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Dive into the research topics where Josefin Engkvist is active.

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Featured researches published by Josefin Engkvist.


Materials at High Temperatures | 2009

Oxidation of FeCrAl foils at 500–900°C in dry O2 and O2 with 40% H2O

Josefin Engkvist; Sead Canovic; Fang Liu; Helena Götlind; Jan-Erik Svensson; Lars-Gunnar Johansson; Mikael Olsson; Mats Halvarsson

Abstract High temperature resistant FeCrAl alloys are frequently used in high temperature applications such as heating elements and metal based catalytic converter bodies. When exposed to high temperatures an adherent, slowly growing, dense aluminium oxide layer forms on the surface, which protects the underlying alloy from severe degradation. The composition, structure and properties of the formed oxide layer are strongly dependent on the alloy composition, temperature and oxidation environment. In this study, the Sandvik 0C404 FeCrAl alloy, in the form of 50 μm thick foils, was exposed isothermally in the temperature range 500–900°C for 168 hours in dry O2 and in O2 with 40 vol.% H2O. The surface morphology, composition and microstructure of the grown oxide scales were characterized by using scanning electron microscopy (SEM), transmission electron microscopy (TEM), energy dispersive X-ray spectroscopy (EDX), grazing incidence X-ray diffraction (GIXRD), Auger electron spectroscopy (AES), and time of flight secondary ion mass spectrometry (TOF-SIMS). The oxidation process was faster at 900°C than at 500 and 700°C. At 500°C a thin (10–20 nm) mixed oxide of Fe, Cr and Al was formed. Exposure at 700°C resulted in a similar (40–50 nm) duplex oxide, in both dry O2 and in O2 with 40 vol.% H2O. These oxide scales consisted of an inner and an outer relatively pure alumina separated by a Cr-rich band. This type of duplex oxide scale also formed at 900°C with a thin inward growing α–Al2O3 at the oxide/metal interface and an outward growing layer outside a Cr-rich band. However, at 900°C the outward growing layer showed two types of oxide morphologies; a thin smooth base oxide and a much thicker nodular oxide grown on top of substrate ridges. In dry O2 atmosphere, the main part of this outward growing layer had transformed to α–Al2O3. Only in the outer part of the thick oxide nodules, metastable alumina was found. When exposed in the presence of water vapour the main part of the metastable alumina remained untransformed.


Journal of The Electrochemical Society | 2010

Microstructural Investigation of the Initial Oxidation of the FeCrAlRE Alloy Kanthal AF in Dry and Wet O2 at 600 and 800 ° C

Sead Canovic; Josefin Engkvist; Fang Liu; Haiping Lai; Helena Götlind; Kristina M Hellström; Jan-Erik Svensson; Lars-Gunnar Johansson; Mikael Olsson; Mats Halvarsson

The FeCrAlRE (where RE is reactive element) alloy Kanthal AF was exposed isothermally at 600 and 800 degrees C for 72 h in dry O-2 and in O-2 with 10 vol % H2O. The mass gains were 3-5 times higher at the higher temperature. The presence of water vapor increased the oxidation rate at 800 degrees C, while no significant effect was observed at 600 degrees C. A thin two-layered oxide formed at 600 degrees C: an outer (Fe, Cr)(2)O-3 corundum-type oxide, containing some Al, and an inner, probably amorphous, Al-rich oxide. At 800 degrees C a two-layered oxide formed in both environments. The inner layer consisted of inward grown alpha-Al2O3. In dry O-2 the originally formed outward grown gamma-Al2O3 had transformed to alpha-Al2O3 after 72 h. Water vapor stabilized the outward grown gamma-Al2O3 and hence no transformation occurred after 72 h in humid environment. RE-rich oxide particles with varying composition (Y, Zr, and Ti) were distributed in the base oxide at both temperatures and in both environments. The RE-rich particles were separated from the alloy substrate by a layer of Al-rich oxide. At 800 degrees C the Y-rich RE particles were surrounded by thick oxide patches in both dry and humid O-2


Oxidation of Metals | 2010

Alumina scale formation on a powder metallurgical FeCrAl alloy (Kanthal APMT) at 900-1100 °C in dry O2 and in O2 + H2O

Josefin Engkvist; Sead Canovic; Kristina M Hellström; Anders Järdnäs; Jan-Erik Svensson; Lars-Gunnar Johansson; Mikael Olsson; Mats Halvarsson


Materials and Corrosion-werkstoffe Und Korrosion | 2009

High temperature oxidation of FeCrAl-alloys – influence of Al-concentration on oxide layer characteristics

Josefin Engkvist; Ulf Bexell; Mikael Grehk; Mikael Olsson


Oxidation of Metals | 2015

KCl-Induced Corrosion of an FeCrAl Alloy at 600 °C in O2 + H2O Environment: The Effect of Pre-oxidation

Niklas Israelsson; Josefin Engkvist; Kristina M Hellström; Mats Halvarsson; Jan-Erik Svensson; Lars-Gunnar Johansson


Intermetallics | 2010

Oxidation behavior of a Mo (Si, Al)(2)-based composite at 300-1000 degrees C

Linda Ingemarsson; Mats Halvarsson; Josefin Engkvist; Torbjörn Jonsson; Kristina M Hellström; Lars-Gunnar Johansson; Jan-Erik Svensson


Applied Surface Science | 2004

ToF-SIMS depth profiling of alumina scales formed on a FeCrAl high-temperature alloy

Josefin Engkvist; Ulf Bexell; T M Grehk; Mikael Olsson


Surface & Coatings Technology | 2009

Early stages of oxidation of uncoated and PVD SiO2 coated FeCrAl foils

Josefin Engkvist; T M Grehk; Ulf Bexell; Mikael Olsson


Surface and Interface Analysis | 2013

The initial effect of KCl deposit on alumina scales characterized by ToF‐SIMS and AES

Josefin Engkvist; Niklas Israelsson; Ulf Bexell


8th International Symposium on High-Temperature Corrosion and Protection of Materials | 2012

The effect of SO2(g) on the initial stages of KCl induced high temperature corrosion of 304L at 600°C

Sofia Karlsson; Torbjörn Jonsson; Josefin Engkvist; Jan-Erik Svensson; Jesper Liske

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Jan-Erik Svensson

Chalmers University of Technology

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Lars-Gunnar Johansson

Chalmers University of Technology

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Mats Halvarsson

Chalmers University of Technology

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Sead Canovic

Chalmers University of Technology

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Helena Götlind

Chalmers University of Technology

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Kristina M Hellström

Chalmers University of Technology

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Anders Järdnäs

Chalmers University of Technology

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Fang Liu

Chalmers University of Technology

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