Joongeok Kim

Eliminating hotspots in a multi-chip LED array direct backlight system with optimal patterned reflectors for uniform illuminance and minimal system thickness

We propose an optical design process that significantly reduces the time and costs in direct backlight unit (BLU) development. In it, the basic system specifications are derived from the optical characteristics of RGB light-emitting diodes (LEDs) comprising the BLU. The driving currents are estimated to determine the theoretical RGB flux ratio for a desired white point. The number of LEDs needed to produce the target luminance is then calculated from the combined optical efficiencies of the components. Last, an appropriate array configuration is sought based on the illuminance distribution function for meeting the target uniformity. To showcase the design process we built two 42-inch triangular cluster arrays of 40 x 16 LED elements. When a flat reflective sheet was used, the minimum thickness required of the system to satisfy the target uniformity was 30 mm. Introducing a patterned reflective sheet removed hotspots that resulted from reducing the system thickness without the aid of additional optical components. Using an optimized patterned reflective sheet, reduction in system thickness as much as 5 mm was possible.

Fabrication of a metallic roll stamp with low internal stress and high hardness for large area display applications by a pulse reverse current electroforming process

With the increasing demand for large scale micro/nano components in the fields of display, energy and electrical devices, etc, the establishment of a roll imprinting process has become a priority. The fabrication of a roll stamp with high dimensional accuracy and uniformity is one of the key issues in the roll imprinting process, because the roll stamp determines the properties of the replicated micro/nano structures. In this study, a method to fabricate a metallic roll stamp with low internal stress, high flatness, and high hardness was proposed by a pulse reverse current (PRC) electroforming process. The effects of PRC electroforming processes on the internal stress, hardness, and grain size of the electroformed stamp were examined, and the optimum process conditions were suggested. As a practical example of the proposed method, various micro-patterns for electronic circuits were fabricated via the roll imprinting process using a PRC electroformed stamp.

Design methodology accounting for fabrication errors in manufactured modified Fresnel lenses for controlled LED illumination

The increasing demand for lightweight, miniaturized electronic devices has prompted the development of small, high-performance optical components for light-emitting diode (LED) illumination. As such, the Fresnel lens is widely used in applications due to its compact configuration. However, the vertical groove angle between the optical axis and the groove inner facets in a conventional Fresnel lens creates an inherent Fresnel loss, which degrades optical performance. Modified Fresnel lenses (MFLs) have been proposed in which the groove angles along the optical paths are carefully controlled; however, in practice, the optical performance of MFLs is inferior to the theoretical performance due to fabrication errors, as conventional design methods do not account for fabrication errors as part of the design process. In this study, the Fresnel loss and the loss area due to microscopic fabrication errors in the MFL were theoretically derived to determine optical performance. Based on this analysis, a design method for the MFL accounting for the fabrication errors was proposed. MFLs were fabricated using an ultraviolet imprinting process and an injection molding process, two representative processes with differing fabrication errors. The MFL fabrication error associated with each process was examined analytically and experimentally to investigate our methodology.

Development of Direct Deep Reactive Ion Etching Process Using Laser Interference Lithographed Etch Barrier without Intermediate Layer

Laser interference lithography (LIL) is a technique that allows maskless patterning of large areal periodic nano/micro structures. The LIL pattern is often used as an etch barrier to pattern SiO2 intermediate layer in the fabrication process of high aspect ratio silicon nano/micro structures by deep reactive ion etching process (DRIE) with SiO2 etch barrier. In this study, a method to fabricate high aspect ratio nanograting structures by direct DRIE process of silicon substrate using LIL pattern without intermediate layer was developed as a simple and cost-effective fabrication process. To fabricate high aspect ratio silicon nanograting with high pattern fidelity, a simulation method to predict the cross sectional profile of photoresist (PR) pattern after exposure and development processes was investigated, and the LIL processing conditions were selected to obtain optimized cross sectional profile of PR pattern without residual layer based on the simulation results. To minimize the side wall defects during the DRIE process due to the deterioration of LIL pattern etch barrier, the processing conditions of DRIE process including etching gas, etching gas ratio, passivation time and power were optimized. Finally, a silicon nanograting with a grating pitch of 780 nm and height of 2.42 µm (aspect ratio: 6) was fabricated via the developed direct DRIE process with LIL pattern.

Protective Role of Apelin Against Cyclosporine-Induced Renal Tubular Injury in Rats

BACKGROUND Cyclosporine (CsA) usually reduces glomerular filtration rate (GFR) but also can induce tubular injury without resulting in GFR reduction. Apelin is an endogenous ligand for the apelin receptor and has diverse physiologic roles related to hemodynamic or metabolic processes. We investigated the renoprotective role of apelin against CsA-induced tubular toxicity in rats. METHODS Rats were given CsA (15 mg/kg/day) and/or apelin-13 (15 μg/kg/day) for 7 days via subcutaneous injection. We performed serum and urinary assays of creatinine and neutrophil gelatinase-associated lipocalin (NGAL) to estimate renal injury and performed Western blotting for endothelial nitric oxide synthase and nuclear factor of activated T-cell cytoplasmic 1 (NFATc1) to document the underlying mechanism. RESULTS The CsA-treated group showed increased urinary creatinine excretion, polyuria, and renal glycosuria without GFR reduction, suggesting adequate CsA-induced renal tubular injury. Urinary NGAL excretion also increased significantly in the CsA group. Conversely, apelin attenuated CsA-induced tubular injury and had no effect on urinary NGAL excretion. In histopathologic examination, the apelin-treated group had lower tubulo-interstitial injury scores compared with those in the CsA group. Regarding the effects of apelin, our results indicate that apelin provides protection against CsA-induced tubular injury by activating nitric oxide and/or the NFATc1 pathway. Notably, we also found that CsA inhibits renal glucose reabsorption by reducing Na+-K+ ATPase expression and that apelin reverses reduced renal glucose reabsorption by CsA in tubular cells. CONCLUSIONS Our study demonstrates the renoprotective effect of apelin against CsA-induced renal tubular toxicity and provides novel insights into the effects of CsA and apelin on renal tubular cells.

Effect of alumina composition and surface integrity in alumina/epoxy composites on the ultrasonic attenuation properties

We report a method of fabricating backing blocks for ultrasonic imaging transducers, using alumina/epoxy composites. Backing blocks contain scatterers such as alumina particles interspersed in the epoxy matrix for the effective scattering and attenuation of ultrasound. Here, the surface integrity can be an issue, where the composite material may be damaged during machining because of differences in strength, hardness and brittleness of the hard alumina particles and the soft epoxy matrix. Poor surface integrity results in the formation of air cavities between the backing block and the piezoelectric element upon assembly, hence the increased reflection off the backing block and the eventual degradation in image quality. Furthermore, with an issue of poor surface integrity due to machining, it is difficult to increase alumina as scatterers more than a specific mass fraction ratio. In this study, we increased the portion of alumina within epoxy matrix by obtaining an enhanced surface integrity using a net shape fabrication method, and verified that this method could allow us to achieve higher ultrasonic attenuation. Backing blocks were net-shaped with various mass fractions of alumina to characterize the formability and the mechanical properties, including hardness, surface roughness and the internal micro-structure, which were compared with those of machined backing blocks. The ultrasonic attenuation property of the backing blocks was also measured.

An unusual case of peritoneal dialysis catheter extrusion.

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