Juergen Brugger

Towards multi-level modeling of self-assembling intelligent micro-systems

The development of enabling infrastructure for the next generation of multi-agent systems consisting of large numbers of agents and operating in open environments is one of the key challenges for the multi-agent community.Current infrastructure support does not materially assist in the development of sophisticated agent coordination strategies. It is the need for and the development of such a high-level support structure that will be the focus of this paper. A domain-independent (generic) agent architecture is proposed that wraps around an agents problem-solving component in order to make problem solving responsive to real-time constraints, available network resources, and the need to coordinate—both in the large and small—with problem-solving activities of other agents. This architecture contains five components, local agent scheduling, multi-agent coordination, organizational design, detection and diagnosis, and on-line learning, that are designed to interact so that a range of different situation-specific coordination strategies can be implemented and adapted as the situation evolves. The presentation of this architecture is followed by a more detailed discussion on the interaction among these components and the research questions that need to be answered to understand the appropriateness of this architecture for the next generation of multi-agent systems.We investigate and model the dynamics of two-dimensional stochastic self-assembly of intelligent micro-systems with minimal requirements in terms of sensing, actuation, and control. A microscopic agent-based model accounts for spatiality and serves as a baseline for assessing the accuracy of models at higher abstraction level. Spatiality is relaxed in Monte Carlo simulations, which still capture the binding energy of each individual aggregate. Finally, we introduce a macroscopic model that only keeps track of the average number of aggregates in each energy state. This model is able to quantitatively and qualitatively predict the dynamics observed at lower, more detailed modeling levels. Since we investigate an idealized system, thus making very few assumptions about the exact nature of the final target system, our framework is potentially applicable to a large body of self-assembling agents ranging from functional micro-robots endowed with simple sensors and actuators to elementary microfabricated parts. In particular, we show how our suite of models at different abstraction levels can be used for optimizing both the design of the building blocks and the control of the stochastic process.

Microdrop Printing of Hydrogel Bioinks into 3D Tissue‐Like Geometries

An optimized 3D inkjet printing process is demonstrated for structuring alginate into a tissue-like microvasculature capable of supporting physiological flow rates. Optimizing the reaction at the single-droplet level enables wet hydrogel droplets to be stacked, thus overcoming their natural tendancy to spread and coalesce. Live cells can be patterned using this process and it can be extended to a range of other hydrogels.

High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications

Detailed investigations of the limits of a new negative-tone near-UV resist (IBM SU-8) have been performed. SU-8 is an epoxy-based resist designed specifically for ultrathick, high-aspect-ratio MEMS-type applications. We have demonstrated that with single-layer coatings, thicknesses of more than 500 /spl mu/m can be achieved reproducibly. Thicker resist layers can be made by multiple coatings, and we have achieved exposures in 1200-/spl mu/m-thick, double coated SU-8 resist layers. We have found that the aspect ratio for near-UV (400 nm) exposed and developed structures can be greater than 18 and remains constant in the thickness range between 80 and 1200 /spl mu/m. Vertical sidewall profiles result in good dimensional control over the entire resist thickness. To our knowledge, this is the highest aspect ratio reported for near-UV exposures and resist thicknesses. These results will open up new possibilities for low-cost LIGA-type processes for MEMS applications. In addition, the SU-8 material has interesting mechanical properties which also makes it attractive for photoplastic device fabrication.

Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning

A tool and method for flexible and rapid surface patterning technique beyond lithography based on high-resolution shadow mask method, or nanostencil, is presented. This new type of miniaturized shadow mask is fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. Thereby apertures in a 100-500 nm thick low-stress silicon nitride membrane in the size range from 100 µm were made. The stencil device is mechanically fixed on the surface and used as miniature shadow mask during deposition of metal layers. Using this method, aluminum Micro- and nanostructures as small as 100 nm in width were patterned. The deposited Micro- and nano-scale structures were used as etch mask and transferred into a sub-layer (in our case silicon nitride) by dry plasma etching. High-resolution shadow masking can be used to create micro/nanoscale patterns on arbitrary substrates including mechanically fragile or chemically active surfaces.

Metallic Nanowires by Full Wafer Stencil Lithography

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 mum long have been achieved showing a resistivity of 10 microOmegacm for Al and 5 microOmegacm for Au and maximum current density of approximately 10(8) A/cm(2). This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.

