision and control | 1998

Run-to-run control of static systems

Robert L. Kosut; D. de Roover; Abbas Emami-Naeini; Jon L. Ebert

Run-to-run control using static linear models is examined. Conditions are presented for stability, (statistical) performance, and robustness using the standard control theory. A simulation example shows the usefulness of the method applied to a rapid thermal oxidation process.


conference on decision and control | 2005

Active Control of Flow Over a Backward-Facing Step

Abbas Emami-Naeini; S.A. McCabe; D. de Roover; Jon L. Ebert; Robert L. Kosut

We describe a control-oriented model reduction process from partial differential equation (PDE) descriptions of aerodynamic flow systems, and the design of low-order feedback controllers using these procedures. An effective approach for flow model reduction for active control using balanced truncation approaches was developed. The techniques were applied to a flow control problem representative of aerospace problems: active control of flow over a modified 2D backward-facing step, which can be handled by most commercial finite element packages. Although the geometry is rather simple, the richness of the flow field is well documented. Feedback controllers were developed for disturbance rejection and tracking of the reattachment point for both high and low Reynolds numbers.


international conference on advanced thermal processing of semiconductors | 2010

Model-based temperature control of heated plates

Jon L. Ebert; G. W. van der Linden; D. de Roover; L.L. Porter; Robert L. Kosut; Abbas Emami-Naeini

Many modern thermal processing systems involve temperature control of heated plates, where the plate can be a single wafer, heated by an array of tungsten halogen lamps from one or both sides, or thicker carriers or susceptors on which one or more wafers are placed, heated by radiation from hot filaments. The plates temperature is typically measured using pyrometers. These types of systems can be accurately described by a mathematical model of the physics. However, some of the system properties vary over time and/or from wafer-to-wafer and cannot be predicted in practice, although their range of values may be known. In many cases, the plates temperature is controlled using a proportional-integral-derivative (PID) controller, which may not be able to meet the desired temperature tracking performance (e.g. settling time, overshoot, repeatability) over a broad range of operating conditions. In this paper, an alternative model-based control approach is discussed that can achieve good performance for a wide range of operating conditions. In our approach, the mathematical system model is directly incorporated into the feedback controller. Simulation studies show that this approach yields significantly better performance and exhibits a much smaller sensitivity to system properties variation than a gain-scheduled PID controller.


Infrared Physics | 1993

The infrared refractive indices of CHBr3, CCl4 and CS2

Sarbajit Ghosal; Jon L. Ebert; Sidney A. Self

Abstract Spectrally resolved data for the real part, n(λ) of the complex refractive index, n = n + i k , of bromoform (tribromomethane, CHBr3) at room temperature (298 K) in the wavelength range 1–13 μm are presented. The measurements were made using the near-normal reflectance technique. The accuracy of the method was confirmed by comparing measured values of n(λ) of water with available data in the literature. For bromoform, n(λ) is found to decrease gradually from 1.58 to 1.51 over this wavelength range, except in the region of anomalous dispersion near absorption bands at 3.3 and 8.7 μm. A complete infrared window for extinction measurements on suspended particulates can be obtained using CCl4 in the spectral range 1–6 μm, CHBr3 in the ranges 6.0–7.4 μm and 11–13 μm, and CS2 in the range 7.4–11.0 μm. The data for n(λ) of CCl4 in the range 1–9 μm, and those for CS2 in the range 7.4–11.0 μm, obtained from reflectance measurements, compare favorably with data available in the literature.


Infrared Physics | 1993

A radiation source for both the visible and the infrared

M.A. Havstad; D.L. Brown; J.D. Maltby; Jon L. Ebert; Sidney A. Self

Abstract A radiation source with high output in both the visible and infrared spectral ranges has been developed, and its operating parameters are described. The hot element, a carbon composite board, is simple to fabricate as well as to operate. The source has been compared to both a tungsten strip lamp and a Nernst glower. For applications where both the visible and infrared ranges are of interest, this source allows for simplified experimental design.


IEEE Transactions on Control Systems and Technology | 2003

Modeling and control of distributed thermal systems

Abbas Emami-Naeini; Jon L. Ebert; Dick De Roover; Robert L. Kosut; M. Dettori; La Moyne Porter; Sarbajit Ghosal


Archive | 2003

Chemical-mechanical planarization controller

Dirk de Roover; Abbas Emami-Naeini; Jon L. Ebert


american control conference | 2004

Model-based control for semiconductor and advanced materials processing: an overview

Abbas Emami-Naeini; Jon L. Ebert; Robert L. Kosut; D. de Roover; Sarbajit Ghosal


american control conference | 2004

Model-based control of rapid thermal processing for semiconductor wafers

Jon L. Ebert; D. de Roover; L.L. Porter; V.A. Lisiewicz; Sarbajit Ghosal; Robert L. Kosut; Abbas Emami-Naeini

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D. de Roover

Delft University of Technology

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D.L. Brown

Lawrence Livermore National Laboratory

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J.D. Maltby

Lawrence Livermore National Laboratory

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M.A. Havstad

Lawrence Livermore National Laboratory

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M. Dettori

Delft University of Technology

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