Jonghwa Eom

Control of Spin Precession in a Spin-Injected Field Effect Transistor

Transistors Switch onto Spin Using the spin of an electron in addition to, or instead of, the charge properties is believed to have many benefits in terms of speed, power-cost, and integration density over conventional electronic circuits. At the heart of the field of spintronics has been a proposed spin-analog of the electronic transistor, the spin field effect transistor. Koo et al. (p. 1515) demonstrate the injection and detection of spin between two ferromagnetic contacts and show how the magnitude of the spin-current between the source and drain contacts can be controlled by a voltage applied to a gate. The results present an experimental realization of the concepts described for the spin-transistor. A field-effect transistor in which the spin current is controlled by a gate voltage is demonstrated. Spintronics increases the functionality of information processing while seeking to overcome some of the limitations of conventional electronics. The spin-injected field effect transistor, a lateral semiconducting channel with two ferromagnetic electrodes, lies at the foundation of spintronics research. We demonstrated a spin-injected field effect transistor in a high-mobility InAs heterostructure with empirically calibrated electrical injection and detection of ballistic spin-polarized electrons. We observed and fit to theory an oscillatory channel conductance as a function of monotonically increasing gate voltage.

Comparison of frictional forces on graphene and graphite

We report on the frictional force between an SiN tip and graphene/graphite surfaces using lateral force microscopy. The cantilever we have used was made of an SiN membrane and has a low stiffness of 0.006 N m(-1). We prepared graphene flakes on a Si wafer covered with silicon oxides. The frictional force on graphene was smaller than that on the Si oxide and larger than that on graphite (multilayer of graphene). Force spectroscopy was also employed to study the van der Waals force between the graphene and the tip. Judging that the van der Waals force was also in graphite-graphene-silicon oxide order, the friction is suspected to be related to the van der Waals interactions. As the normal force acting on the surface was much weaker than the attractive force, such as the van der Waals force, the friction was independent of the normal force strength. The velocity dependency of the friction showed a logarithmic behavior which was attributed to the thermally activated stick-slip effect.

Raman fingerprint of doping due to metal adsorbates on graphene

The properties of single-layer graphene are strongly affected by metal adsorbates and clusters on graphene. Here, we study the effect of a thin layer of chromium (Cr) and titanium (Ti) metals on chemical vapor deposition (CVD)-grown graphene by using Raman spectroscopy and transport measurements. The Raman spectra and transport measurements show that both Cr and Ti metals affect the structure as well as the electronic properties of the CVD-grown graphene. The shift of peak frequencies, intensities and widths of the Raman bands are analyzed after the deposition of metal films of different thickness on CVD-grown graphene. The shifts in G and 2D peak positions indicate the doping effect of graphene by Cr and Ti metals. While p-type doping was observed for Cr-coated graphene, n-type doping was observed for Ti-coated graphene. The doping effect is also confirmed by measuring the gate voltage dependent resistivity of graphene. We have also found that annealing in Ar atmosphere induces a p-type doping effect on Cr- or Ti-coated CVD-grown graphene.

High-mobility and air-stable single-layer WS2 field-effect transistors sandwiched between chemical vapor deposition-grown hexagonal BN films.

An emerging electronic material as one of transition metal dichalcogenides (TMDCs), tungsten disulfide (WS2) can be exfoliated as an atomically thin layer and can compensate for the drawback of graphene originating from a gapless band structure. A direct bandgap, which is obtainable in single-layer WS2, is an attractive characteristic for developing optoelectronic devices, as well as field-effect transistors. However, its relatively low mobility and electrical characteristics susceptible to environments remain obstacles for the use of device materials. Here, we demonstrate remarkable improvement in the electrical characteristics of single-layer WS2 field-effect transistor (SL-WS2 FET) using chemical vapor deposition (CVD)-grown hexagonal BN (h-BN). SL-WS2 FET sandwiched between CVD-grown h-BN films shows unprecedented high mobility of 214 cm2/Vs at room temperature. The mobility of a SL-WS2 FET has been found to be 486 cm2/Vs at 5 K. The ON/OFF ratio of output current is ~107 at room temperature. Apart from an ideal substrate for WS2 FET, CVD-grown h-BN film also provides a protection layer against unwanted influence by gas environments. The h-BN/SL-WS2/h-BN sandwich structure offers a way to develop high-quality durable single-layer TMDCs electronic devices.

Electrical spin injection and detection in an InAs quantum well

The authors demonstrate fully electrical detection of spin injection in InAs quantum wells. A spin-polarized current is injected from a Ni81Fe19 thin film to a two-dimensional electron gas (2DEG) made of InAs based epitaxial multilayers. Injected spins accumulate and diffuse out in the 2DEG, and the spins are electrically detected by a neighboring Ni81Fe19 electrode. The observed spin diffusion length is 1.8μm at 20K. The injected spin polarization across the Ni81Fe19∕InAs interface is 1.9% at 20K and remains at 1.4% even at room temperature. Their experimental results will contribute significantly to the realization of a practical spin field effect transistor.