Metallic Nanodot Arrays by Stencil Lithography for Plasmonic Biosensing Applications

The fabrication of gold nanodots by stencil lithography and its application for optical biosensing based on localized surface plasmon resonance are presented. Arrays of 50-200 nm wide nanodots with different spacing of 50-300 nm are fabricated without any resist, etching, or lift-off process. The dimensions and morphology of the nanodots were characterized by scanning electron and atomic force microscopy. The fabricated nanodots showed localized surface plasmon resonance in their extinction spectra in the visible range. The resonance wavelength depends on the periodicity and dimensions of the nanodots. Bulk refractive index measurements and model biosensing of streptavidin were successfully performed based on the plasmon resonance shift induced by local refractive index change when biomolecules are adsorbed on the nanodots. These results demonstrate the potential of stencil lithography for the realization of plasmon-based biosensing devices.

An Oligomerized 53BP1 Tudor Domain Suffices for Recognition of DNA Double-Strand Breaks

ABSTRACT 53BP1, the vertebrate ortholog of the budding yeast Rad9 and fission yeast Crb2/Rhp9 checkpoint proteins, is recruited rapidly to sites of DNA double-strand breaks (DSBs). A tandem tudor domain in human 53BP1 that recognizes methylated residues in the histone core is necessary, but not sufficient, for efficient recruitment. By analysis of deletion mutants, we identify here additional elements in 53BP1 that facilitate recognition of DNA DSBs. The first element corresponds to an independently folding oligomerization domain. Replacement of this domain with heterologous tetramerization domains preserves the ability of 53BP1 to recognize DNA DSBs. A second element is only about 15 amino acids long and appears to be a C-terminal extension of the tudor domain, rather than an independently functioning domain. Recruitment of 53BP1 to sites of DNA DSBs is facilitated by histone H2AX phosphorylation and ubiquitination. However, none of the 53BP1 domains/elements important for recruitment are known to bind phosphopeptides or ubiquitin, suggesting that histone phosphorylation and ubiquitination regulate 53BP1 recruitment to sites of DNA DSBs indirectly.

Nanoscale topographical control of capillary assembly of nanoparticles

Predetermined and selective placement of nanoparticles onto large-area substrates with nanometre-scale precision is essential to harness the unique properties of nanoparticle assemblies, in particular for functional optical and electro-optical nanodevices. Unfortunately, such high spatial organization is currently beyond the reach of top-down nanofabrication techniques alone. Here, we demonstrate that topographic features comprising lithographed funnelled traps and auxiliary sidewalls on a solid substrate can deterministically direct the capillary assembly of Au nanorods to attain simultaneous control of position, orientation and interparticle distance at the nanometre level. We report up to 100% assembly yield over centimetre-scale substrates. We achieve this by optimizing the three sequential stages of capillary nanoparticle assembly: insertion of nanorods into the traps, resilience against the receding suspension front and drying of the residual solvent. Finally, using electron energy-loss spectroscopy we characterize the spectral response and near-field properties of spatially programmable Au nanorod dimers, highlighting the opportunities for precise tunability of the plasmonic modes in larger assemblies.

Facile fabrication of nanofluidic diode membranes using anodic aluminium oxide

Active control of ion transport plays important roles in chemical and biological analytical processes. Nanofluidic systems hold the promise for such control through electrostatic interaction between ions and channel surfaces. Most existing experiments rely on planar geometry where the nanochannels are generally very long and shallow with large aspect ratios. Based on this configuration the concepts of nanofluidic gating and rectification have been successfully demonstrated. However, device minimization and throughput scaling remain significant challenges. We report here an innovative and facile realization of hetero-structured Al(2)O(3)/SiO(2) (Si) nanopore array membranes by using pattern transfer of self-organized nanopore structures of anodic aluminum oxide (AAO). Thanks to the opposite surface charge states of Al(2)O(3) (positive) and SiO(2) (negative), the membrane exhibits clear rectification of ion current in electrolyte solutions with very low aspect ratios compared to previous approaches. Our hetero-structured nanopore arrays provide a valuable platform for high throughput applications such as molecular separation, chemical processors and energy conversion.

CAFM investigations of filamentary conduction in Cu2O ReRAM devices fabricated using stencil lithography technique

With the objective of understanding the role of size and current level of filamentary regions on the resistive switching parameters, detailed conductive atomic force microscope investigations of resistive memory cells having different dimensions have been carried out in this study. Cu-Cu(2)O-Ti memory cells having dimensions of 150, 50 and 25 μm have been fabricated on the same substrate using a stencil lithography technique. The dependence of resistive switching parameters on the device dimensions can be directly related to the average size, current level of the filaments and difference in these parameters between the low resistance state (LRS) and high resistance state (HRS). It is observed that the large increase in the ratio of current in the two states in cells having lower dimensions is mainly due to the smaller number of conducting regions in the HRS, indicating efficient switching from the LRS to the HRS at lower dimensions.