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Jun Nozawa

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Publication

Featured researches published by Jun Nozawa.

Archive | 2001

Method of manufacturing phase shift mask blank and phase shift mask

Hideaki Mitsui; Masaru Mitsui; Jun Nozawa; 英明 三ッ井; 勝 三井; 順 野澤

Archive | 2000

Method of manufacturing phase shift mask blank and apparatus for manufacturing phase shift mask blank

Hideaki Mitsui; Jun Nozawa; 英明 三ッ井; 順 野澤

Archive | 2002

Method for producing lithography mask blank, lithography mask and halftone phase shifting mask blank

Hideaki Mitsui; Jun Nozawa; Yuuki Shioda; 英明 三ッ井; 勇樹 塩田; 順 野澤

Archive | 2002

HALFTONE PHASE SHIFTING MASK BLANK, HALFTONE PHASE SHIFTING MASK, METHOD FOR PRODUCING THE SAME AND METHOD FOR TRANSFERRING PATTERN

Hideaki Mitsui; Jun Nozawa; Akira Okubo; Yuuki Shioda; 英明 三ッ井; 勇樹 塩田; 亮 大久保; 順 野澤

Archive | 2000

Phase shift mask blank, photomask blank as well as manufacturing apparatus and manufacturing method for the same

Hideaki Mitsui; Masaru Mitsui; Jun Nozawa; Hitoshi Otsuka; 英明 三ッ井; 勝 三井; 仁 大塚; 順 野澤

Archive | 2001

Halftone type phase shift mask and mask blank

Hideaki Mitsui; Jun Nozawa; Yuuki Shioda; 英明 三ッ井; 勇樹 塩田; 順 野澤

Archive | 2003

Phase shift mask blank, photomask blank and their manufacturing devices and processes

Hideaki Mitsui; Masaru Mitsui; Jun Nozawa; Hitoshi Otsuka; 英明 三ッ井; 勝 三井; 仁 大塚; 順 野澤

Archive | 2008

Method for manufacturing phase shift mask blank and device for manufacturing phase shift mask blank

Hideaki Mitsui; Jun Nozawa; 英明 三ッ井; 順 野澤

Archive | 2016

Mask blank, phase shift mask, manufacturing method of phase shift mask and manufacturing method of semiconductor device

博明 宍戸; Hiroaki Shishido; 野澤 順; Jun Nozawa; 順 野澤; 猛伯 梶原; Takenori Kajiwara

Archive | 2009

Halftone-phase shift mask blank and the halftone-phase shift mask

Jun Nozawa; Yuuki Shioda; 勇樹 塩田; 順 野澤

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Collaboration

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Hideaki Mitsui

Hoya Corporation

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Masaru Mitsui

Hoya Corporation

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Hiroaki Shishido

Hoya Corporation

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Atsushi Kominato

Hoya Corporation

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Takenori Kajiwara

Hoya Corporation

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