Spin valve effect of NiFe/graphene/NiFe junctions

AbstractWhen spins are injected through graphene layers from a transition metal ferromagnet, high spin polarization can be achieved. When detected by another ferromagnet, the spin-polarized current makes high- and low-resistance states in a ferromagnet/graphene/ferromagnet junction. Here, we report manifest spin valve effects from room temperature to 10 K in junctions comprising NiFe electrodes and an interlayer made of double-layer or single-layer graphene grown by chemical vapor deposition. We have found that the spin valve effect is stronger with double-layer graphene than with single-layer graphene. The ratio of relative magnetoresistance increases from 0.09% at room temperature to 0.14% at 10 K for single-layer graphene and from 0.27% at room temperature to 0.48% at 10 K for double-layer graphene. The spin valve effect is perceived to retain the spin-polarized transport in the vertical direction and the hysteretic nature of magnetoresistance provides the basic functionality of a memory device. We have also found that the junction resistance decreases monotonically as temperature is lowered and the current-voltage characteristics show linear behaviour. These results revealed that a graphene interlayer works not as a tunnel barrier but rather as a conducting thin film between two NiFe electrodes.

Molecular n-doping of chemical vapor deposition grown graphene

It is essential to tailor the electronic properties of graphene in order to apply graphene films for use in electrodes. Here we report the modification of the electronic properties of single layer chemical vapor deposition (CVD) grown graphene by molecular doping without degrading its transparency and electrical properties. Raman spectroscopy and transport measurements revealed that p-toluenesulfonic acid (PTSA) imposes n-doping on single layer CVD grown graphene. The shift of G and 2D peak wave numbers and the intensity ratio of D and G peaks are analyzed as a function of reaction time. In the gate voltage dependent resistivity measurement, it is found that the maximum resistivity corresponding to the Dirac point is shifted toward a more negative gate voltage with increasing reaction time, indicating an n-type doping effect. We have also made single layer graphene p–n junctions by chemical doping and investigated the current–voltage characteristics at the p–n junction.

Effect of e-beam irradiation on graphene layer grown by chemical vapor deposition

We have grown graphene by chemical vapor deposition (CVD) and transferred it onto Si/SiO2 substrates to make tens of micron scale devices for Raman spectroscopy study. The effect of electron beam (e-beam) irradiation of various doses (600 to 12 000 μC/cm2) on CVD grown graphene has been examined by using Raman spectroscopy. It is found that the radiation exposures result in the appearance of the strong disorder D band attributed the damage to the lattice. The evolution of peak frequencies, intensities, and widths of the main Raman bands of CVD graphene is analyzed as a function of defect created by e-beam irradiation. Especially, the D and G peak evolution with increasing radiation dose follows the amorphization trajectory, which suggests transformation of graphene to the nanocrystalline and then to amorphous form. We have also estimated the strain induced by e-beam irradiation in CVD graphene. These results obtained for CVD graphene are in line with previous findings reported for the mechanically exfolia...

Improving the electrical properties of graphene layers by chemical doping

Abstract Although the electronic properties of graphene layers can be modulated by various doping techniques, most of doping methods cost degradation of structural uniqueness or electrical mobility. It is matter of huge concern to develop a technique to improve the electrical properties of graphene while sustaining its superior properties. Here, we report the modification of electrical properties of single- bi- and trilayer graphene by chemical reaction with potassium nitrate (KNO3) solution. Raman spectroscopy and electrical transport measurements showed the n-doping effect of graphene by KNO3. The effect was most dominant in single layer graphene, and the mobility of single layer graphene was improved by the factor of more than 3. The chemical doping by using KNO3 provides a facile approach to improve the electrical properties of graphene layers sustaining their unique characteristics.

Formation of p–n junction with stable p-doping in graphene field effect transistors using deep UV irradiation

We demonstrate the modification of the electronic properties of single layer chemical vapor deposition (CVD)-grown graphene by deep ultraviolet (DUV) light irradiation. The shift in the G and 2D bands in Raman spectra towards higher wavenumber suggests p-doping in graphene field effect transistors (FETs). In the transport measurements, the Dirac point is shifted towards positive gate voltage with increasing DUV light exposure time, revealing the strong p-doping effect without a large resistance increase. The doping is found to be stable in graphene devices, with a slight change in mobilities. We also constructed a p–n junction by DUV light exposure on selected regions of graphene, and investigated it with gate voltage dependent resistivity measurements and current–voltage characteristics.